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 Results 1 - 6 of 6  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
HCGSYMPO
(2nd)

Mie Sinfonia Technology Hibiki Hall Ise Frame Importance Detection by Link Relationship among Frame on Comics
Takashi Hiraoka, Ryosuke Yamanishi, Yoko Nishihara (Ritsumeikan Univ.)
This paper proposes a method to estimate the importance of frames in comics using the link relationship among the frames... [more]
CPM, ED, SDM 2014-05-29
10:35
Aichi   Development of Narrow Band LED Sources and Their Application to Dermatology
Masahiro Ogasawara (Mignon Belle), Takashi Hirao, Shizuo Fujita (Kyoto Univ.) ED2014-35 CPM2014-18 SDM2014-33
 [more] ED2014-35 CPM2014-18 SDM2014-33
pp.85-90
R 2011-05-13
15:00
Kochi Kochi City Culture-Plaza Cul-Port Bias-Temperature Instability in Zin Oxide Thin-Film Transistors
Mamoru Furuta, Takahiro Hiramatsu, Tokiyoshi Matsuda, Takashi Hirao (Kochi Univ. of Tech.), Yudai Kamada, Shizuo Fujita (Kyoto Univ.) R2011-11
 [more] R2011-11
pp.19-22
EID, ITE-IDY, IEE-EDD, IEIJ-SSL 2011-01-28
13:00
Kochi Kochi University of Technology Precisely patterned Zinc Oxide (ZnO) thin film phosphor fabricated directly on glass substrate -- after thin film fabrication with sputtering, wet etching, annealing --
Dapeng Wang, Toshiyuki Kawaharamura, li chaoyang, Takashi Hirao (Kochi Univ. Tech.)
 [more]
EID, ITE-IDY, IEE-EDD, IEIJ-SSL 2011-01-28
14:40
Kochi Kochi University of Technology Growth of Magnesium Oxide (MgO) Thin Film with Mist Deposition. -- Challenge to low temperature growth under the atmospheric pressure --
Toshiyuki Kawaharamura (Kochi Univ. Tech.), Hiroyuki Orita, Takahiro Shirahata (TMEIC), Takuto Igawa, Hiroshi Ito (Kyoto Univ.), Akio Yoshida (TMEIC), Shizuo Fujita (Kyoto Univ.), Takashi Hirao (Kochi Univ. Tech.)
 [more]
EID, ITE-IDY, IEE-EDD, IEIJ-SSL 2011-01-29
09:55
Kochi Kochi University of Technology Deposition of Insulator Film with New Facing Electrodes CVD for Low Temperature Devices
Tokiyoshi Matsuda, Mamoru Furuta, Takahiro Hiramatsu, Hiroshi Furuta, Takashi Hirao (Kochi Univ. of Technol.) EID2010-35
Insulating SiO_{\it x} film was deposited at low temperature with newly developed plasma source for low heat resistive s... [more] EID2010-35
pp.87-90
 Results 1 - 6 of 6  /   
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