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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| SDM | 2023-10-13 13:00 |
Miyagi | Niche, Tohoku Univ. | [Invited Talk]
Defect Reduction in UV Nanoimprint Lithography Toshiki ITO (Canon)  SDM2023-54 |
Field-by-field type UV nanoimprint lithography equipped with on-demand inkjet dispense system has been developed, which ... [more] | SDM2023-54 pp.1-6 |
| HWS, VLD | 2023-03-01 15:20 |
Okinawa | (Primary: On-site, Secondary: Online) |
A fast SRAF optimization using Voronoi diagram and LUT based intensity evaluation Sota Saito, Yu Horimoto, Atsushi Takahashi (Tokyo Tech), Yukihide Kohira (Univ. of Aizu), Chikaaki Kodama (KIOXIA) VLD2022-80 HWS2022-51 |
Recent advances in technology nodes have led to problems in optical lithography such as reduced fidelity of transferred ... [more] | VLD2022-80 HWS2022-51 pp.43-48 |
| HWS, VLD | 2023-03-04 11:05 |
Okinawa | (Primary: On-site, Secondary: Online) |
Clone Resistance of Artifact Metrics: Scanning Probe Lithography Based Clones Naoki Yoshida, Akira Iwahashi (YNU), Hoga Morihisa, Junko Ohta, Kaoru Sumiya (AIST), Tsutomu Matsumoto (YNU) VLD2022-117 HWS2022-88 |
The nano-artifact metrics bases its security on the fact that nanometer-order three-dimensional structures (nanopatterns... [more] | VLD2022-117 HWS2022-88 pp.245-250 |
| CPM | 2023-02-28 16:00 |
Tokyo | Tokyo University of Technology (Primary: On-site, Secondary: Online) |
Study of atomic-layer-deposition TiO2 films for strong capacitive coupling of microdevices Fumihiro Takada, Yoshinao Mizugaki, Hiroshi Shimada (UEC) CPM2022-106 |
In order to couple micro- and nano-electronic devices via capacitances strongly, dielectric materials of high relative d... [more] | CPM2022-106 pp.78-81 |
| VLD, DC, RECONF, ICD, IPSJ-SLDM [detail] | 2022-11-30 10:20 |
Kumamoto | (Primary: On-site, Secondary: Online) |
A fast SRAF optimization used LUT based point intensity calculation Sota Saito, Atsushi Takahashi (Tokyo Tech) VLD2022-40 ICD2022-57 DC2022-56 RECONF2022-63 |
Recent advances in technology nodes have led to problems in optical lithography such as reduced fidelity of transferred ... [more] | VLD2022-40 ICD2022-57 DC2022-56 RECONF2022-63 pp.121-126 |
| VLD, DC, RECONF, ICD, IPSJ-SLDM [detail] | 2022-11-30 10:45 |
Kumamoto | (Primary: On-site, Secondary: Online) |
Mask Optimization Using Voronoi Partition and Iterative Improvement Naoki Nonaka, Yukihide Kohira (Univ. of Aizu), Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2022-41 ICD2022-58 DC2022-57 RECONF2022-64 |
To realize continuously scaling down technology node, progressing manufacturing process by optical lithography is requir... [more] | VLD2022-41 ICD2022-58 DC2022-57 RECONF2022-64 pp.127-132 |
| VLD, DC, RECONF, ICD, IPSJ-SLDM (Joint) [detail] |
2021-12-02 15:35 |
Online | Online | Mask Optimization Method Using Simulated Quantum Annealing Yukihide Kohira, Haruki Nakayama, Naoki Nonaka (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA Corporation) VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 |
To realize continuously scaling down of technology node, progressing manufacturing process by optical lithography is req... [more] | VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 pp.162-167 |
| HWS, VLD [detail] | 2020-03-04 16:00 |
Okinawa | Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-105 HWS2019-78 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] | VLD2019-105 HWS2019-78 pp.65-70 |
| HWS, VLD [detail] | 2020-03-04 16:50 |
Okinawa | Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Additional Training Data Generation for Lithography Hotspot Detection by Modifying Existing Training Data Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi (Hiroshima City Univ.) VLD2019-107 HWS2019-80 |
In lithography, a circuit pattern that is highly likely to cause an undesired open- and short-circuit after transfer is ... [more] | VLD2019-107 HWS2019-80 pp.77-82 |
| VLD, DC, CPSY, RECONF, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2019-11-15 15:45 |
Ehime | Ehime Prefecture Gender Equality Center | Lithography Hotspot Detection Based on Feature Vectors Considering Wire Width and Distance Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi (Hiroshima City Univ.) VLD2019-51 DC2019-75 |
