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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 20 of 64  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM, OME 2023-04-22
09:40
Okinawa Okinawaken Seinen Kaikan
(Primary: On-site, Secondary: Online)
Solid-phase crystallization of Sn-doped Ge films on insulator and its application to TFT
Taishiro Koga, Takaya Nagano, Kenta Moto, Keisuke Yamamoto, Taizoh Sadoh (Kyushu Univ.) SDM2023-7 OME2023-7
High-speed thin-film transistors (TFTs) are required to realize advanced system-in-displays. For this purpose, Ge is att... [more] SDM2023-7 OME2023-7
pp.27-29
SDM, OME 2023-04-22
13:35
Okinawa Okinawaken Seinen Kaikan
(Primary: On-site, Secondary: Online)
[Invited Talk] Crystallization technology of Si thin film by excimer laser annealing -- Hoping to become some lesson from the past --
Hiroyuki Kuriyama (TTE) SDM2023-13 OME2023-13
Si thin film crystallization technology using an excimer laser was first put into practical use in 1996 as a core techno... [more] SDM2023-13 OME2023-13
pp.48-51
SDM, OME 2023-04-22
15:00
Okinawa Okinawaken Seinen Kaikan
(Primary: On-site, Secondary: Online)
[Invited Talk] Metal induced lateral crystallization of amorphous Ge on insulating substrate
Isao Tsunoda, Kenichiro Takakura (NIT, Kumamoto College) SDM2023-15 OME2023-15
We have investigated the low-temperature metal induced lateral crystallization of amorphous Ge on insulating substrate. ... [more] SDM2023-15 OME2023-15
pp.55-58
OME, SDM 2022-04-23
10:20
Miyazaki Takachiho Hall
(Primary: On-site, Secondary: Online)
EDX evaluation of Mg atoms on Mg-induced lateral crystallization of amorphous Ge/SiO2
Atsuki Morimoto, Rikuto Abe, Anna Hirai, Towa Hirai, Kenichiro Takakura, Isao Tsunoda (NIT(KOSEN),Kumamoto College) SDM2022-10 OME2022-10
We have investigated low temperature solid phase crystallization of amorphous Ge on insulating substrate. High temperatu... [more] SDM2022-10 OME2022-10
pp.47-50
SDM, OME 2021-04-23
15:10
Okinawa Okinawaken Seinen Kaikan
(Primary: On-site, Secondary: Online)
[Invited Talk] Transistor application of polycrystalline Ge-based thin films
Kaoru Toko (Univ. of Tsukuba) SDM2021-4 OME2021-4
With the development of Ge device technologies, a polycrystalline Ge thin-film transistor (TFT) is attracting a great de... [more] SDM2021-4 OME2021-4
pp.15-18
OME, IEE-DEI 2021-03-01
16:30
Online Online Diode analysis of dark currents in crystallized small molecule organic photovoltaic cells
Toshihiko Kaji, Fuka Enokido, Syou Mori, Masateru Yogo, Yuki Abe, Mikimasa Katayama (TUAT) OME2020-25
In this study, dark current diode analysis were discussed on various organic thin-film solar cells crystallized by co-ev... [more] OME2020-25
pp.26-27
SDM, OME 2020-04-13
15:20
Okinawa Okinawaken Seinen Kaikan
(Cancelled, technical report was not issued)
[Invited Talk] Transistor application of polycrystalline Ge-based thin films
Kaoru Toko (Univ. of Tsukuba)
With the development of Ge device technologies, a polycrystalline Ge thin-film transistor (TFT) is attracting a great de... [more]
SDM, EID, ITE-IDY [detail] 2019-12-24
16:00
Nara NAIST Stable Growth of (100)-Oriented Low Angle Grain Boundary Silicon Thin Films Extending to the length of 3000 μm by a Continuous-Wave Laser Lateral Crystallization
Muhammad Arif Razali, Nobuo Sasaki, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST)
The continuous wave laser lateral crystallization of amorphous-Si on quartz produces a {100}-oriented grain-boundary fre... [more]
EID, SDM, ITE-IDY [detail] 2018-12-25
11:00
Kyoto   Double-Gate Cu-MIC Poly-Ge TFT on Plastic Substrate
Hiroki Utsumi (Tohoku Gakuin Univ.), Kuninori Kitahara, Shinya Tsukada (Shimane Univ.), Hitoshi Suzuki, Akito Hara (Tohoku Gakuin Univ.) EID2018-4 SDM2018-77
Polycrystalline-germanium (poly-Ge) thin-film transistor (TFT) with double gate (DG) structure was fabricated via metal ... [more] EID2018-4 SDM2018-77
pp.1-4
EID, SDM, ITE-IDY [detail] 2018-12-25
13:15
Kyoto   Effects of SiOx Capping Film on Crystallization of Ge Film for Flash Lamp Annealing (Ⅱ)
Yoshiki akita, Naoto Matsuo (Univ. of Hyogo), Kazuyuki Kohama, Kazuhiro Ito (Osaka Univ.) EID2018-5 SDM2018-78
We examined the effect of SiOx capping film on Ge films in FLA. The crystallinity was different between SPC and LPC. At ... [more] EID2018-5 SDM2018-78
pp.17-20
SDM 2018-10-17
16:35
Miyagi Niche, Tohoku Univ. [Invited Talk] Cr2Ge2Te6-Based PCRAM Showing Low Resistance Amorphous and High Resistance Crystalline States
Shogo Hatayama, Yuji Sutou, Daisuke Ando, Junichi Koike (Tohoku Univ.) SDM2018-56
Phase change random access memory (PCRAM) has attracted much attention as one of next generation non-volatile memory. Ge... [more] SDM2018-56
pp.21-26
SAT, WBS
(Joint)
2018-05-25
11:05
Kagoshima Kagoshima University [Invited Talk] Sonochemistry, harnessing ultrasound to chemistry
Susumu Nii (Kagoshima Univ.) SAT2018-8
The lecture introduces sonochemistry, in which ultrasound is actively applied to chemistry in liquids to ignite unique c... [more] SAT2018-8
pp.37-40
SDM, EID 2017-12-22
15:30
Kyoto Kyoto University Self-Aligned Double-Gate Cu-MIC Poly-GeSn TFT on a Glass Substrate
Naoki Nishiguchi, Hiroki Utsumi, Akito Hara (Tohoku Gakuin Univ.) EID2017-24 SDM2017-85
Germanium tin (GeSn) is known as a new semiconductor device material. We used metal induced crystallization (MIC) using ... [more] EID2017-24 SDM2017-85
pp.67-70
SDM, OME 2016-04-08
16:00
Okinawa Okinawa Prefectural Museum & Art Museum Non-thermal energy utilized low temperature solid phase crystallization of amorphous Ge on SiO2 substrate
Kinta Kusano, Kazuki Kudo, Kodai Tomouchi, Taisei Sakaguchi, Kenta Moto (NIT, Kumamoto), Shinichi Motoyama, Yutaka Kusuda, Masahiro Furuta (SAMCO), Nobuyuki Naka, Tomoko Numata (HORIBA), Kenichiro Takakura, Isao Tsunoda (NIT, Kumamoto) SDM2016-8 OME2016-8
We have investigated the low-temperature SPC of amorphous Ge on insulating substrate. High temperature and long time ann... [more] SDM2016-8 OME2016-8
pp.31-34
SDM, OME 2016-04-09
11:15
Okinawa Okinawa Prefectural Museum & Art Museum Self-Aligned Four-Terminal Metal Double-Gate LT Ni-SPC Poly-Si TFT with High-k Gate Stack
Syota Nibe, Hiroki Ohsawa, Akito Hara (Tohoku Gakuin Univ.) SDM2016-15 OME2016-15
Self-aligned four-terminal (4T) metal double-gate (MeDG) low-temperature (LT) polycrystalline-silicon (poly-Si) thin fil... [more] SDM2016-15 OME2016-15
pp.61-65
OME, SDM 2015-04-30
10:00
Okinawa Oh-hama Nobumoto Memorial Hall [Invited Talk] Formation of high Sn content SiSn films and its band structure -- Aiming for direct-band-gap semiconductor --
Masashi Kurosawa, Wakana Takeuchi, Mitsuo Sakashita, Osamu Nakatsuka, Shigeaki Zaima (Nagoya Univ.) SDM2015-9 OME2015-9
This paper reports our recent progress in advanced Sn-assisted low-temperature crystallization methods for Si$_{1-x}$Sn$... [more] SDM2015-9 OME2015-9
pp.35-37
OME, SDM 2015-04-30
10:40
Okinawa Oh-hama Nobumoto Memorial Hall Lateral solid-phase crystallization of a-GeSn on insulator for next generation flexible electronics
Ryo Matsumura (Kyushu Univ./ JSPS), Hironori Chikita, Yuki Kai, Masaya Sasaki, Taizoh Sadoh, Hiroshi Ikenoue, Masanobu Miyao (Kyushu Univ.) SDM2015-10 OME2015-10
In order to realize next generation flexible electronics, high carrier mobility materials, such as GeSn, has to be cryst... [more] SDM2015-10 OME2015-10
pp.39-40
OME, SDM 2015-04-30
13:25
Okinawa Oh-hama Nobumoto Memorial Hall Temperature Analysis of Si Films during Blue Multi-Laser Diode Annealing
Tatsuya Okada, Seita Kamimura, Takashi Noguchi (Univ. Ryukyus) SDM2015-14 OME2015-14
We have reported that Blue Multi-Laser Diode Annealing (BLDA) is effective to crystallize Si films for next generation S... [more] SDM2015-14 OME2015-14
pp.53-55
SDM, EID 2014-12-12
13:30
Kyoto Kyoto University Low-Temperature CLC Poly-Si TFTs with Sputtered HfO2 Gate Dielectric Layer
Tatsuya Meguro, Akito Hara (Tohoku Gakuin Univ.) EID2014-23 SDM2014-118
To achieve high performance low-temperature (LT) polycrystalline-silicon (poly-Si) thin-film transistors (TFTs), high-k ... [more] EID2014-23 SDM2014-118
pp.51-54
SDM, OME 2014-04-10
15:00
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Influence of electron irradiation on Au-induced crystallization for amorphous Ge/SiO2-substrate
Kenta Moto, Shin Sakiyama, Takatsugu Sakai, Kazutoshi Nakashima, Hayato Okamoto, Kenichiro Takakura, Isao Tsunoda (KNCT) SDM2014-5 OME2014-5
Au-induced crystallization for amorphous Ge(a-Ge)thin film on insulator is investigated as low-temperature crystallizati... [more] SDM2014-5 OME2014-5
pp.21-25
 Results 1 - 20 of 64  /  [Next]  
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