Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SANE |
2013-12-02 09:30 |
Overseas |
VAST/VNSC(2nd Dec.) & Melia Hotel (3rd Dec), Hanoi, Vietnam |
Measurement for Permittivity and Thickness of Multilayered Dielectric Plate by Through Radar Hirokazu Kobayashi (Osaka Institute of Tech.) SANE2013-71 |
Using wall-through radar, we can obtain image of the front object by means of scanning an antenna mechanically or electr... [more] |
SANE2013-71 pp.1-6 |
CPM, LQE, ED |
2013-11-28 11:25 |
Osaka |
|
Study on improvement of the light extraction efficiency in 350-nm-emission UV-LED Tsubasa Nakashima, Kenichiro Takeda, Motoaki Iwaya, Satoshi Kamiyama, Tetsuya Takeuchi, Isamu Akasaki (Meijo Univ.), Hiroshi Amano (Nagoya Univ.) ED2013-66 CPM2013-125 LQE2013-101 |
We have aimed to improve the light extraction efficiency by using p- and n- high-reflectivity indium tin oxide /Al elect... [more] |
ED2013-66 CPM2013-125 LQE2013-101 pp.11-16 |
SANE |
2013-08-23 14:55 |
Niigata |
Niigata University Igarashi campus |
Estimation of Equivalent Permittivity and Thickness of Multilayered Dielectric by Wall-through Radar Hirokazu Kobayashi (Osaka Inst. of Tech.), Shun-ichi Takaoka, Yoshio Yamaguchi (Niigata Univ.), Hong Zhou (Osaka Inst. of Tech.) SANE2013-49 |
By wall-through radar, we can acquire image of the front object by scanning an antenna mechanically or electrically.In t... [more] |
SANE2013-49 pp.23-30 |
EE, WPT, IEE-SPC (Joint) [detail] |
2013-07-25 09:55 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Study on optimization of resonators for a WPT system Yuichi Sawahara, Toshio Ishizaki (Ryukoku Univ), Ikuo Awai (Ryutech) |
It is necessary to improve the characteristics of unloaded Q (Qu) and coupling coefficient (k) to improve the transmissi... [more] |
|
US |
2012-08-28 14:10 |
Overseas |
Pukyong National University |
Fiber-Optic Ultrasonic Hydrophone Using Short Fabry-Perot Cavity with Multilayer Reflectors Kyung-Su Kim, Yosuke Mizuno, Kentaro Nakamura (Tokyo Inst. of Tech.) US2012-53 |
Fiber-optic probe with dielectric multilayer films deposited on an optical fiber is studied for mega-hertz detection in ... [more] |
US2012-53 pp.93-98 |
SDM |
2012-06-21 11:55 |
Aichi |
VBL, Nagoya Univ. |
Oxygen-induced high-k dielectric degradation in TiN/Hf-based high-k gate stacks Takuji Hosoi, Yuki Odake, Hiroaki Arimura, Keisuke Chikaraishi, Naomu Kitano, Takayoshi Shimura, Heiji Watanabe (Osaka Univ.) SDM2012-51 |
Effective work function control and equivalent oxide thickness (EOT) scaling are the major concerns for implementing met... [more] |
SDM2012-51 pp.43-46 |
OFT |
2012-05-25 09:50 |
Gifu |
Hida, Earth Wisdom Center |
Hollow-optical fiber bundle consists of dielectric thin film Shun Kobayashi, Takashi Katagiri, Yuji Matsuura (Tohoku Univ.) OFT2012-12 |
An all-dielectric hollow-optical fiber that is fabricated without metal plating process is proposed. This fiber consists... [more] |
OFT2012-12 pp.55-59 |
ED, MW |
2012-01-11 10:40 |
Tokyo |
Kikai-Shinko-Kaikan Bldg |
