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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| MRIS, ITE-MMS | 2013-11-15 13:25 |
Tokyo | Waseda Univ. | Characterization and analysis of deposition behavior of ultra-high density ferromagnetic nanodot arrays fabricated by electrochemical processes Siggi Wodarz, Yuta Maniwa, Hiroki Hagiwara, Tomohiro Otani, Daiki Nishiie (Waseda Univ.), Giovanni Zangari (UVA), Takayuki Homma (Waseda Univ.)  MR2013-20 |
We fabricated hcp-Co80Pt20 and L10-FePt thin films and nanodot arrays onto hcp-Ru (002) / Si substrate by electrodeposit... [more] | MR2013-20 pp.7-10 |
| EST, MWP, OPE, MW, EMT, IEE-EMT [detail] | 2013-07-18 11:25 |
Hokkaido | Wakkanai Synthesis Cultural Center | Trial Fabrication of 180 GHz-Band PTFE-Filled Waveguide by SR Etching and Its Evaluation Mitsuyoshi Kishihara (Okayama Pref. Univ.), Hideki Kido, Akinobu Yamaguchi, Yuichi Utsumi, Isao Ohta (Univ. of Hyogo) MW2013-64 OPE2013-33 EST2013-28 MWP2013-23 |
This paper describes trial fabrication of a PTFE-filled waveguide for 180 GHz-band operation with the use of the SR (syn... [more] | MW2013-64 OPE2013-33 EST2013-28 MWP2013-23 pp.103-108 |
| MRIS, ITE-MMS | 2013-07-12 14:15 |
Tokyo | Chuo Univ. | Characterization and analysis of deposition process of ultra-high density magnetic nanodot arrays fabricated by electrochemical processes Siggi Wodarz, Yuta Maniwa, Hiroki Hagiwara, Takayuki Homma (Waseda Univ.) MR2013-8 |
We have been fabricating ferromagnetic nanodot arrays for bit patterned media (BPM) by using lithography techniques and ... [more] | MR2013-8 pp.13-17 |
| IT, ISEC, WBS | 2013-03-08 11:45 |
Osaka | Kwansei Gakuin Univ., Osaka-Umeda Campus | Nano Artifact-metrics based on Resist Collapsing Tsutomu Matsumoto, Kenta Hanaki, Ryosuke Suzuki, Daiki Sekiguchi (Yokohama National Univ.), Morihisa Hoga, Yasuyuki Ohyagi (DNP), Makoto Naruse (NICT), Naoya Tate, Motoichi Ohtsu (Univ. of Tokyo) IT2012-96 ISEC2012-114 WBS2012-82 |
Artifact-metrics is an automated method of utilizing physical artifacts based on their measurable intrinsic characterist... [more] | IT2012-96 ISEC2012-114 WBS2012-82 pp.217-222 |
| SDM | 2011-12-16 14:00 |
Nara | NAIST | Fabrication of 2D Photonic-Crystal by ZnO using Gel-Nanoimprint Process Min Zhang, Shinji Araki, Li Lu, Masahiro Horita, Takashi Nishida, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST) SDM2011-140 |
In this research, 2D-photonic-crystal ZnO films were fabricated using sol-gel spin-coating and nanoimprint lithography (... [more] | SDM2011-140 pp.43-46 |
| VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM (Joint) [detail] |
2011-11-29 13:00 |
Miyazaki | NewWelCity Miyazaki | Layout Methodology for Self-Alinged Double Patterning Chikaaki Kodama, Koichi Nakayama, Toshiya Kotani, Shigeki Nojima, Shoji Mimotogi, Shinji Miyamoto (Toshiba) VLD2011-76 DC2011-52 |
We propose a new layout method for the damascene process of self-aligned double patterning (SADP). In this method, w... [more] |
VLD2011-76 DC2011-52 pp.141-146 |
| VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM (Joint) [detail] |
2011-11-29 17:00 |
Miyazaki | NewWelCity Miyazaki | [Keynote Address]
