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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 20 of 51  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
ED, MWPTHz 2022-12-19
16:05
Miyagi   [Invited Talk] InP-HEMT Fabrication Process Technology for Beyond 5G Wireless Network with Tera-Hertz Band
Takuya Tsutsumi, Hiroshi Hamada, Teruo Jyo, Hiroki Sugiyama, Taro Sasaki, Hiroyuki Takahashi, Fumito Nakajima (NTT) ED2022-76 MWPTHz2022-47
Next-generation "Beyond 5G (B5G) / 6G" wireless network systems have been researched and developed for meeting with rapi... [more] ED2022-76 MWPTHz2022-47
pp.23-27
OME 2022-11-11
13:00
Osaka KINDAI Univ. [Invited Talk] Computational Chemistry Study on Charge and Exciton Transfer Dynamics in Organic Semiconductors
Hirotaka Kitoh-Nishioka (Kindai Univ.) OME2022-25
We report theoretical studies on the microscopic mechanisms of charge/exciton transfer dynamics in organic semiconductor... [more] OME2022-25
pp.1-6
SDM 2022-11-11
13:00
Online Online [Invited Talk] Understanding of Electron Mobility Limiting Factor in Cryo-CMOS
Hiroshi Oka, Takumi Inaba, Shota Iizuka, Hidehiro Asai, Kimihiko Kato, Takahiro Mori (AIST) SDM2022-74
To realize highly-integrated quantum computers, the Cryo-CMOS circuit has attracted significant attention for control/re... [more] SDM2022-74
p.49
ICD, SDM, ITE-IST [detail] 2022-08-09
11:05
Online   [Invited Talk] Effect of Conduction Band Edge States on Coulomb-Limiting Electron Mobility in Cryogenic MOSFET Operation
Hiroshi Oka, Takumi Inaba, Shota Iizuka, Hidehiro Asai, Kimihiko Kato, Takahiro Mori (AIST) SDM2022-46 ICD2022-14
Cryogenic-CMOS technology has attracted significant attention for control/read-out qubits for realizing a large-scale qu... [more] SDM2022-46 ICD2022-14
pp.54-59
ED, CPM, LQE 2021-11-26
15:20
Online Online Fabrication and electrical property characterization of AlGaN channel HEMT on AlN template
Ryuichi Mori, Kenjiro Uesugi, Shegeyuki Kuboya, Kanako Shojiki, Hideto Miyake (Mie Univ.) ED2021-33 CPM2021-67 LQE2021-45
$Al_{0.85}Ga_{0.15}N$/$Al_{0.60}Ga_{0.40}N$ HEMT structures with channel thicknesses of 100–1000 nm were grown on low-di... [more] ED2021-33 CPM2021-67 LQE2021-45
pp.83-86
LQE, CPM, ED 2020-11-26
15:00
Online Online Growth of GaN on AlN template with atomic-level flatness for High Electron Mobility Transistor
Tatsuya Shirato, Kenjiro Uesugi, Shigeyuki Kuboya, Kanako Shojiki, Hideto Miyake (Mie Univ.) ED2020-11 CPM2020-32 LQE2020-62
We investigated the effect of carrier gas on GaN surface morphology. Bunched step-and-terrace structures and pits were f... [more] ED2020-11 CPM2020-32 LQE2020-62
pp.41-44
LQE, CPM, ED 2020-11-26
15:30
Online Online Enhanced Breakdown Voltage in AlGaN/GaN HEMTs by Oxygen Plasma Treatment
Shunsuke Kamiya, Takashi Nishitani, Yu Matsuda, Nozomu Takano, Joel T. Asubar, Hirokuni Tokuda (Univ. of Fukui), Masaaki Kuzuhara (Kwansei Gakuin Univ.) ED2020-12 CPM2020-33 LQE2020-63
