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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2006-11-09
15:45
Ishikawa Kanazawa Univ. Reactive Sputter Deposition of AlN Film and Its Application to LD Submount
Akihiro Shiono, Masahide Nakakuki, Isao Kobayashi, Tomohiko Yamakami, Rinpei Hayashibe (Shinshu Univ.), Motoki Obata (CITIZEN FINE TECH), Katsuya Abe, Kiichi Kamimura (Shinshu Univ.)
 [more] CPM2006-118
pp.31-35
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