| IEICE Technical Committee Submission System Conference Schedule |
Online Proceedings [Sign in] Tech. Rep. Archives |
All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| CPM, ED, LQE | 2022-11-24 13:05 |
Aichi | Winc Aichi (Aichi Industry & Labor Center) (Primary: On-site, Secondary: Online) |
Al-doped ZnO thin films deposited by sol-gel method Koji Abe, Tasuku Kubota (NITech)  ED2022-30 CPM2022-55 LQE2022-63 |
Sol-gel process is used to deposit oxide semiconductor thin films such as zinc oxide (ZnO). However, resistivity of ZnO ... [more] | ED2022-30 CPM2022-55 LQE2022-63 pp.33-36 |
| EID, SDM, ITE-IDY [detail] | 2020-12-02 10:30 |
Online | Online | Characterization of amorphous Ga-Sn-O thin film thermoelectric conversion element Yuhei Yamamoto, Tatuya Aramaki, Ryo Ito, Mutumi Kimura (Ryukoku Univ.) EID2020-3 SDM2020-37 |
Most of the exhaust heat generated from factories, automobiles, PCs, etc. is unused. Thermoelectric conversion device ca... [more] | EID2020-3 SDM2020-37 pp.9-12 |
| ED, LQE, CPM | 2018-11-30 11:15 |
Aichi | Nagoya Inst. tech. | Fabrication and evaluation of p-type Cu-AlOx thin film by photochemical deposition method Masanari Umemura, Masaya Ichimura (Nagoya Inst. Tech.) ED2018-46 CPM2018-80 LQE2018-100 |
AlOx has many physical properties suitable for electronic devices such as wide bandgap and high dielectric breakdown ele... [more] | ED2018-46 CPM2018-80 LQE2018-100 pp.65-70 |
| CPM, ED, SDM | 2016-05-20 09:55 |
Shizuoka | Shizuoka University, Hamamatsu campus (Joint Research Lab.) | Annealing of p-type wide-gap CuxZnyS thin films deposited by the photochemical deposition method Bayingaerdi Tong, Masaya Ichimura (NITech) ED2016-22 CPM2016-10 SDM2016-27 |
Zn-rich of CuxZnyS is a transparent p-type semiconductor. We prepared the CuxZnyS thin films by the photochemical deposi... [more] | ED2016-22 CPM2016-10 SDM2016-27 pp.43-46 |
| ED, SDM | 2016-03-03 14:00 |
Hokkaido | Centennial Hall, Hokkaido Univ. | [Invited Talk]
A Recent Development in Thin-Film Device Applications using Oxide Semiconductors Toshihiko Maemoto, Yi Sun, Souhei Matsuda, Shota Sasaki, Kouhei Ashida, Oliver Kaltstein, Masatoshi Koyama, Kazuto Koike, Mitsuaki Yano, Shigehiko Sasa (Osaka Inst. Tech.) ED2015-121 SDM2015-128 |
We report on the fabrication and characterization of flexible thin-film-transistors using a transparent zinc oxide (ZnO)... [more] | ED2015-121 SDM2015-128 pp.1-6 |
| OME | 2013-03-08 15:20 |
Tokyo | Kikai-Shinko-Kaikan Bldg. B1-2 | Semi-transparent Organic Photovoltaic using Lamination Process Kenta Fukada, Chieko Shimada, Seimei Shiratori (Keio Univ.) OME2012-111 |
We fabricated semi-transparent organic photovoltaic by lamination process. In this study, in order to optimize the devic... [more] | OME2012-111 pp.27-32 |
| SDM, ED | 2013-02-27 16:05 |
Hokkaido | Hokkaido Univ. | Rectification in ZnO Self Switching Nano-Diodes toward Flexible Device Applications Yi Sun, Yuta Kimura, Toshihiko Maemoto, Shigehiko Sasa (Osaka Inst. of Tech.), Seiya Kasai (Hokkaido Univ.) ED2012-133 SDM2012-162 |
We focus on Self Switching nano-Diodes (SSD) as a application for oxide semiconductors. The SSD is a novel functional na... [more] | ED2012-133 SDM2012-162 pp.31-34 |
| OME, OPE | 2012-11-16 13:30 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Improvement of wet processed ZnO FET characteristics by UV/O3 assisted thermal treatments Wataru Sakai, Hiroshi Yamauchi, Shigekazu Kuniyoshi, Masaaki Iizuka, Masatoshi Sakai, Kazuhiro Kudo (Chiba Univ.) OME2012-56 OPE2012-128 |
We proposed the organic light emitting transistors (OLETs) with transparent ZnO FET. In this study, we fabricated wet pr... [more] | OME2012-56 OPE2012-128 pp.7-11 |
| ITE-IDY, EID | 2012-11-07 15:00 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Report on IMID 2012
-- Thin-Film Transistor technologies -- Aya Hino, Kazushi Hayashi (Kobelco) |
We review the papers that were presented in the session of TFT-related technologies at IMID 2012. [more] | |
| SDM, ED (Workshop) |
2012-06-27 15:45 |
Okinawa | Okinawa Seinen-kaikan | Influence of co-sputtered HfO2-Ti gate dielectric in IZO-based Transparent thin film transistors Jungil Yang, Donghee Lee, Dongkyu Cho, Sanghyun Woo, Yoosung Lim, Sungmin Park, Daekuk Kim, Moonsuk Yi (PNU.) |
Metal-oxide thin film transistors (TFTs) have been fabricated using HfO2 and co-sputtered HfO2–Ti (HfTiO) as gate ... [more] | |
| LQE, PN, OPE, OFT, EMT | 2006-02-02 14:40 |
Hyogo | Kobe Univ. | Completely transparent wavelength conversion method using four-wave mixing in Mach-Zehnder interferometric SOA Koji Otsubo, Shinsuke Tanaka, Shuichi Tomabechi, Ken Morito, Haruhiko Kuwatsuka (Fujitsu Labs. Ltd.) |
We propose a novel method to realize wavelength conversion with complete transparency, high conversion efficiency, wide ... [more] | PN2005-94 OFT2005-81 OPE2005-142 LQE2005-157 pp.51-54 |
[Return to Top Page]