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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| OPE | 2016-12-08 14:15 |
Okinawa | Effects of Fabrication Variation on the Performance of Silicon Waveguide Devices Tsuyoshi Horikawa (PETRA/AIST), Daisuke Shimura, Jun Ushida, Yohei Sobu, Akemi Shiina, Masatoshi Tokushima, Seok-Hwan Jeong, Keizo Kinoshita, Tohru Mogami (PETRA) |
Silicon photonics has been expected as a key technology which is enable to integrate functionalities in a single chip fo... [more] | ||
| VLD, DC, CPSY, RECONF, CPM, ICD, IE (Joint) [detail] |
2016-11-29 10:30 |
Osaka | Ritsumeikan University, Osaka Ibaraki Campus | Accurate Lithography Simulation Model based on Deep Learning Yuki Watanabe, Tetsuaki Matsunawa, Taiki Kimura, Shigeki Nojima (Toshiba)  VLD2016-56 DC2016-50 |
Lithography simulation is an indispensable technology for today's semiconductor manufacturing processes. To achieve accu... [more] | VLD2016-56 DC2016-50 pp.73-78 |
| IBISML | 2016-11-16 15:00 |
Kyoto | Kyoto Univ. | Structural Change Detection in Lithography Systems Yosuke Otsubo (NIKON), Masashi Sugiyama (RIKEN/UTokyo) IBISML2016-45 |
A lithography system, which consists of various mechanical units such as high-precision optical systems, prints circuit ... [more] | IBISML2016-45 pp.1-8 |
| SCE | 2016-08-08 11:45 |
Saitama | Saitama Univ. (Omiya sonic city) | Development of large array horn coupled superconducting kinetic inductance detectors Kenji Kiuchi, Chiko Otani (RIKEN), Shugo Oguri (KEK), Ryo Koyano (Saitama Univ.), Junya Suzuki (KEK), Munehisa Semoto, Tohru Taino (Saitama Univ.), Osamu Tajima, Taketo Nagasaki (KEK), Satoru Mima (RIKEN), Tomita Nozomu (Univ. of Tokyo) SCE2016-15 |
We developed horn coupled Microwave Kinetic Inductance Detectors(MKIDs) as a millimeter wave detector for observation of... [more] | SCE2016-15 pp.19-24 |
| AP, SAT, SANE (Joint) |
2016-07-21 13:00 |
Hokkaido | Otaru port marina | Trial Fabrication of 180GHz-Band E-Plane 2-Way divider and Horn Antennas by PTFE-Filled Waveguide and Its Evaluation Mitsuyoshi Kishihara (Okayama Pref. Univ.), Akinobu Yamaguchi, Yuichi Utsumi, Isao Ohata (Univ. of Hyogo) AP2016-47 |
The fabrication process of the waveguide using the SR (synchrotron radiation) direct etching process of PTFE and the spu... [more] | AP2016-47 pp.61-66 |
| SCE | 2016-04-20 17:00 |
Tokyo | SiO-assisted Dolan technique for fabrication of tiny Al tunnel junctions with improved uniformity Takato Tokuyama, Hiroshi Shimada, Yoshinao Mizugaki (UEC Tokyo) SCE2016-10 |
The Dolan technique has been widely used for mesoscopic device fabrication, in which tiny tunnel junctions are realized ... [more] | SCE2016-10 pp.55-60 |
|
| SDM, OME | 2016-04-08 12:00 |
Okinawa | Okinawa Prefectural Museum & Art Museum | [Invited Talk]
OFET Device Characteristics utilizing Low Work-function Metal Interface Control Layer Shun-ichiro Ohmi, Yasutaka Maeda, Syu Furuyama, Mizuha Hiroki (Tokyo Tech) SDM2016-3 OME2016-3 |
High hole mobility, higher than that of a-Si, has been reported for the organic semiconductor field-effect transistor (O... [more] | SDM2016-3 OME2016-3 pp.11-15 |
| VLD | 2016-03-02 10:55 |
Okinawa | Okinawa Seinen Kaikan | Lithography Hotspot Detection Using Histogram of Oriented Light Propagation Yoichi Tomioka (UoA), Tetsuaki Matsunawa (Toshiba) VLD2015-136 |
In recent semiconductor manufacturing process, it is essential to detect and to remove lithography hotspots, which induc... [more] | VLD2015-136 pp.143-148 |
| VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM (Joint) [detail] |
2015-12-02 14:55 |
Nagasaki | Nagasaki Kinro Fukushi Kaikan | [Invited Talk]
EDA Research Activities in The University of Texas at Austin Tetsuaki Matsunawa (Toshiba) VLD2015-50 DC2015-46 |
International competition in EDA research is getting more intense. In major international conference, such as DAC or IC... [more] |
VLD2015-50 DC2015-46 p.73 |
| MRIS, ITE-MMS | 2015-07-10 15:20 |
Tokyo | Waseda Univ. | Fabrication of FePt Nanodot Arrays with High Coercivity by Pulse Electrodeposition Daiki Nishiie, Siggi Wodarz, Chen Tar Hsieh, Manabu Saito, Junya Abe (Waseda Univ.), Giovanni Zangari (UVA), Takayuki Homma (Waseda Univ.) MR2015-13 |
We have been developing the combination process of electrochemical and lithography techniques to fabricate ferromagneti... [more] | MR2015-13 pp.25-29 |
| ED | 2015-04-17 10:55 |
