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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 6 of 6  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2008-08-04
14:00
Hokkaido Muroran Institute of Technology Development of Surface-Wave Plasma Generation Apparatus and Application to Semiconductor Processing
Hisashi Fukuda (Muroran Inst. Technol.), Masakazu Furukawa (ARIC) CPM2008-41
We have developed a high-density surface-wave plasma apparatus for the application to next generation semiconductor fabr... [more] CPM2008-41
pp.1-4
CPM 2008-08-04
15:25
Hokkaido Muroran Institute of Technology Organic Thin Film Transistor with Substituted Polyacetylenes containing Hetero Atoms
Tetsuya Imamura, Yasuteru Mawatari, Hisashi Fukuda, Masayoshi Tabata (Muroran Inst. Technol) CPM2008-44
Organic thin film transistors (OTFTs) using substituted polyacetylenes which have a helical form were fabricated. Substi... [more] CPM2008-44
pp.15-18
CPM 2008-08-04
15:50
Hokkaido Muroran Institute of Technology Poly-3-hexylthiophene Thin Film Formation and Application to Organic Thin Film Transistor
Hisashi Fukuda, Katsuhiro Uesugi (Muroran Inst. Technol.) CPM2008-45
Regioregular poly-3-hexylthiophene (P3HT) thin films were formed using a spin coating technique. After deposition in a m... [more] CPM2008-45
pp.19-22
CPM 2008-08-04
16:15
Hokkaido Muroran Institute of Technology Pentacene Thin Film Formation and Application to Organic Transistor
Yoshihiro Tada, Shinya Yamada, Katsuhiro Uesugi, Hisashi Fukuda (Muroran Inst. Technol.) CPM2008-46
We have fabricated an organic thin film transistor (OTFT) with an active layer of pentacene thin film evaporated by vacu... [more] CPM2008-46
pp.23-26
EMD, CPM, LQE, OPE 2006-08-25
10:05
Hokkaido Chitose Arcadia Plaza Development of Surface Wave Excitation Plasma Generation Apparatus and Application to Semiconductor Processing
Haruki Shoji, Hisashi Fukuda, Masakazu Furukawa (Muroran Inst. Tech.)
 [more] EMD2006-37 CPM2006-67 OPE2006-79 LQE2006-44
pp.67-70
CPM, EMD, OME 2006-06-30
15:15
Tokyo Kikai-Shinko-Kaikan Bldg. Poly-3-hexylthiophene Thin Film Formation and Application to Organic Thin Film Transistor
Hisashi Fukuda, Takashi Kojima, Katsuhiro Uesugi (Muroran Inst. Technol.)
 [more] EMD2006-12 CPM2006-36 OME2006-46
pp.39-44
 Results 1 - 6 of 6  /   
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