With its high critical electric field as consequence of its wide bandgap, gallium nitride (GaN) is considered a leading ... [more] ED2020-12 CPM2020-33 LQE2020-63
pp.45-48
MWP 2020-05-28
13:30
Online Online [Invited Talk] Fabrication Process of InP-HEMT-based Sub-millimeter Wave ICs for Beyond 5G Application
Takuya Tsutsumi, Hiroki Sugiyama, Hiroshi Hamada, Hideyuki Nosaka, Hideaki Matsuzaki (NTT) MWP2020-1
The 300-GHz sub-millimeter-wave band is one of the candidate frequency for “Beyond 5G” networks to meet rapidly increasi... [more] MWP2020-1
pp.1-6
ED, THz [detail] 2019-12-23
16:20
Miyagi   InP Wafer-level Backside Process for Future Tera-hertz Operation
Takuya Tsutsumi, Hiroshi Hamada, Hiroki Sugiyama, Hideyuki Nosaka, Hideaki Matsuzaki (NTT) ED2019-82
The sub-millimeter-wave band would be utilized in future mobile networks to cope with increasing data rates. InP-based S... [more] ED2019-82
pp.23-28
ED, THz [detail] 2019-12-23
16:45
Miyagi   GaInSb n-Channel HEMTs Using Strained-Al0.40In0.60Sb/Al0.25In0.75Sb Stepped Buffer
Koki Osawa, Takuya Iwaki, Yuki Endoh, Mizuho Hiraoka, Naoyuki Kishimoto, Takuya Hayashi (TUS), Issei Watanabe (NICT/TUS), Yoshimi Yamashita, Shinsuke Hara, Takahiro Gotow, Akifumi Kasamatsu (NICT), Akira Endoh, Hiroki Fujishiro (TUS) ED2019-83
We succeeded in fabricating GaInSb n-channel HEMTs for the first time in the world and measured their characteristics. W... [more] ED2019-83
pp.29-32
ED, THz 2018-12-18
09:00
Miyagi RIEC, Tohoku Univ. [Invited Talk] High-Speed Performance of InP-, Sb- and GaN-based HEMTs
Akira Endoh, Issei Watanabe, Yoshimi Yamashita, Akifumi Kasamatsu (NICT), Hiroki Fujishiro (Tokyo Univ. of Science), Takashi Mimura (NICT) ED2018-62
We have fabricated nanometer-scale InP-, Sb- and GaN-based HEMTs by using electron beam lithography and measured their c... [more] ED2018-62
pp.35-38
MRIS, ITE-MMS 2018-10-19
09:15
Osaka Osaka University [Invited Talk] Printed electronics and spintronics using organic semiconductors
Shun Watanabe (Univ. of Tokyo) MRIS2018-17
Organic semiconductors are being investigated as an emerging class of materials for electronics and spintronics, not onl... [more] MRIS2018-17
pp.21-26
ED, THz 2017-12-19
09:00
Miyagi RIEC, Tohoku Univ [Invited Talk] Development of Antimonide-Based Transistors
Hiroki Fujishiro, Kyosuke Isono, Takuto Takahashi, Yoshiaki Harada, Naoki Oka, Jun Takeuchi, Yui Fujisawa (TUS), Sachie Fujikawa (Tokyo Denki Univ.), Ryuto Machida (TUS), Issei Watanabe, Yoshimi Yamashita, Akira Endoh, Shinsuke Hara, Akifumi Kasamatsu (NICT) ED2017-81
Quantum corrected Monte Carlo simulation shows that the InSb HEMT exhibits intrinsic fT more than 1 THz from Vds of arou... [more] ED2017-81
pp.33-36
SDM, ED, CPM 2017-05-26
10:45
Aichi VBL, Nagoya University N-polar GaN MIS-HEMTs with Flat Interface Grown by Optimized MOVPE
Kiattiwut Prasertsuk, Tomoyuki Tanikawa, Takeshi Kimura, Shigeyuki Kuboya, Tetsuya Suemitsu, Takashi Matsuoka (Tohoku Univ.) ED2017-26 CPM2017-12 SDM2017-20
