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All Technical Committee Conferences (Searched in: All Years)
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| Search Results: Conference Papers |
| Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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| Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
| ICD, SDM |
2006-08-18
10:50 |
Hokkaido |
Hokkaido University |
[Special Invited Talk]
High Performance Dual Metal Gate CMOS with High Mobility and Low Threshold Voltage Applicable to Bulk CMOS Technology
Shinpei Yamaguchi, Kaori Tai, Tomoyuki Hirano, Takshi Ando, Susumu Hiyama, Junli Wang, Yoshiya Hagimoto, Yoshihiko Nagahama, Takayoshi Kato, Kaori Nagano, Mayumi Yamanaka, Sanae Terauchi, Saori Kanda, Ryo Yamamoto, Ｙａｓｕｓｈｉ Tateshita (STDG, SONY Corp.) |
[more] |
SDM2006-146 ICD2006-100
pp.121-126 |
| SDM |
2006-06-22
09:25 |
Hiroshima |
Faculty Club, Hiroshima Univ. |
Gate Oxide Process Dependence of CMOS Performance on Si(110) Surface
Susumu Hiyama, Junli Wang, Takayoshi Kato, Tomoyuki Hirano, Kaori Tai, Hayato Iwamoto (Sony) |
We investigated gate oxide process dependence of hole mobility on Si(110) surface. We used RTO and radical oxidization a... [more] |
SDM2006-53
pp.65-69 |
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