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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2018-10-17
Miyagi Niche, Tohoku Univ. Low-Temperature Formation of Ohmic Contact for Si TFT Fabrication by Excimer Laser Doping with Phosphoric Acid Coating
Kaname Imokawa (Kyushu Univ), Nozomu Tanaka (Kyushu Univ.), Akira Suwa (Kyushu Univ), Daisuke Nakamura, Taizoh Sadoh (Kyushu Univ.), Tetsuya Goto (New Industry Creation Hatchery Center, Tohoku Univ.), Hiroshi Ikenoue (Kyushu Univ) SDM2018-54
There are some issues in printable Si TFT processes. In particlular, formation of ormic contact of silicon TFT requiers ... [more] SDM2018-54
SDM, OME 2016-04-08
Okinawa Okinawa Prefectural Museum & Art Museum Multi-shots ELA of sputtered Si film and TFT with metal source-drain structure
Taisei Harada, Futa Gakiya, Takuya Ashitomi, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus), Kanji Noda, Akira Suwa (GiGAPHOTON Inc.), Hiroshi Ikenoue (Kyusyu Univ.), Tetsuo Okuyama (TOYOBO Company, Limited) SDM2016-10 OME2016-10
 [more] SDM2016-10 OME2016-10
ED 2006-12-08
Tokyo Kikai-Shinko-Kaikan Bldg. Fabrication of hot electron transistor controlled by insulation gate
Akira Suwa, Takashi Hasegawa, Takahiro Hino, Yasuyuki Miyamoto, Kazuhito Furuya (Tokyo Tech)
ED, MW 2006-01-18
Tokyo Kikai-Shinko-Kaikan Bldg. Increase of colllector current in hot eletron transistors controlled by gate bias
Issei Kashima, Akira Suwa (Tokyo Tech), Yasuyuki Miyamoto, Kazuhito Furuya (Tokyo Tech JST-CREST)
 [more] ED2005-196 MW2005-150
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