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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| VLD, DC, RECONF, ICD, IPSJ-SLDM (Joint) [detail] |
2021-12-02 15:35 |
Online | Online | Mask Optimization Method Using Simulated Quantum Annealing Yukihide Kohira, Haruki Nakayama, Naoki Nonaka (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA Corporation)  VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 |
To realize continuously scaling down of technology node, progressing manufacturing process by optical lithography is req... [more] | VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 pp.162-167 |
| HWS, VLD [detail] | 2020-03-04 16:00 |
Okinawa | Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-105 HWS2019-78 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] | VLD2019-105 HWS2019-78 pp.65-70 |
| VLD, DC, CPSY, RECONF, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2019-11-15 16:35 |
Ehime | Ehime Prefecture Gender Equality Center | Mask Optimization Considering Process Variation by Subgradient Method Yukihide Kohira, Rina Azuma (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-53 DC2019-77 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] | VLD2019-53 DC2019-77 pp.197-202 |
| VLD, DC, CPSY, RECONF, CPM, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2018-12-07 14:10 |
Hiroshima | Satellite Campus Hiroshima | Process Variation-aware Model-based OPC using 0-1 Quadratic Programming Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama, Shigeki Nojima (TMC) VLD2018-70 DC2018-56 |
Due to continuous shrinking of Critical Dimensions (CD) of layout pattern in VLSI, advances of manufacturing process in ... [more] | VLD2018-70 DC2018-56 pp.209-214 |
| NS, IN (Joint) |
2016-03-04 09:50 |
Miyazaki | Phoenix Seagaia Resort | Method for Finding Protected Nodes to Keep Connected Component Size against Crash of Nodes Tomomi Matsui, Hiroyoshi Miwa (Kwansei Gakuin Univ.) NS2015-214 |
[more] | NS2015-214 pp.267-272 |
| NS, IN (Joint) |
2015-03-02 09:50 |
Okinawa | Okinawa Convention Center | Polynomial-time Approximation Algorithm for Finding Protected Nodes against Crash of Nodes Tomomi Matsui, Hiroyoshi Miwa (Kwansei Gakuin Univ.) NS2014-186 |
In recent years, the Internet plays a important role as a social infrastructure. Therefore network service providers are... [more] | NS2014-186 pp.59-64 |
| VLD, IPSJ-SLDM | 2014-05-29 09:55 |
Fukuoka | Kitakyushu International Conference Center | [Invited Talk]
Multiple Patterning Lithography by Positive Semidefinite Relaxation Tomomi Matsui (TITECH) VLD2014-4 |
(To be available after the conference date) [more] | VLD2014-4 p.19 |
| VLD, IPSJ-SLDM | 2014-05-29 11:30 |
Fukuoka | Kitakyushu International Conference Center | LELECUT Triple Patterning Lithography Layout Decomposition using Positive Semidefinite Relaxation Yukihide Kohira (Univ. of Aizu), Tomomi Matsui (Tokyo Tech), Yoko Yokoyama, Chikaaki Kodama (Toshiba), Atsushi Takahashi (Tokyo Tech), Shigeki Nojima, Satoshi Tanaka (Toshiba) VLD2014-6 |
One of the most promising techniques in the 14 nm logic node and beyond is triple patterning lithography (TPL). Recently... [more] | VLD2014-6 pp.27-32 |
| NS, IN (Joint) |
2014-03-07 10:40 |
Miyazaki | Miyazaki Seagia | Method for Finding Protected Nodes for Network Design Invulnerability against Crash of Some Nodes Tomomi Matsui, Hiroyoshi Miwa (Kwansei Gakuin Univ.) NS2013-239 |
The high reliability and performance are needed as the Internet becomes an important social infrastructure. However, in ... [more] | NS2013-239 pp.361-366 |
| VLD | 2014-03-04 13:50 |
Okinawa | Okinawa Seinen Kaikan | Local Pattern Modification Method for Lithographical ECO in Double Patterning Yutaro Miyabe, Atsushi Takahashi, Tomomi Matsui (Tokyo Inst. of Tech.), Yukihide Kohira (Univ. of Aizu), Yoko Yokoyama (Toshiba) VLD2013-149 |
In advanced semiconductor manufacturing processes, even though a pattern is generated according to a design rule, hot s... [more] |
VLD2013-149 pp.87-92 |
| NS, IN (Joint) |
2013-03-08 13:20 |
Okinawa | Okinawa Zanpamisaki Royal Hotel | Method for Finding Protected Nodes for Invulnerability against Attack to Network Nodes Tomomi Matsui, Shinya Yamamoto, Hiroyoshi Miwa (Kwansei Gakuin Univ.) NS2012-266 |
The high reliability and performance are needed as the Internet becomes an important social infrastruc- ture. However, i... [more] | NS2012-266 pp.589-594 |
| COMP | 2010-06-25 10:05 |
Tokyo | Tokyo Tech | Improved Approximation Algorithms for Firefighter Problem on Trees Yutaka Iwaikawa, Naoyuki Kamiyama, Tomomi Matsui (Chuo Univ.) COMP2010-16 |
[more] | COMP2010-16 pp.9-12 |
| COMP | 2004-10-14 15:45 |
Miyagi | Tohoku University | Multicoloring Unit Disk Graphs on Triangular Lattice Points Yuichiro Miyamoto (Sophia Univ.), Tomomi Matsui (Univ. Tokyo) |
In this paper, we discuss a necessary and sufficient condition that the unit disk graph on triangular lattice points is ... [more] | COMP2004-41 pp.49-54 |
| COMP | 2004-10-14 16:15 |
Miyagi | Tohoku University | Shuji Kijima, Tomomi Matsui (Univ. Tokyo) |
In this paper, we propose a perfect (exact) sampler for closed Jackson Networks. Our algorithm is a sampling with Markov... [more] | COMP2004-42 pp.55-59 |
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