Lithography : past, present, and future Shigeki Nojima (Toshiba) VLD2011-81 CPM2011-161 ICD2011-93 CPSY2011-48 DC2011-57 RECONF2011-49 |
Lithography is one of the key technologies for semiconductor device shrink. For example, wave length becomes shorter an... [more] |
VLD2011-81 CPM2011-161 ICD2011-93 CPSY2011-48 DC2011-57 RECONF2011-49 p.171(VLD), p.65(CPM), p.65(ICD), p.33(CPSY), p.171(DC), p.45(RECONF) |
| OPE, OME | 2011-11-18 15:00 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Dependence of normalized period on fundamental optical properties of periodic-structure-imprinted polymeric films Masaya Nishi (Nagaoka Univ. of Tech.), Makoto Okada, Shinji Matsui, Nobuhiro Kawatsuki (Univ. of Hyogo), Hiroshi Ono (Nagaoka Univ. of Tech.) OME2011-62 OPE2011-137 |
One of the recent intense interests in nanoimprinting technologies stems from potential ability to easily fabricate the ... [more] | OME2011-62 OPE2011-137 pp.25-30 |
| OPE, OME | 2011-11-18 15:25 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Fabrication of Step-Edge Vertical Channel Organic Field-Effect Transistors Using Nanoimprint Lithography Masahiro Fukiyama, Hiroshi Yamauchi, Masaaki Iizuka, Masatoshi Sakai, Kazuhiro Kudo (Chiba Univ.) OME2011-63 OPE2011-138 |
The reduction of channel length is one of the effective approaches to achieve the low operation voltage and large curren... [more] | OME2011-63 OPE2011-138 pp.31-36 |
| ED | 2011-10-20 16:45 |
Aomori | Study on the electron gun for Micro-Column Electron Beam Takahiro Fujino, Akifumi Koike (RIE Shizuoka Univ), Masayoshi Nagao, Tomoya Yoshida, Takashi Nishi (AIST), Hidekazu Murata, Kentaro Sakai (Meijo Univ), Yoichiro Neo, Toru Aoki, Hidenori Mimura (RIE Shizuoka Univ) ED2011-65 |
Our final goal is to fabricate truly meaning micro-column, that consists of micro-sized field emitter and electro optics... [more] | ED2011-65 pp.27-32 |
|
| PN | 2011-08-01 15:10 |
Hokkaido | Hakodate-shi Kinrousha Sougou Fukushi Center | [Invited Talk]
GI-core polymer optical waveguide to high-speed and high-density on-board interconnection Takaaki Ishigure (Keio Univ.) PN2011-16 |
Optical interconnection has been highly anticipated as a promising technology for next generation high-performance compu... [more] | PN2011-16 pp.25-30 |
| ED | 2010-10-25 16:35 |
Kyoto | Fabrication and Evaluation of Electron Gun for the Micro-Column to controll a radiation angle Takahiro Fujino, Yasuo Takagi, Akifumi Koike (Shizuoka Univ.), Masayoshi Nagao, Tomoya Yoshida (AIST), Hidekazu Murata, Kentaro Sakata (Meijo Univ.), Yoichiro Neo, Toru Aoki, Hidenori Mimura (Shizuoka Univ.) ED2010-135 |
Our final goal is to fabricate truly meaning micro-column, that consists of micro-sized field emitter and electro optics... [more] | ED2010-135 pp.39-42 |
|
| OME | 2010-10-22 14:40 |
Tokyo | NTT Musashino R&D Center | Detachment properties of fluorinated hydrocarbon containing adsorbed monolayers on a radical-type UV-cured resin Akihiro Kohno, Masaru Nakagawa (Tohoku Univ.) OME2010-50 |
Adsorbed monolayers from (3,3,3-trifluoropropyl)trimethoxysilane (FAS3), (tridecafluoro-1,1,2,2-tetrahydro- octyl)trime... [more] |
OME2010-50 pp.21-25 |
| OME | 2010-10-22 15:40 |