An N-polar GaN high electron mobility transistor (HEMT) has an advantage over a Ga-polar HEMT from viewpoints of a poten... [more] ED2017-26 CPM2017-12 SDM2017-20
pp.59-64
ED 2015-07-25
11:05
Ishikawa IT Business Plaza Musashi 5F Electron transport characteristics of strain reduced InSb QW structure with AlInSb stepped buffer layer
Tatsuya Taketsuru, Sachie Fujikawa, Yoshiaki Harada, Hiroki Suzuki, Kyousuke Isono, Sanshiro Kato, Daisuke Tuji, Hiroki I. Fujishiro (TUS) ED2015-45
We investigated a high quality novel AlInSb buffer layer to increase the electron mobility of an InSb quantum well (QW) ... [more] ED2015-45
pp.45-49
EMD, CPM, OME 2015-06-19
14:55
Tokyo Kikai-Shinko-Kaikan Bldg. Effect of the insertion of N2O added buffer layer on the characteristics of ZnO films grow on glass substrates by catalytic reaction assisted chemical vapor deposition
Shingo Kanouchi, Yuki Ishizuka, Yuki Ohashi (Nagaoka Univ. technol.), Koichiro Oishi, Hironori Katagiri (Nagaoka Nat. Coll. Technol.), Yasuhiro Tamayama, Kanji Yasui (Nagaoka Univ. technol.) EMD2015-15 CPM2015-25 OME2015-28
Aiming at the growth of high-quality ZnO films on glass substrates by a new CVD method using a catalytic reaction, effec... [more] EMD2015-15 CPM2015-25 OME2015-28
pp.23-27
ED, CPM, SDM 2015-05-28
16:05
Aichi Venture Business Laboratory, Toyohashi University of Technology Schottky barrier diodes of high mobility β-Ga2O3 (-201) single crystals grown by edge-defined-fed growth method
Yuta Koga, Kazuya Harada, Kenji Hanada, Toshiyuki Oishi, Makoto Kasu (Saga Univ.) ED2015-22 CPM2015-7 SDM2015-24
High Hall electron mobility and its high performances of Schottky barrier diodes on edge-defined film-fed grown (2 &#773... [more] ED2015-22 CPM2015-7 SDM2015-24
pp.31-34
MWP 2015-05-25
09:55
Tokyo Kikai-Shinko-Kaikan Bldg. Increase in sensitivity and bandwidth measurement of terahertz detector using high electron mobility transistor
Safumi Suzuki, Takuro Nukariya, Yugo Ueda, Tomohiro Ootsuka, Masahiro Asada (Tokyo Tech) MWP2015-1
We propose and fabricated a high-electron-mobility-transistor (HEMT) terahertz detector integrated with bow-tie antenna ... [more] MWP2015-1
pp.1-5
WPT 2015-02-13
13:30
Kanagawa YRP center, 1st Bldg. Introduction of Qualcomm Halo Wireless Electric Vehicle Charging Technology
Kiyotaka Kawashima (Qualcomm Japan), Edward van Boheemen (QUALCOMM CDMA Technologies GmbH), Anthony Thomson (Qualcomm Europe) WPT2014-88
With an ever growing population & increasing urbanization, the need to reduce emissions from urban transport is pushing ... [more] WPT2014-88
pp.1-6
ED 2014-12-22
15:00
Miyagi   Monte Carlo Simulation of InAlAs/InGaAs HEMTs with Various Shape of Buried Gate
Akira Endoh (NICT/Fujitsu Labs.), Issei Watanabe, Akifumi Kasamatsu (NICT), Takashi Mimura (Fujitsu Labs./NICT) ED2014-102
To achieve higher-speed operations of InAlAs/InGaAs HEMTs, the gate-channel distance d as well as gate length Lg must be... [more] ED2014-102
pp.21-26
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