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Committee Date Time Place Paper Title / Authors Abstract Paper #
LQE, ED, CPM 2014-11-27
14:30
Osaka   Two-Dimensional Strain Mapping of GaN Templates Fabricated by Nano-Channel FIELO Method Using Nanoimprint Lithography
Masanori Nambu, Atsushi Yamaguchi (Kanazawa Inst. of Tech.), Hiroki Goto, Haruo Sunakawa, Toshiharu Matsueda (Furukawa Co. Ltd.), Akiko Okada (Waseda Univ.), Hidetoshi Shinohara, Hiroshi Goto (Toshiba Machine Co. Ltd.), Jun Mizuno (Waseda Univ.), Akira Usui (Furukawa Co. Ltd.) ED2014-80 CPM2014-137 LQE2014-108
The efficiency droop phenomenon is a big problem for high-brightness white LEDs. It has been pointed out that the proble... [more] ED2014-80 CPM2014-137 LQE2014-108
pp.33-38
ED 2013-04-18
15:55
Miyagi   [Invited Talk] Study of High Quality GaN Template by Nano-channel FIELO Using UV Nanoimprint
Jun Mizuno, Akiko Okada, Shuichi Shoji (Waseda Univ.), Atsushi Yamaguchi (Kanazawa Inst. of Tech.), Hiroki Goto, Haruo Sunakawa, Toshiharu Matsueda (Furukawa), Hidetoshi Shinohara, Hiromi Nishihara, Hiroshi Goto (Toshiba Machine), Akira Usui (Furukawa) ED2013-8
Nano-channel FIELO (facet-initiated lateral overgrowth) using UV nanoimprint has been proposed. The etch pit density mea... [more] ED2013-8
pp.27-29
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