| IEICE Technical Committee Submission System Conference Schedule |
Online Proceedings [Sign in] Tech. Rep. Archives |
All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| ICD, SDM, ITE-IST [detail] | 2022-08-08 09:15 |
Online | [Invited Talk]
A 2-Layer Transistor Pixel Stacked CMOS Image Sensor with Oxide Based Full Trench Isolation for Large Full Well Capacity and High Quantum Efficiency Koichiro Zaitsu, Akira Matsumoto, Mizuki Nishida, Yusuke Tanaka, Hirofumi Yamashita, Yosuke Satake (Sony Semiconductor Solutions), Takashi Watanabe, Kunihiko Araki, Naoki Nei (Sony Semiconductor Manufacturing), Keiichi Nakazawa, Junpei Yamamoto, Mutsuo Uehara (Sony Semiconductor Solutions), Hiroyuki Kawashima, Yusaku Kobayashi (Sony Semiconductor Manufacturing), Tomoyuki Hirano, Keiji Tatani (Sony Semiconductor Solutions)  SDM2022-33 ICD2022-1 |
(To be available after the conference date) [more] | SDM2022-33 ICD2022-1 pp.1-6 |
|
| ICD, SDM, ITE-IST [detail] | 2022-08-08 10:00 |
Online | [Invited Talk]
Low-Noise Multi-Gate Pixel Transistor for Sub-Micron Pixel CMOS Image Sensors Naohiko Kimizuka, Shota Kitamura, Akiko Honjo, Koichi Baba, Toshihiro Kurobe, Hideomi Kumano, Takuya Toyohuku (Sony Semiconductor Solutions), Kouhei Takeuchi, Shota Nishimura (Sony Semiconductor Manufacturing), Akihiko Kato, Tomoyuki Hirano, Yusuke Oike (Sony Semiconductor Solutions) SDM2022-34 ICD2022-2 |
The pixel size of CMOS image sensor (CIS) continues to be rapidly decreasing due to strong demand from mobile applicatio... [more] | SDM2022-34 ICD2022-2 p.7 |
|
| SDM | 2022-02-04 11:20 |
Online | Online | [Invited Talk]
3D Sequential Process Integration for CMOS Image Sensor Keiichi Nakazawa, Junpei Yamamoto, Nobutoshi Fujii, Mutsuo Uehara, Katsunori Hiramatsu, Hideomi Kumano, Shigetaka Mori, Shintaro Okamoto, Akito Shimizu, Koichi Baba, Hidetoshi Onuma, Akira Matsumoto, Koichiro Zaitsu, Keiji Tanani, Tomoyuki Hirano, Hayato Iwamoto (Sony Semiconductor Solutions) SDM2021-77 |
We developed a new structure of pixel transistors stacked over photodiode named “2-Layer Transistor Pixel Stacked CMOS I... [more] | SDM2021-77 pp.13-16 |
| SDM | 2022-01-31 16:00 |
Online | Online | [Invited Talk]
**** Keiichi Nakazawa, Junpei Yamamoto, Shigetaka Mori, Shintaro Okamoto, Akito Shimizu, Koichi Baba, Nobutoshi Fujii, Mutsuo Uehara, Katsunori Hiramatsu, Hideomi Kumano, Akira Matsumoto, Koichiro Zaitsu, Hidetoshi Ohnuma, Keiji Tatani, Tomoyuki Hirano, Hayato Iwamoto (Sony Semiconductor Solutions) SDM2021-73 |
We developed a new structure of pixel transistors stacked over photodiode named “2-Layer Transistor Pixel Stacked CMOS I... [more] | SDM2021-73 pp.20-23 |
| SDM | 2021-02-05 14:25 |
Online | Online | [Invited Talk]
Impacts of Misalignment on 1um Pitch Cu-Cu Hybrid Bonding Yoshihisa Kagawa, Takumi Kamibayashi, Masaki Haneda, Nobuotoshi Fujii, Syunsuke Furuse, Hideto Hashiguch, Tomoyuki Hirano, Hayato Iwamoto (SSS) SDM2020-58 |
In this study, we have successfully demonstrated the 1um pitch Cu-Cu hybrid bonding technology with remarkable electrica... [more] | SDM2020-58 pp.15-18 |
| EST | 2014-05-30 10:20 |
Tokyo | Comparison of the Numerical Results of the Two- and Three-Dimensional Plasmonic Devices Jun Shibayama, Yusuke Wada, Tomoyuki Hirano, Junji Yamauchi, Hisamatsu Nakano (Hosei Univ.) EST2014-3 |
A comparison is given to the numerical results of two-dimensional (2-D) and three-dimensional (3-D) plasmonic devices. F... [more] | EST2014-3 pp.11-16 |
|
| SIS | 2010-03-05 10:30 |
Kanagawa | Kanagawa Institute of Technology | [Poster Presentation]
Improvement of Gaussian noise removal by using enhanced total variation filter Sho Miura, Tomoyuki Hirano, Hiroyuki Tsuji, Tomoaki Kimura (Kanagawa Inst. of Tech.) SIS2009-67 |
TV filter is a nonlinear filter that can remove Gaussian noise effectively, based on variational principle. It tradition... [more] | SIS2009-67 pp.101-106 |
| ICD, SDM | 2006-08-18 10:50 |
Hokkaido | Hokkaido University | [Special Invited Talk]
High Performance Dual Metal Gate CMOS with High Mobility and Low Threshold Voltage Applicable to Bulk CMOS Technology Shinpei Yamaguchi, Kaori Tai, Tomoyuki Hirano, Takshi Ando, Susumu Hiyama, Junli Wang, Yoshiya Hagimoto, Yoshihiko Nagahama, Takayoshi Kato, Kaori Nagano, Mayumi Yamanaka, Sanae Terauchi, Saori Kanda, Ryo Yamamoto, Ｙａｓｕｓｈｉ Tateshita (STDG, SONY Corp.) |
[more] | SDM2006-146 ICD2006-100 pp.121-126 |
| SDM | 2006-06-22 09:25 |
Hiroshima | Faculty Club, Hiroshima Univ. | Gate Oxide Process Dependence of CMOS Performance on Si(110) Surface Susumu Hiyama, Junli Wang, Takayoshi Kato, Tomoyuki Hirano, Kaori Tai, Hayato Iwamoto (Sony) |
We investigated gate oxide process dependence of hole mobility on Si(110) surface. We used RTO and radical oxidization a... [more] | SDM2006-53 pp.65-69 |
[Return to Top Page]