Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
MRIS, CPM, ITE-MMS, OME [detail] |
2023-10-27 10:30 |
Niigata |
Niigata Univ. Ekiminami Campus (Primary: On-site, Secondary: Online) |
Mechanical properties and heat resistance of Si- and N-doped diamond-like carbon films Yuya Yamazaki, Yuya Sasaki, Hideki Nakazawa (Hirosaki Univ.) MRIS2023-17 CPM2023-51 OME2023-38 |
Silicon- and nitrogen-doped diamond-like carbon (Si–N–DLC) films have been deposited by plasma-enhanced chemical vapor d... [more] |
MRIS2023-17 CPM2023-51 OME2023-38 pp.33-36 |
CPM |
2021-10-27 13:20 |
Online |
Online |
Effects of H2 and Ar dilution on the optical and electrical properties of Si and N doped diamond-like carbon films by plasma-enhanced chemical vapor deposition Yuya Sasaki, Hiroya Osanai, Yusuke Ohtani, Yuta Murono, Masayoshi Sato, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki, Hideki Nakazawa (Hirosaki Univ.) CPM2021-26 |
We have deposited silicon and nitrogen doped diamond-like carbon (Si–N–DLC) films by radio frequency plasma-enhanced che... [more] |
CPM2021-26 pp.23-28 |
CPM |
2019-11-07 15:00 |
Fukui |
Fukui univ. |
Annealing effects on the properties of nitrogen doped DLC films Hiroya Osanai, Kazuki Nakamura, Haruto Koriyama, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki (Hirosaki Univ.), Maki Suemitsu (Tohoku Univ.), Hideki Nakazawa (Hirosaki Univ.) CPM2019-46 |
We have prepared nitrogen doped diamond-like carbon (N-DLC) films by plasma-enhanced chemical vapor deposition using H2 ... [more] |
CPM2019-46 pp.9-14 |
CPM, IEE-MAG |
2018-11-02 14:25 |
Niigata |
Machinaka campus Nagaoka |
Thermal stability of silicon and nitrogen doped DLC thin films Hideki Nakazawa, Kazuki Nakamura, Hiroya Osanai, Haruto Koriyama, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki (Hirosaki Univ.), Maki Suemitsu (Tohoku Univ.) CPM2018-52 |
We have investigated the effects of post-annealing on the properties of silicon and nitrogen doped diamond-like carbon (... [more] |
CPM2018-52 pp.99-104 |
CPM |
2018-08-09 14:30 |
Aomori |
Hirosaki Univ. |
Effects of nitrogen doping on the properties of Si-doped DLC films Kazuki Nakamura, Haruka Oohashi (Hirosaki Univ.), Tai Yokoyama, Kei-ichiro Tajima, Norihumi Endo, Maki Suemitsu (Tohoku Univ.), Yoshiharu Enta, Yasuyuki Kobayashi, Yushi Suzuki, Hideki Nakazawa (Hirosaki Univ.) CPM2018-8 |
We have investigated the effects of nitrogen (N) doping on the chemical bonding states and the electrical, optical, and ... [more] |
CPM2018-8 pp.1-6 |
CPM |
2015-08-10 13:40 |
Aomori |
|
Effects of substrate bias on properties of nitrogen-doped DLC films prepared by radio frequency plasma-enhanced chemical vapor deposition Masato Tsuchiya, Kazuki Murakami, Tatsuhito Satou, Takahiro Takami, Yoshiharu Enta, Hideki Nakazawa (Hirosaki Univ.) CPM2015-32 |
We have deposited nitrogen-doped diamond-like carbon (N-DLC) films by RF plasma-enhanced chemical vapor deposition using... [more] |
CPM2015-32 pp.7-10 |
ED |
2012-07-27 11:50 |
Fukui |
Fukui University |
Graphene FET with Diamondlike Carbon Dielectrics Susumu Takabayashi, Meng Yang, Shuichi Ogawa, Hiroyuki Hayashi, Yuki Kurita, Yuji Takakuwa, Tetsuya Suemitsu, Taiichi Otsuji (Tohoku Univ.) ED2012-53 |
A graphene-channel field effect transistor with a diamondlike carbon (DLC) top-gate dielectric film is presented (DLC-GF... [more] |
