|
|
All Technical Committee Conferences (Searched in: All Years)
|
|
Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
|
Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
ED |
2015-04-17 09:55 |
Miyagi |
Laboratory for Nanoelectronics and Spintronics |
Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen Kensaku Kanomata, Hisashi Ohba, P. Pungboon Pansila, Bashir Ahmmad Arima, Shigeru Kubota, Kazuhiro Hirahara, Fumihiko Hirose (Yamagata Univ.) ED2015-11 |
Room-temperature atomic layer deposition (ALD) of hafnium dioxide is developed using tetrakis(ethylmethylamino)hafnium (... [more] |
ED2015-11 pp.53-58 |
CPM |
2014-09-05 12:20 |
Yamagata |
The 100th Anniversary Hall, Yamagata University |
Anti-corrosion films prepared by RT atomic layer deposition Fumihiko Hirose, Kensaku Kanomata, Hisashi Ohba, Bashir Ahmmad, Shigeru Kubota, Kazuhiro Hirahara (Yamagata Univ.) CPM2014-89 |
[more] |
CPM2014-89 pp.75-77 |
ED |
2014-04-18 09:50 |
Yamagata |
The 100th Anniversary Hall, Yamagata University |
Fabrication of hafnium oxide using room-temperature atomic layer deposition Kensaku Kanomata, Hisashi Ohba, Bashil Ahmmad Arima, Shigeru Kubota, Kazuhiro Hirahara, Fumihiko Hirose (Yamagata Univ.) ED2014-13 |
Room-temperature atomic layer deposition (ALD) of hafnium dioxide is developed using tetrakis(ethylmethylamino)hafnium (... [more] |
ED2014-13 pp.51-54 |
ED |
2014-04-18 10:15 |
Yamagata |
The 100th Anniversary Hall, Yamagata University |
Test fabrication of HfO2-MOS capacitors using room temperature atomic layer deposition Hisashi Ohba, Kensaku Kanomata, Bashil Ahmmad Arima, Shigeru Kubota, Fumihiko Hirose (Yamagata Univ.) ED2014-14 |
(To be available after the conference date) [more] |
ED2014-14 pp.55-58 |
CPM |
2013-10-25 09:30 |
Niigata |
Niigata Univ. Satellite Campus TOKIMEITO |
Fabrication of titanium oxide using plasma excited atomic layer deposition Kensaku Kanomata, Hisashi Ohba, Katsuaki Momiyama, Takahiko Suzuki, Bashil Ahmmad, Shigeru Kubota, Kazuhiro Hirahara, Fumihiko Hirose (Yamagata Univ.) CPM2013-102 |
Room-temperature atomic layer deposition (ALD) of titanium dioxide is developed using tetrakis(dimethylamino)titanium (T... [more] |
CPM2013-102 pp.45-48 |
|
|
|
Copyright and reproduction :
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
|
[Return to Top Page]
[Return to IEICE Web Page]
|