Tokyo | NTT Musashino R&D Center | Patterning of source-drain electrodes for organic thin film transistors by softlithography Yusuke Ura, Eiji Itoh (Shinshu Univ.) OME2010-52 |
We have investigated the condition of direct patterning of sorce-drain(S-D) electrodes of fullerene (C60) thin film tra... [more] |
OME2010-52 pp.33-36 |
| MW | 2010-05-13 16:50 |
Hyogo | University of Hyogo | Fabrication and Evaluation of PTFE-Filled Waveguide Bandpass Filter by SR Direct Etching Mitsuyoshi Kishihara (Okayama Pref. Univ.), Hiroaki Ikeuchi, Katsuya Murai, Yuichi Utsumi, Tadashi Kawai, Isao Ohta (Univ. of Hyogo) MW2010-19 |
It has been reported that a waveguide structure suitable for millimeter-wave and submillimeter-wave applications can be ... [more] | MW2010-19 pp.29-33 |
| SDM | 2010-02-05 11:20 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Feasibility Study of 70nm Pitch Cu/Porous Low-k D/D Integration Featuring EUV Lithography toward 22nm Generation Naofumi Nakamura, Noriaki Oda, Eiichi Soda, Nobuki Hosoi, Akifumi Gawase, Hajime Aoyama, Y. Tanaka, D. Kawamura, S. Chikaki, M. Shiohara, Nobuaki Tarumi, S. Kondo, Ichiro Mori, S. Saito (SELETE) SDM2009-184 |
A feasibility study of 70 nm pitch 2-level dual damascene interconnects featuring EUV lithography is presented. Using Ru... [more] | SDM2009-184 pp.13-18 |
| OPE, EMT, LQE, PN, IEE-EMT | 2010-01-29 14:25 |
Kyoto | Aluminum surface plasmon color filter Naoki Ikeda, Daiju Tsuya, Yoshimasa Sugimoto, Yasuo Koide (National Inst. for Materials Science), Atsushi Miura, Daisuke Inoue, Tsuyoshi Nomura, Hisayoshi Fujikawa, Kazuo Sato (Toyota CRDL) PN2009-59 OPE2009-197 LQE2009-179 |
In order to realize surface plasmon color filter we fabricated precise hole array which lattice constant of 300~400nm us... [more] | PN2009-59 OPE2009-197 LQE2009-179 pp.129-132 |
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| ED, LQE, CPM | 2009-11-19 18:00 |
Tokushima | Univ. of Tokushima (Josanjima Campus, Kogyo-Kaikan) | GaN Photodetector with Nanostructure on Surface Jing Zhang, Yoshiki Naoi, Shiro Sakai (Univ. of Tokushima), Atsuyuki Fukano, Satoru Tanaka (SCIVAX) ED2009-146 CPM2009-120 LQE2009-125 |
Conventional photodetector can detect intensity of incident light by voltage or current, but it is not intensive to the ... [more] | ED2009-146 CPM2009-120 LQE2009-125 pp.85-89 |
| ITE-MMS, MRIS | 2009-11-13 13:45 |
Tokyo | Waseda Univ. | Effect of magnetic dot shape in BPM on magnetic and R/W performance with 1 Tbit/in2 regime Jun Ariake, Yuji Kondo (Akita Research and Development Center), Shunji Ishio (Akita Univ.), Naoki Honda (Tohoku Inst. of Tech.) MR2009-30 |
Fine magnetic dot arrays with an areal density around 1 Tbit/in2 were fabricated for obtaining fabrication process issue... [more] | MR2009-30 pp.7-12 |
| ED | 2009-10-15 13:55 |
Fukui | Fabrication and measurement of FEA with a built-in electrostatic lens Tomoya Tagami, Akifumi Koike, Yasuo Takagi (Shizuoka Univ.), Masayoshi Nagao, Tomoya Yoshida, Seigo Kanemaru (AIST), Yoichiro Neo, Toru Aoki, Hidenori Mimura (Shizuoka Univ.) ED2009-117 |
We have proposed the new applications by using a fine focusing crossover electron beam from FEA such as electron beam m... [more] | ED2009-117 pp.7-10 |
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