ED2012-53 pp.67-72 |
SDM |
2012-03-05 13:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Initial Growth Observation of Multilayer Graphene on SiO2/Si substrate using Raman Spectroscopy and XPS Yoshihiro Ojiro, Shuichi Ogawa (Tohoku Univ.), Manabu Inukai (JASRI), Motonobu Sato (AIST), Eiji Ikenaga, Takayuki Muro (JASRI), Mizuhisa Nihei (AIST), Yuji Takakuwa (Tohoku Univ.), Naoki Yokoyama (AIST) SDM2011-179 |
The photoemission-assisted Plasma enhanced CVD is the one of the most possible method to grow graphene in the low temper... [more] |
SDM2011-179 pp.19-24 |
CPM |
2011-08-10 15:45 |
Aomori |
|
Hydrogen effects on the properties of Si- and N-coincorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition Saori Okuno, Soshi Miura, Ryosuke Kamada, Hideki Nakazawa (Hirosaki Univ.) CPM2011-62 |
To further improve the properties of diamond-like carbon (DLC) films, we have deposited Si- and N-coincorporated DLC (Si... [more] |
CPM2011-62 pp.31-36 |
SDM, ED |
2011-02-23 16:05 |
Hokkaido |
Hokkaido Univ. |
Characterization of carbon nanotube thin-film transistors by scanning probe microscopy Yuki Okigawa, Yutaka Ohno (Nagoya Univ.), Shigeru Kishimoto (Nagoya Univ./VBL, Nagoya Univ.), Takashi Mizutani (Nagoya Univ.) ED2010-197 SDM2010-232 |
The electrical properties of CNT-FETs fabricated using PECVD were studied by scanning probe microscopy. The measured res... [more] |
ED2010-197 SDM2010-232 pp.31-36 |
SDM |
2011-02-07 13:10 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Networked nanographite growth using photoemission-assisted enhanced plasma CVD: discharge condition dependence of the crystallographic quality Shuichi Ogawa (Tohoku Univ./JST), Motonobu Sato (Fujitsu/JST), Haruki Sumi (Tohoku Univ.), Mizuhisa Nihei (Fujitsu/JST), Yuji Takakuwa (Tohoku Univ./JST) SDM2010-220 |
he photoemission-assisted plasma chemical vapor deposition has been developed to form the graphene for large area withou... [more] |
SDM2010-220 pp.25-30 |
CPM |
2009-08-10 16:05 |
Aomori |
Hirosaki Univ. |
Characterization of Diamond-Like Carbon Thin Films Prepared by Radio-Frequency Pasma-Ehanced CVD Using Organosilanes Soushi Miura, Hideki Nakazawa, Keita Nishizaki (Hirosaki Univ.), Maki Suemitsu (RIEC Tohoku Univ.), Kanji Yasui (Nagaoka Univ. of Tech.), Takashi Ito, Tetsuo Endoh (CIR Tohoku Univ.), Yuzuru Narita (Yamagata Univ.) CPM2009-36 |
To further improve the properties of diamond-like carbon (DLC) films, we have deposited Si-incorporated DLC (Si-DLC) fil... [more] |
CPM2009-36 pp.13-18 |
OME, SDM |
2009-04-24 17:05 |
Saga |
AIST Kyushu-center |
Metal Induced Lateral Crystallization of PECVD a-Si and Its Impact on TFT Performance Shintaro Kanoh, Sho Nagata, Gou Nakagawa, Tanemasa Asano (Kyushu Univ.) SDM2009-7 OME2009-7 |
In the case of solid phase crystallization of amorphous Si (a-Si) deposited by plasma-enhanced chemical vapor deposition... [more] |
SDM2009-7 OME2009-7 pp.29-34 |
CPM |
2007-08-09 15:45 |
Yamagata |
Yamagata Univ. |
Vertically Aligned CNT Growth on Sectional Plane of Catalytic Thin Film Using DC Plasma-Enhanced CVD Hiroki Okuyama, Takuya Sonomura, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.) CPM2007-41 |
Position and/or direction controlling of CNTs is a necessary process technology to prepare nanoscaled CNT electronic dev... [more] |
CPM2007-41 pp.27-32 |