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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM, LQE, ED 2010-11-11
13:25
Osaka   ELO-AlN on trench-patterned AlN/sapphire by low-pressure HVPE
Kohei Fujita, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.), Jyun Norimatsu, Hideki Hirayama (Riken) ED2010-147 CPM2010-113 LQE2010-103
 [more] ED2010-147 CPM2010-113 LQE2010-103
pp.25-28
ED, LQE, CPM 2009-11-20
09:30
Tokushima Univ. of Tokushima (Josanjima Campus, Kogyo-Kaikan) AlN growth on period trench patterned AlN/sapphire by Low-pressure HVPE
Kohei Fujita, Kazuteru Okuura, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.), Jyun Norimatsu, Hideki Hirayama (Riken) ED2009-147 CPM2009-121 LQE2009-126
High-quality AlN thick film were grown on trench-patterned AlN template by Low-pressure HVPE. Compared with the normal t... [more] ED2009-147 CPM2009-121 LQE2009-126
pp.91-94
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