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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM, EID |
2014-12-12 16:00 |
Kyoto |
Kyoto University |
Formation of nc-Si in SiOx by Soft X-ray Irradiation Fumito Kusakabe, Shota Hirano, Akira Heya, Naoto Matsuo, Kazuhiro Kanda, Takayasu Mochizuki, Shuji Miyamoto (Univ. of Hyogo), Kazuyuki Kohama, Kazuhiro Ito (Osaka Univ.) EID2014-32 SDM2014-127 |
[more] |
EID2014-32 SDM2014-127 pp.99-102 |
SDM |
2013-12-13 13:30 |
Nara |
NAIST |
Low-Temperature Crystallization of Thin-Film Semiconductor by Soft X-ray Irradiation
-- Photon Energy Dependence and TEM Observation of SiGe Multilayer Film -- Fumito Kusakabe, Yuki Maruyama, Akira Heya, Naoto Matsuo, Kazuhiro Kanda, Takayasu Mochizuki (Univ. of Hyogo), Kazuhiro Ito, Makoto Takahashi (Osaka Univ.) SDM2013-126 |
We examined dependence of the crystallization for a-Ge and a-SiGe on the photon energy. In the storage-ring current of 7... [more] |
SDM2013-126 pp.61-66 |
SDM, OME |
2012-04-28 09:00 |
Okinawa |
Okinawa-Ken-Seinen-Kaikan Bldg. |
[Invited Talk]
Low-Temperature Crystallization of Amorphous Semiconductor Films Using Only Soft X-ray Irradiation Naoto Matsuo, Akira Heya, Takayasu Mochizuki, Shuji Miyamoto, Kazuhiro Kanda (Univ Hyogo) SDM2012-11 OME2012-11 |
[more] |
SDM2012-11 OME2012-11 pp.49-54 |
SDM |
2011-12-16 16:00 |
Nara |
NAIST |
Development of Low-Temperature Crystallization Method of Thin Film Semiconductor Using Soft X-ray Source Akira Heya, Yuki Nonomura, Shota Kino, Naoto Matsuo (Univ. Hyogo), Sho Amano (LASTI Univ. Hyogo), Shuji Miyamoto, Kazuhiro Kanda, Takayasu Mochizuki (Univ. Hyogo), Kaoru Toko, Taizoh Sadoh, Masanobu Miyao (Kyushu Univ.) SDM2011-145 |
It is necessary two processes (crystal-nucleus formation and crystal grain growth) for crystallization. In general, the ... [more] |
SDM2011-145 pp.71-76 |
SDM |
2009-12-04 15:30 |
Nara |
NAIST |
Crystallization of a-Si Film via Quasi-Nuclei Formed by Laser Plasma Soft X-Ray Irradiation Sinya Isoda, Naoto Matsuo, Sho Amano, Akira Heya, Shuji Miyamoto, Takayasu Mochizuki (Univ. of Hyogo.) SDM2009-165 |
A-Si film irradiated Laser Plasma soft X-ray (LPX) was analyzed by Raman spectrometry, spectroscopic ellipsometry, and e... [more] |
SDM2009-165 pp.73-77 |
SDM |
2007-12-14 10:40 |
Nara |
Nara Institute Science and Technology |
Influence of laser-plasma x-ray irradiation on crystallization of a-Si film by excimer laser annealing Yasuyuki Takanashi, Naoto Matsuo, Kazuya Uejukkoku, Akira Heya (Dept.Mat.Sci.&Chem.,Univ.Hyogo), Sho Amano, Shuji Miyamoto, Takayasu Mochizuki (LASTI,Univ.Hyogo) SDM2007-224 |
We investigated the crystallization by Laser Plasma Soft-X-ray (LPX) irradiation followed by Excimer Laser Annealing (EL... [more] |
SDM2007-224 pp.9-13 |
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