A Fundamental Study on Super Thin One-Layered Wave Absorber Using a High Dielectric Loss Material in Microwave Band Takato Fujita, Yuki Tsuda, Takenori Yasuzumi, Osamu Hashimoto (Aoyama Gakuin Univ.), Takashi Wano, Yuuki Fukuda (NITTO Denko LTD.) ED2011-120 MW2011-143 |
In this paper, the fabrication of a super thin wave absorber using a dielectric loss material was studied.Firstly, the r... [more] |
ED2011-120 MW2011-143 pp.7-12 |
OFT |
2011-05-27 10:00 |
Kagoshima |
|
Refractive index sensor for liquids and solids using dielectric multilayer films deposited on optical fiber end surface Kyung-Su Kim, Yosuke Mizuno (Tokyo Inst. of Tech.), Masayuki Nakano, Seiichi Onoda (Watanabe), Kentaro Nakamura (Tokyo Inst. of Tech.) OFT2011-10 |
Fiber-optic refractive index (RI) sensors have been extensively studied for chemical, engineering, and biomedical applic... [more] |
OFT2011-10 pp.43-48 |
AP |
2011-01-21 14:15 |
Saga |
Saga Univ. |
Gain enhancement of a planar dipole antenna integrated with a 60-GHz band small module using 3-dimensional system-in-package technology Satoshi Yoshida, Shoichi Tanifuji, Suguru Kameda, Noriharu Suematsu, Tadashi Takagi, Kazuo Tsubouchi (Tohoku Univ.) AP2010-157 |
We analyzed and implemented a 60-GHz band planar dipole antenna with extended dielectric substrate. As a result of param... [more] |
AP2010-157 pp.141-146 |
SDM |
2010-11-11 14:40 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Comprehensive understanding of oxygen vacancy induced effective work function modulation in high-k/metal gate stacks Takuji Hosoi, Masayuki Saeki, Yuki Kita, Yudai Oku, Hiroaki Arimura, Naomu Kitano (Osaka Univ.), Kenji Shiraishi, Keisaku Yamada (Univ. Tsukuba), Takayoshi Shimura, Heiji Watanabe (Osaka Univ.) SDM2010-175 |
Effective work function of p-type gate electrodes on Hf-based high-k dielectrics is known to decrease after high tempera... [more] |
SDM2010-175 pp.23-28 |
ED, SDM |
2010-07-02 12:00 |
Tokyo |
Tokyo Inst. of Tech. Ookayama Campus |
The Analysis of Temperature Dependency of the Mobility In High-k/Metal Gate MOSFET and the Performance on its CMOS Inverter Takeshi Sasaki, Takuya Imamoto, Tetsuo Endoh (Tohoku Univ.) ED2010-92 SDM2010-93 |
As the integration density and capacitance of semiconductor devices have increased, high-dielectric (High-k) materials h... [more] |
ED2010-92 SDM2010-93 pp.177-182 |
SDM |
2010-02-05 13:30 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Optimization of Metallization Processes for 32-nm node Highly Reliable Ultralow-k (k=2.4)/Cu Multilevel Interconnects Incorporating a Bilayer Low-k Barrier Cap (k=3.9) M. Iguchi, S. Yokogawa, Hirokazu Aizawa, Y. Kakuhara, Hideaki Tsuchiya, Norio Okada, Kiyotaka Imai, M. Tohara, K. Fujii (NEC Electronics), T. Watanabe (Toshiba) SDM2009-186 |
Reliability of 32-nm-node ultralow-k (k=2.4)/Cu multilevel interconnects incorporating a bilayer low-k barrier cap (k=3.... [more] |
SDM2009-186 pp.25-29 |
ITE-IDY, EID, IEIJ-SSL, IEE-EDD |
2010-01-29 10:50 |
Fukuoka |
Kyusyu Univ. (Chikushi Campus) |
