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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM |
2011-02-07 16:25 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Highly Manufacturable ELK Integration Technology with Metal Hard Mask Process for High Performance 32nm-node Interconnect and Beyond S. Matsumoto, T. Harada, Y. Morinaga, D. Inagaki, J. Shibata, K. Tashiro, T. Kabe, Akihisa Iwasaki, S. Hirao, M. Tsutsue, K. Nomura, K. Seo, T. Hinomura, Naoki Torazawa, S. Suzuki (Panasonic) SDM2010-226 |
High performance 32nm-node interconnect with ELK (Extremely Low-k, k=2.4) has been demonstrated. The two main key techno... [more] |
SDM2010-226 pp.59-63 |
SDM |
2010-02-05 13:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Advanced Direct-CMP Process for Porous Low-k Thin Film Hayato Korogi (Panasonic), Hiroyuki Chibahara (Renesas), S. Suzuki, M. Tsutsue (Panasonic), K. Seo (Panasonic Semiconductor Engineering), Y. Oka, K. Goto, M. Akazaw, Hiroshi Miyatake (Renesas), S. Matsumoto, T. Ueda (Panasonic) SDM2009-185 |
In order to reduce the effective dielectric constant (keff) for the 32 nm technology node and beyond, Direct-CMP of a po... [more] |
SDM2009-185 pp.19-23 |
MI |
2005-09-22 11:30 |
Overseas |
Korea Univ. Kuro Hospital |
Study of Inhomogeneities in Crystals by X-ray Synchrotron Imaging T. S. Argunova (RAS), J. M. Yi, M. U. Kim, S. K. Seol, A. R. Pyun, J. H. Je (Pohang Univ. of Science and Technology), L. M. Strokin (RAS) |
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