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Committee Date Time Place Paper Title / Authors Abstract Paper #
ED, LQE, CPM 2018-11-30
11:15
Aichi Nagoya Inst. tech. Fabrication and evaluation of p-type Cu-AlOx thin film by photochemical deposition method
Masanari Umemura, Masaya Ichimura (Nagoya Inst. Tech.) ED2018-46 CPM2018-80 LQE2018-100
AlOx has many physical properties suitable for electronic devices such as wide bandgap and high dielectric breakdown ele... [more] ED2018-46 CPM2018-80 LQE2018-100
pp.65-70
SDM, ED, CPM 2017-05-25
14:45
Aichi VBL, Nagoya University Fabrication of n-type AlOx thin films by drop photochemical deposition
Masanari Umemura, Masaya Ichimura (NITech) ED2017-18 CPM2017-4 SDM2017-12
AlOx is transparent for visible rays because of its large bandgap, and stable chemically and thermally. We fabricated Al... [more] ED2017-18 CPM2017-4 SDM2017-12
pp.17-22
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