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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2007-06-07
14:45		 Hiroshima Hiroshima Univ. ( Faculty Club) Depth Profiling of Chemical Composition and Defect State Density of SiNx Formed by Plasma CVD
Masahi Miura, Akio Ohta, Hideki Murakami, Seiichiro Higashi, Seiichi Miyazaki (Hiroshima Univ.), Masayuki Kohno, Tatsuo Nishida, Toshio Nakanishi (TEL) SDM2007-34		 The depth profiling of chemical composition and defect state density in tensile- and compressive-SiNx films formed on ch... [more] SDM2007-34
pp.17-22
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