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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 11 of 11  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
EID, SDM, ITE-IDY [detail] 2020-12-02
13:40
Online Online Synthesis of Single Crystal BaTiO3 Nanoparticles for Self-Assembly Technique
Misa Yamasaki, Masaki Yamaguchi (Shibaura Inst. of Tech.) EID2020-8 SDM2020-42
In this study, barium titanate single crystal fine particles used for inkjet-printing method were prepared by hydrotherm... [more] EID2020-8 SDM2020-42
pp.29-34
SDM, EID 2017-12-22
14:45
Kyoto Kyoto University Modification effects of ferroelectric thick-film properties on silicon substrates by proton beam irradiation
Jun Hirade, Masaki Yamaguchi (Shibaura Inst. of Tech.), Yoichiro Masuda (Hachinohe Inst. of Tech.) EID2017-22 SDM2017-83
Ferroelectric thin films deposited on silicon substrates are expected to be applied to nonvolatile memories,
photonic ... [more]
EID2017-22 SDM2017-83
pp.57-62
SDM 2013-12-13
16:20
Nara NAIST Fabrication of Ferroelectric Microstructures by Proton Beam Irradiation
Kazuki Watanabe, Masaki Yamaguchi, Hiroyuki Nishikawa (Shibaura Inst. of Tech.) SDM2013-130
In this study, we performed examination to form a thick film with the thing which added Polyvinylpyrrolidone (PVP), in t... [more] SDM2013-130
pp.85-89
SDM 2012-12-07
16:00
Kyoto Kyoto Univ. (Katsura) Fabrication of Ferroelectric Microstructures by Proton Beam Irradiation
Masaki Yamaguchi, Kazuki Watanabe (Shibaura Inst. of Tech.), Yoichiro Masuda (Hachinohe Inst. of Tech.) SDM2012-134
In the fabrication of micro-patterned ferroelectric bismuth titanate thin films were investigated. We use metal-octylate... [more] SDM2012-134
pp.113-117
SDM 2009-12-04
16:10
Nara NAIST Stability Improvement of Printer Ink
Tomohiro Oba, Sinya Maeta, Masaki Yamaguchi (Shibaura Ins. of Tech.) SDM2009-167
We aims for the formation of ferroelectric thin films by inkjet print method. There is an advantage that this method can... [more] SDM2009-167
pp.83-88
SDM 2008-12-05
15:10
Kyoto Kyoto University, Katsura Campus, A1-001 Electrical Properties of Ferroelectric Thin Films by Alcohol Rerated Materials
Masaki Yamaguchi, Tomohiro Oba (Shibaura Inst. of Tech.), Yoichiro Masuda (Hachinohe Inst. of Tech.) SDM2008-192
The inkjet technique is devised as one of the thin film formation method of the next generation. We synthesized the ferr... [more] SDM2008-192
pp.43-47
DC, CPSY, IPSJ-SLDM, IPSJ-EMB 2008-03-27
08:45
Kagoshima   An Adaptive Multi-Performance Processor and its Evaluation
Seiichiro Yamaguchi, Yuichiro Oyama (Kyushu Univ.), Yuji Kunitake (Kyushu Inst. of Tech.), Tadayuki Matsumura, Yuriko Ishitobi, Masaki Yamaguchi, Donghoon Lee, Yusuke Kaneda (Kyushu Univ.), Toshimasa Funaki (Kyushu Inst. of Tech.), Masanori Muroyama, Tohru Ishihara, Toshinori Sato (Kyushu Univ.) DC2007-84 CPSY2007-80
This paper presents an energy efficient processor which can be used as a design alternative for the dynamic voltage scal... [more] DC2007-84 CPSY2007-80
pp.1-6
SDM 2007-12-14
17:20
Nara Nara Institute Science and Technology Fabrication and Physical Properties of Ferroelectric Thin Films by Alcohol-related Materials
Masaki Yamaguchi (Shibaura Inst. of Tech.), Yoichiro Masuda (Hachinohe Inst. of Tech.) SDM2007-236
The inkjet technique is devised as one of the thin film formation method of the next generation. We synthesized the ferr... [more] SDM2007-236
pp.59-62
VLD, CPSY, RECONF, DC, IPSJ-SLDM, IPSJ-ARC
(Joint) [detail]
2007-11-20
15:35
Fukuoka Kitakyushu International Conference Center An On-Chip Bus Architecture for Post-Fabrication Timing Calibration
Masaki Yamaguchi, Masanori Muroyama, Tohru Ishihara, Hiroto Yasuura (Kyushu Univ.)
As the transistor size shrinks, the horizontal coupling capacitance between adjacent wires becomes dominant for wire loa... [more] VLD2007-79 DC2007-34
pp.55-60
ICD, VLD 2007-03-07
17:40
Okinawa Mielparque Okinawa A Study of Dependence on Gate Depth/Width for Analyzing Delay/Power Variations in 90nm CMOS Circuits
Masaki Yamaguchi (Kyushu Univ.), Yuan Yang (Xi’an Univ. of Technology), Ryota Sakamoto, Masanori Muroyama, Tohru Ishihara, Hiroto Yasuura (Kyushu Univ.)
As the transistor size shrinks, process variations increase. Under the existence of the variations, an existing design f... [more] VLD2006-118 ICD2006-209
pp.73-78
VLD, IPSJ-SLDM 2006-05-12
14:00
Ehime Ehime University Measurement and Analysis of Delay and Power Variations in 90nm CMOS Circuits
Masaki Yamaguchi (Kyushu Univ.), Yang Yuan (Xi'an Univ. of Technology), Kosuke Tarumi, Ryota Sakamoto, Masanori Muroyama, Tohru Ishihara, Hiroto Yasuura (Kyushu Univ.)
As the transistor size shrinks, process variations increase. Under the existence of the variations, an existing design f... [more] VLD2006-13
pp.41-46
 Results 1 - 11 of 11  /   
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