Miyagi | Laboratory for Nanoelectronics and Spintronics | SiO-assisted Dolan technique for fabrication of tiny Al tunnel junctions with improved uniformity Takato Tokuyama, Hiroshi Shimada, Yoshinao Mizugaki (UEC Tokyo/CREST JST) ED2015-13 |
The Dolan technique has been widely used for mesoscopic device fabrication, in which tiny tunnel junctions are realized ... [more] | ED2015-13 pp.65-70 |
| NC, MBE | 2015-03-16 11:25 |
Tokyo | Tamagawa University | Development and evaluation of micro cell culture wells for studies on efficient sonoporation You Shirahata, Kaori Kuribayasi-Shigetomi, Nobuki Kudo (Hokkaido Univ.) MBE2014-119 NC2014-70 |
We have been studying a sonoporation technique that transduces drugs into cells by exposure of the cells with adjacent b... [more] | MBE2014-119 NC2014-70 pp.19-23 |
| VLD | 2015-03-02 13:00 |
Okinawa | Okinawa Seinen Kaikan | A Fast Lithographic Mask Correction Algorithm Ahmd Awad, Atsushi Takahashi (Tokyo Institute of Technology) VLD2014-153 |
As technology nodes downscaling into sub-16 nm regime, the industry relies heavily on Optical Proximity Correction (OP... [more] |
VLD2014-153 pp.1-6 |
| LQE, ED, CPM | 2014-11-27 14:30 |
Osaka | Two-Dimensional Strain Mapping of GaN Templates Fabricated by Nano-Channel FIELO Method Using Nanoimprint Lithography Masanori Nambu, Atsushi Yamaguchi (Kanazawa Inst. of Tech.), Hiroki Goto, Haruo Sunakawa, Toshiharu Matsueda (Furukawa Co. Ltd.), Akiko Okada (Waseda Univ.), Hidetoshi Shinohara, Hiroshi Goto (Toshiba Machine Co. Ltd.), Jun Mizuno (Waseda Univ.), Akira Usui (Furukawa Co. Ltd.) ED2014-80 CPM2014-137 LQE2014-108 |
The efficiency droop phenomenon is a big problem for high-brightness white LEDs. It has been pointed out that the proble... [more] | ED2014-80 CPM2014-137 LQE2014-108 pp.33-38 |
|
| CPM | 2014-10-24 11:00 |
Nagano | Fabrication of ultra-thin metal oxide nanosheets as a carrier selective layers and their application for bulk-heterojunction organic solar cells Yoshinori Goto, Yusuke Saka, Eiji Itoh (Shinshu Univ.) CPM2014-100 |
In this study, we investigated the solution processed titania nanosheet(TN) as an electron-selective-layers(ESL) by laye... [more] | CPM2014-100 pp.1-6 |
|
| MRIS, ITE-MMS | 2014-07-17 13:25 |
Tokyo | Tokyo Institute of Technology | Fabrication of ultra-high density nanodot arrays with high coercivity based on analysis of initial deposition process Hiroki Hagiwara, Siggi Wodarz, Tomohiro Otani, Daiki Nishiie (Waseda Univ.), Giovanni Zangari (UVA), Takayuki Homma (Waseda Univ.) MR2014-9 |
We have attempted to fabricate ferromagnetic nanodot arrays for bit patterned media (BPM) by using electrochemical proce... [more] | MR2014-9 pp.7-10 |
| VLD, IPSJ-SLDM | 2014-05-29 09:55 |
Fukuoka | Kitakyushu International Conference Center | [Invited Talk]
Multiple Patterning Lithography by Positive Semidefinite Relaxation Tomomi Matsui (TITECH) VLD2014-4 |
(To be available after the conference date) [more] | VLD2014-4 p.19 |
| VLD | 2014-03-04 13:20 |
Okinawa | Okinawa Seinen Kaikan | [Invited Talk]
Advanced Model-Based Hotspot Fix Flow for Layout Optimization with Genetic Algorithm Shuhei Sota (Toshiba Microelectronics), Taiga Uno, Masanari Kajiwara, Chikaaki Kodama (Toshiba), Hirotaka Ichikawa (Toshiba Microelectronics), Ryota Aburada, Toshiya Kotani (Toshiba), Kei Nakagawa, Tamaki Saito (Toshiba Microelectronics) VLD2013-148 |
Under the low-k1 lithography process, many hotspots are generated and their reduction is an urgent issue for mass produc... [more] | VLD2013-148 p.85 |
| VLD | 2014-03-04 14:40 |
Okinawa | Okinawa Seinen Kaikan | Self-Aligned Double and Quadruple Patterning-Aware Grid Routing Chikaaki Kodama (Toshiba), Hirotaka Ichikawa (Toshiba Microelectronics), Fumiharu Nakajima, Koichi Nakayama, Shigeki Nojima, Toshiya Kotani (Toshiba) VLD2013-151 |
Self-Aligned Double and Quadruple Patterning (SADP, SAQP) are leading candidates for sub-$20~nm$ and sub-$14~nm$ node an... [more] | VLD2013-151 pp.99-104 |
| VLD | 2014-03-04 15:05 |
Okinawa | Okinawa Seinen Kaikan | Exposure source optimization by clustering for lithography Masashi Tawada, Masao Yanagisawa, Nozomu Togawa (Waseda Univ.), Takaki Hashimoto, Keishi Sakanushi, Shigeki Nojima, Toshiya Kotani (Toshiba) VLD2013-152 |
In lithography, we generate patterns on a wafer through a photomask, where patterns generated have to be close to ideal... [more] |
VLD2013-152 pp.105-110 |
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