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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2013-12-13
17:40		 Nara NAIST Structural Change of Silicon Carbide Surface Etched by Chlorine-Trifluoride
Ryota Hori, Tomoaki Hatayama, Hiroshi Yano, Takashi Fuyuki (NAIST) SDM2013-134		 Silicon carbide surface with 4°-off toward <11-20> was chemically etched by chlorine-trifluoride gas without plasma. The... [more] SDM2013-134
pp.107-112
SDM 2012-12-07
10:15		 Kyoto Kyoto Univ. (Katsura) Plasmaless etching of silicon carbide using chlorine based gas
Tomoaki Hatayama, Ryouta Hori, Tetsuya Tamura, Hiroshi Yano, Takashi Fuyuki (NAIST) SDM2012-116		 Silicon carbide (SiC) could be etched by a plasmaless process in chlorine based ambient over 900oC. The etch pits were f... [more] SDM2012-116
pp.7-12
US 2012-09-24
15:10		 Akita Tegata Campus, Akita Univ. Evaluation of Silica Glasses by the Ultrasonic Microspectroscopy Technology -- Effects of OH and Cl on Fictive Temperature Dependences of Acoustic Properties --
Mototaka Arakawa, Yuji Ohashi, Yuko Maruyama, Jun-ichi Kushibiki (Tohoku Univ.), Hideharu Horikoshi, Kenji Moriyama (Tosoh SGM) US2012-62		 In this paper, an evaluation method of silica glasses by the ultrasonic microspectroscopy technology was discussed. Six... [more] US2012-62
pp.27-32
US 2008-09-25
14:30		 Miyagi   Evaluation of synthetic silica glasses by the ultrasonic microspectroscopy technology
Mototaka Arakawa, Hideki Shimamura, Jun-ichi Kushibiki (Tohoku Univ.) US2008-34		 Ultrasonic microspectroscopy technology is applied to characterization of synthetic silica glasses. Acoustic properties... [more] US2008-34
pp.13-18
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