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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| OME | 2023-11-01 16:25 |
Hyogo | JIBASAN Bidg. (Himeji) | Inprovement of hole injection of NiOx using phosphonic acid-based self-assembled monolayer and Application toward printed light-emmiting diodes Shinsei Yamada, Hirotake Kajii, Maowei Huang, Akihito Okamoto (Osaka Univ.), Shintaro Toda, Mizuki Kuniyoshi (ULVAC), Masahiko Kondo (Osaka Univ.)  OME2023-50 |
[more] | OME2023-50 pp.36-39 |
| CPM, LQE, ED | 2019-11-21 13:20 |
Shizuoka | Shizuoka Univ. (Hamamatsu) | Characterization of plasma-induced damage of GaN trench sidewall formed by ICP-RIE Shinji Yamada, Hideki Sakurai (Nagoya Univ./ULVAC), Yamato Osada, Toshiyuki Nakamura, Ryuichiro Kamimura (ULVAC), Jun Suda, Tetsu Kachi (Nagoya Univ.) ED2019-40 CPM2019-59 LQE2019-83 |
(To be available after the conference date) [more] | ED2019-40 CPM2019-59 LQE2019-83 pp.33-35 |
| EID, ITE-IDY, IEIJ-SSL, SID-JC, IEE-EDD [detail] | 2019-01-25 09:50 |
Kagoshima | Kagoshima University | Study of Hole Transport Materials for High Efficient Light-Emitting Diodes using Low Toxic Quantum Dots Kei Ogura, Genichi Motomura, Toshimitsu Tsuzuki, Yoshihide Fujisaki (NHK), Junki Nagakubo, Masaaki Hirakawa, Tsutomu Nishihashi (ULVAC) |
[more] | |
| WPT, EE (Joint) |
2018-10-03 09:55 |
Kyoto | Kyoto Univ. Uji Campus | GaN diode rectifier with recessed gate FET for wireless power transfer Jumpei Sumino, Yuya Ikedo (NITech), Yamato Osada, Ryuichiro Kamimura (ULVAC), Akio Wakejima (NITech) WPT2018-30 |
(To be available after the conference date) [more] | WPT2018-30 pp.5-9 |
| EID, ITE-IDY, SID-JC [detail] | 2018-07-30 13:00 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | [Invited Lecture]
Solution Synthesis of High-Quality Indium-Nitride Junki Nagakubo, Masaaki Hirakawa, Tsutomu Nishihashi, Hirohiko Murakami (ULVAC) |
[more] | |
| LQE, CPM, ED | 2017-12-01 10:55 |
Aichi | Nagoya Inst. tech. | Achievement of AlGaN deep-UV LED using photonic crystal(PhC)
-- Achievement of high-EQE(10%) AlGaN deep-UV LED using highly-reflective PhC on p-contact layer -- Yukio Kashima (Marubun), Noritoshi Maeda (RIKEN), Eriko Matsuura (Marubun), Masafumi Jo (RIKEN), Takeshi Iwai, Toshiro Morita (TOK), Mitsunori Kokubo, Takaharu Tashiro (TOSHIBA MACHINE), Ryuichiro Kamimura, Yamato Osada (ULVAC), Yuichi Kurashima, Hideki Takagi (AIST), Hideki Hirayama (RIKEN) ED2017-60 CPM2017-103 LQE2017-73 |
[more] | ED2017-60 CPM2017-103 LQE2017-73 pp.55-60 |
| LQE, ED, CPM | 2014-11-27 14:05 |
Osaka | The micro machining process technology of nano imprint and dry etching to improve the efficiency of nitride LED Yukio Kashima, Eriko Matsuura (Marubun), Satoshi Shimatani (TOK), Mitsunori Kokubo, Takaharu Tashiro, Takafumi Ookawa (Toshiba Machine), Ryuichiro Kamimura, Yamato Osada (ULVAC), Sachie Fujikawa, Hideki Hirayama (RIKEN) ED2014-79 CPM2014-136 LQE2014-107 |
We fabricated the photonic crystal in nitride LED and improved the light extraction efficiency. We also introduce the mi... [more] | ED2014-79 CPM2014-136 LQE2014-107 pp.27-32 |
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| LQE, ED, CPM | 2014-11-27 14:55 |
Osaka | Fabrication of high-quality AlN buffer layer for deep-UV LEDs grown on wet chemical etched patterned sapphire substrate Yuya Kanazawa, Shiro Toyoda, Issei Ohshima (Saitama Univ./RIKEN), Norihiko Kamata (Saitama Univ.), Yukio Kashima (Marubun), Eriko Matsuura (MARUBUN), Satoshi Shimatani (TOK), Mitsunori Kokubo, Takaharu Tashiro (TOSHIBA MACHINE), Takashi Ohkawa, Ryuichiro Kamimura, Yamato Osada (ULVAC), Hideki Hirayama (RIKEN) ED2014-81 CPM2014-138 LQE2014-109 |
[more] | ED2014-81 CPM2014-138 LQE2014-109 pp.39-44 |
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| CPM | 2007-11-16 16:10 |
Niigata | Nagaoka University of Technology | Characterization and barrier properties of ZrB2 thin films for Cu interconnects Mayumi B. Takeyama (Kitami Inst. of Technol.), Yasuo Nakadai, Shozo Kambara (ULVAC Materials, Inc.), Masanobu Hatanaka (ULVAC, Inc.), Atsushi Noya (Kitami Inst. of Technol.) CPM2007-111 |
The extremely thin diffusion barrier deposited at low temperature is urgently required for reliable Cu interconnects ap... [more] |
CPM2007-111 pp.35-38 |
| SDM | 2007-06-08 13:10 |
Hiroshima | Hiroshima Univ. ( Faculty Club) | Electrical Properties of Al2O3 Thin Films Prepared by RF Magnetron Sputtering Method Yutaka Nishioka, Shin Kikuchi, Isao Kimura, Takehito Jimbo, Koukou Suu (ULVAC) SDM2007-46 |
We prepared the LaAlO3 thin films by RF magnetron sputtering on 8ich p-Si(100) substrate for High-k gate insulator. Afte... [more] | SDM2007-46 pp.81-83 |
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