IEICE Technical Committee Submission System
Conference Schedule		 Online Proceedings
[Sign in]
Tech. Rep. Archives
    [Japanese] / [English] 
( Committee/Place/Topics  ) --Press->
 
( Paper Keywords:  /  Column:Title Auth. Affi. Abst. Keyword ) --Press->

All Technical Committee Conferences  (Searched in: All Years)

Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 5 of 5  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
LQE, OPE, CPM, EMD, R 2019-08-22
16:45		 Miyagi   [Invited Talk] 3D Flash Memory Cell Reliability
Yuichiro Mitani, Harumi Seki, Takanori Asano, Yasushi Nakasaki (Toshiba Memory) R2019-26 EMD2019-24 CPM2019-25 OPE2019-53 LQE2019-31		 As conventional planar NAND flash memories are limited from physical and electrical scaling point of view, the three-dim... [more] R2019-26 EMD2019-24 CPM2019-25 OPE2019-53 LQE2019-31
pp.35-38
ICD 2017-04-21
13:25		 Tokyo   [Invited Lecture] Demonstration of HfO2-Based Ferroelectric Tunnel Junction (FTJ)
Marina Yamaguchi, Shosuke Fujii, Yuuichi Kamimuta, Tsunehiro Ino, Riichiro Takaishi, Yasushi Nakasaki, Masumi Saitoh (Toshiba) ICD2017-16		 In recent years, two remarkable progresses have been made on ferroelectric materials and devices. One is the demonstrati... [more] ICD2017-16
pp.85-88
ICD, SDM, ITE-IST [detail] 2016-08-03
10:40		 Osaka Central Electric Club [Invited Talk] Demonstration and performance improvement of ferroelectric HfO2-based tunnel junction
Kamimuta Yuuichi, Shosuke Fujii, Tsunehiro Ino, Riichiro Takaishi, Yasushi Nakasaki, Masumi Saitoh (Toshiba) SDM2016-62 ICD2016-30		  [more] SDM2016-62 ICD2016-30
pp.95-98
SDM 2016-06-29
10:00		 Tokyo Campus Innovation Center Tokyo [Invited Lecture] Effects of top TiN deposition and annealing process on electrical and physical properties of ferroelectric HfSiO MIM capacitor
Yuuichi Kamimuta, Shosuke Fujii, Riichiro Takaishi, Tsunehiro Ino, Yasushi Nakasaki, Masumi Saitoh, Masato Koyama (Toshiba) SDM2016-32		 We have investigated the effect of top TiN deposition process and annealing temperature on physical and electrical prope... [more] SDM2016-32
pp.1-4
SDM 2006-06-22
10:55		 Hiroshima Faculty Club, Hiroshima Univ. Realization of SiON films with small ΔVfb
Daisuke Matsushita, Koichi Muraoka, Yasushi Nakasaki, Koichi Kato, Shoko Kikuchi, Kiwamu Sakuma, Yuichiro Mitani (toshiba R&D center), Mariko Takayanagi, Kazuhiro Eguchi (Semiconductor Company) 		 [more] SDM2006-56
pp.81-86
 Results 1 - 5 of 5  /   
Choose a download format for default settings. [NEW !!]
Text format pLaTeX format CSV format BibTeX format
Copyright and reproduction : All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan