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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
HWS, VLD [detail] |
2020-03-04 16:00 |
Okinawa |
Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-105 HWS2019-78 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] |
VLD2019-105 HWS2019-78 pp.65-70 |
VLD, DC, CPSY, RECONF, CPM, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2018-12-07 14:10 |
Hiroshima |
Satellite Campus Hiroshima |
Process Variation-aware Model-based OPC using 0-1 Quadratic Programming Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama, Shigeki Nojima (TMC) VLD2018-70 DC2018-56 |
Due to continuous shrinking of Critical Dimensions (CD) of layout pattern in VLSI, advances of manufacturing process in ... [more] |
VLD2018-70 DC2018-56 pp.209-214 |
VLD, IPSJ-SLDM |
2018-05-16 15:50 |
Fukuoka |
Kitakyushu International Conference Center |
Pixel-based OPC using Quadratic Programming for Mask Optimization Rina Azuma, Yukihide Kohira (Univ. of Aizu) VLD2018-3 |
Due to continuous shrinking of Critical Dimensions (CD) in semiconductor manufacturing, advance of process technology in... [more] |
VLD2018-3 pp.31-36 |
VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM (Joint) [detail] |
2015-12-02 14:55 |
Nagasaki |
Nagasaki Kinro Fukushi Kaikan |
[Invited Talk]
EDA Research Activities in The University of Texas at Austin Tetsuaki Matsunawa (Toshiba) VLD2015-50 DC2015-46 |
International competition in EDA research is getting more intense.
In major international conference, such as DAC or IC... [more] |
VLD2015-50 DC2015-46 p.73 |
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