High-precision Measurement of the Threshold Voltage, the Elastic Constants Ratio and the Dielectric Constants Ratio of Liquid Crystal Materials Yusuke Chiba, Yuji Ohno, Takahiro Ishinabe, Tetsuya Miyashita, Tatsuo Uchida (Tohoku Univ.) EID2009-71 |
We devised a high-precision method of measuring the threshold voltage and the elastic and dielectric constants ratios of... [more] |
EID2009-71 pp.99-102 |
EMCJ |
2009-11-20 12:00 |
Tokyo |
Aoyama Gakuin Univ. (Aoyama Campus) |
A Fundamental Study on Thin Wave Absorber Using Periodic Metal Film and Dielectric Loss Material Ryoji Tamaru, Takenori Yasuzumi, Osamu Hashimoto (Aoyama Gakuin Univ.), Masataka Tada, Takashi Wano, Yuuki Fukuda (NITTO Denko Corp.) EMCJ2009-81 |
In this paper, an one-layered type thin wave absorber consisting of periodic metal films and a lossy sheet is investigat... [more] |
EMCJ2009-81 pp.13-18 |
SANE |
2009-10-09 10:20 |
Tokyo |
Tohoku Univ. (Tokyo) |
A non-destructive approach to estimate the dielectric constant of layered media by GPR antenna array Hai Liu (Tohoku Univ./Tongji Univ.), Motoyuki Sato (Tohoku Univ.), Xiongyao Xie (Tongji Univ.) SANE2009-77 |
This paper provided a new non-destructive approach to estimate the dielectric constant of planar layered media by using ... [more] |
SANE2009-77 pp.73-78 |
SDM |
2009-06-19 14:50 |
Tokyo |
An401・402 Inst. Indus. Sci., The Univ. of Tokyo |
Effect of ALD-Al2O3 Layer on Interfacial Reaction between LaAlO and Ge Mitsuo Sakashita, Ryosuke Kato, Shinya Kyogoku, Hiroki Kondo, Shigeaki Zaima (Nagoya Univ.) SDM2009-37 |
Ge channel MOSFET with high-k gate dielectric film attract much attention from a viewpoint of realizing high speed and l... [more] |
SDM2009-37 pp.61-66 |
SDM |
2009-06-19 15:10 |
Tokyo |
An401・402 Inst. Indus. Sci., The Univ. of Tokyo |
Investigation of Al2O3 Diffusion Annealing Process for Low Vt pMISFET with Al2O3-Capped HfO2 Dielectrics Tetsu Morooka, Takeo Matsuki, Nobuyuki Mise, Satoshi Kamiyama, Toshihide Nabatame, Takahisa Eimori, Yasuo Nara, Jiro Yugami, Kazuto Ikeda, Yuzuru Ohji (Selete) SDM2009-38 |
We have systematically studied the effect of post deposition annealing (PDA) for Al2O3-capped HfO2 on flatband voltage (... [more] |
SDM2009-38 pp.67-70 |
SDM |
2009-06-19 16:50 |
Tokyo |
An401・402 Inst. Indus. Sci., The Univ. of Tokyo |
Characterization of La Diffusion into HfO2/SiO2 Stacked Layers from Ultrathin LaOx Akio Ohta, Daisuke Kanme, Seiichiro Higashi, Seiichi Miyazaki (Hiroshima Univ.) SDM2009-42 |
A stack structure consisting of ~1.3nm-thick LaOx and ~4.0nm-thick HfO2 was formed on thermally grown SiO2 on Si(100) by... [more] |
SDM2009-42 pp.87-92 |
CPM, EMD, OME |
2009-06-19 15:15 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Study on light reflection layers for magneto-optic spatial light modulator driven by piezoelectric effect Takenori Kato, Shinichiro Mito (Toyohashi Univ. of Tech.), Hiroyuki Takagi (Toyota National Coll. of Tech.), Kim Jooyoung, Mitsuteru Inoue (Toyohashi Univ. of Tech.) EMD2009-17 CPM2009-29 OME2009-24 |
A magneto-optical spatial light modulator (MOSLM) is a real-time programmable device for modulating the amplitude and/or... [more] |
EMD2009-17 CPM2009-29 OME2009-24 pp.17-21 |