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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM |
2013-11-14 13:50 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Atomistic Study of Sulfur Diffusion and S2 Formation in Silicon during Low-temperature Rapid Thermal Annealing Takahisa Kanemura, Koichi Kato, Hiroyoshi Tanimoto, Nobutoshi Aoki, Yoshiaki Toyoshima (Toshiba) SDM2013-102 |
Sulfur doping at NiSi/Si junction has been found to make a Schottky barrier height ultimately small, revealing almost ze... [more] |
SDM2013-102 pp.15-20 |
LQE, LSJ |
2011-05-20 11:05 |
Ishikawa |
Kanazawa Univ. (Natural Sci. Tech. Main Bldg.) |
Research on a high-resolution optical spectrum control circuit and its application to a band-limited transmission system Tatsuhiko Ikeda, Koichi Kato, Yuichiro Ikuma (Keio Univ.), Hiroshi Takahashi, Takayuki Mizuno (NTT Corp.), Hiroyuki Tsuda (Keio Univ.) LQE2011-4 |
Optical signal processing based on time-to-space conversion is key technology in high speed optical communication system... [more] |
LQE2011-4 pp.13-16 |
ISEC, SITE, IPSJ-CSEC |
2006-07-20 10:20 |
Okayama |
Okayama Univ. |
A Study on Dynamic Risk Analysis Corresponding to Environmental Changes Hideaki Kawanishi, Koichi Kato, Tatsuaki Takahashi, Ramirez Caceres Guillermo Horacio, Yoshimi Teshigawara (Soka Univ.) |
(To be available after the conference date) [more] |
ISEC2006-17 SITE2006-14 pp.59-66 |
SDM |
2006-06-22 10:55 |
Hiroshima |
Faculty Club, Hiroshima Univ. |
Realization of SiON films with small ΔVfb Daisuke Matsushita, Koichi Muraoka, Yasushi Nakasaki, Koichi Kato, Shoko Kikuchi, Kiwamu Sakuma, Yuichiro Mitani (toshiba R&D center), Mariko Takayanagi, Kazuhiro Eguchi (Semiconductor Company) |
[more] |
SDM2006-56 pp.81-86 |
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