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SDM 2007-12-14
15:10		 Nara Nara Institute Science and Technology Interface modification by NH3 plasma in SiNx passivation for solar cell
Yuki Kishiyama, Yu Takahashi, Akiyoshi Ogane, Athapol Kitiyanan, Yukiharu Uraoka, Takashi Fuyuki (NAIST) SDM2007-232		 The effect of NH3 plasma treatment on p-type (Fz) Si substrates was investigated relating with the post annealing proces... [more] SDM2007-232
pp.43-46
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