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Committee Date Time Place Paper Title / Authors Abstract Paper #
OCS, OFT
(Joint)		 2006-08-24
13:25		 Miyagi   Fabrication of Blazed Gratings by SR Exposure System
Tomohiko Kanie, Makoto Katayama (SEI), Teppei Morita, Noboru Toshima, Junichi Kato (Nakanuma ASC), Tomio Nagayama, Yasushi Mizutani (KMIR), Fumiki Kato, Shinya Fujinawa, Susumu Sugiyama (Rits) OFT2006-17		 We have successively fabricated a blazed nano grating based on the X-ray gray-scale lithography technology.
The structu... [more]		 OFT2006-17
pp.7-9
CPM, EMD, OME 2006-06-30
15:50		 Tokyo Kikai-Shinko-Kaikan Bldg. Structure and Physical Properties of Poly(di-methyl silane) and Poly(di-hexyl silane) Thin Films
Shoji Furukawa, Hidetaka Ohta, Hitoshi Arakawa, Takashi Yasuda, Akihiko Katsuki (Kyushu Inst. Technology) 		Thin Films of poly(di-methyl silane) and poly(di-hexyl silane) have been prepared by the vacuum evaporation technique an... [more] EMD2006-13 CPM2006-37 OME2006-47
pp.45-49
CPM 2005-11-11
14:20		 Fukui   Crystal growth of Cu2ZnSnS4 by melting method
Toshiro Shimada, Koichiro Oishi, Kazuo Jimbo, Hironori Katagiri, Hideaki Araki, Osamu Yoshida, Makoto Yamazaki (Nagaoka National College of Tech.), Satoshi Kobayashi, Nozomu Tsuboi (Niigata Univ.) 		Cu2ZnSnS4 bulk crystals grown by the melting method were investigated using X-ray diffraction analysis, SEM observation ... [more] CPM2005-154
pp.13-18
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