In lithography, which is one of the semiconductor manufacturing processes, there is a pattern that is highly likely to c... [more] | VLD2019-51 DC2019-75 pp.185-190 |
| VLD, DC, CPSY, RECONF, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2019-11-15 16:35 |
Ehime | Ehime Prefecture Gender Equality Center | Mask Optimization Considering Process Variation by Subgradient Method Yukihide Kohira, Rina Azuma (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-53 DC2019-77 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] | VLD2019-53 DC2019-77 pp.197-202 |
| VLD, DC, CPSY, RECONF, CPM, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2018-12-07 14:10 |
Hiroshima | Satellite Campus Hiroshima | Process Variation-aware Model-based OPC using 0-1 Quadratic Programming Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama, Shigeki Nojima (TMC) VLD2018-70 DC2018-56 |
Due to continuous shrinking of Critical Dimensions (CD) of layout pattern in VLSI, advances of manufacturing process in ... [more] | VLD2018-70 DC2018-56 pp.209-214 |
| VLD, IPSJ-SLDM | 2018-05-16 15:50 |
Fukuoka | Kitakyushu International Conference Center | Pixel-based OPC using Quadratic Programming for Mask Optimization Rina Azuma, Yukihide Kohira (Univ. of Aizu) VLD2018-3 |
Due to continuous shrinking of Critical Dimensions (CD) in semiconductor manufacturing, advance of process technology in... [more] | VLD2018-3 pp.31-36 |
| VLD, HWS (Joint) |
2018-03-01 09:00 |
Okinawa | Okinawa Seinen Kaikan | A Study of Lithography Hotspot Detection Method Based on Feature Vectors Considering Distances between Wires Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi (Hiroshima City Univ.) VLD2017-105 |
In lithography, which is one of the LSI fabrication processes, a layout pattern with a high failure probability is calle... [more] | VLD2017-105 pp.97-102 |
| VLD, HWS (Joint) |
2018-03-01 09:25 |
Okinawa | Okinawa Seinen Kaikan | Efficient Generation of Lithography Hotspot Detector based on Transfer Learning Shuhei Suzuki, Yoichi Tomioka (UoA) VLD2017-106 |
As semiconductor features shrink in size, the fidelity of the layout pattern transferred onto the wafer decreases. A layo... [more] | VLD2017-106 pp.103-108 |
| EID, ITE-IDY, IEIJ-SSL, SID-JC, IEE-EDD [detail] | 2018-01-26 09:50 |
Shizuoka | Shizuoka Univ., Hamamatsu | Liquid Crystal Devices Having the V-Groove Structure by Nano-Imprint Lithography Kota Haruna, Hiroyuki Okada (Univ. of Toyama) EID2017-41 |
For non-rubbing alignment method applicable to flexible liquid crystals (LCs), LC cells with a V-groove alignment layer ... [more] | EID2017-41 pp.65-68 |
| SDM, EID | 2017-12-22 10:30 |
Kyoto | Kyoto University | Light trapping effect of nanoimprinted texture for thin crystalline silicon solar cell Nakai Yuya, Ishikawa Yasuaki, Uraoka Yukiharu (NAIST) EID2017-11 SDM2017-72 |
For the purpose of the realization of thin-type crystal silicon solar cells, a light trapping effect in a light absorpti... [more] | EID2017-11 SDM2017-72 pp.1-4 |
| ED | 2017-08-09 15:25 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Large area uniform processing characterization using synchrotron radiation deep X-ray lithography system (BL11) Masaya Takeuchi, Akinobu Yamaguchi, Utsumi Yuichi (Univ. of Hyogo) ED2017-29 |
We developed new deep X-ray lithography system (BL11) to fabricate high aspect ratio three-dimensional microstructure at... [more] | ED2017-29 pp.17-18 |
| ICD | 2017-04-20 13:00 |
Tokyo | [Invited Talk]
Study on Nano-Dot Structure Permanent Memory Tsuyoshi Watanabe, Noriyuki Miura, Shijia Liu, Shigeki Imai, Makoto Nagata (Kobe Univ.) ICD2017-4 |
We propose a permanent digital memory system in which data is saved by a presence of metal nano-dot at interconnects of ... [more] | ICD2017-4 pp.17-22 |
|
| OME, SDM | 2017-04-20 16:45 |
Kagoshima | Tatsugochou Shougaigakushuu Center | A Study on Top-Gate Type OFETs utilizing Amorphous Rubrene Gate Insulator Shun-ichiro Ohmi, Mizuha Hiroki, Hongli Zhang, Yasutaka Maeda (Tokyo Tech) SDM2017-4 OME2017-4 |
High hole mobility, higher than that of amorphous-Si (a-Si), has been reported for the organic semiconductor field-effec... [more] | SDM2017-4 OME2017-4 pp.15-18 |
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