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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 15 of 15  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
EMD 2024-03-01
16:15
Chiba   Automatic contact resistance measurement of electrical contacts operating in various atmospheres
Tomoito Ito, Yuto Mukai, Kiyoshi Yoshida (NIT) EMD2023-47
The purpose of this report was to experiment to see how various atmospheres affect the contact resistance of electrical ... [more] EMD2023-47
pp.46-51
EMD 2023-03-03
16:55
Saitama NIT and Online
(Primary: On-site, Secondary: Online)
Automatic measurement system for contact resistance of electric contact -- Improvement of the auto range --
Masato Fujisaki, Ayumu Hashizume, Koichiro Sawa, Kiyoshi Yoshida (NIT) EMD2022-33
In this report, we improve a system that automatically sets the optimum input voltage range for each measurement (hereaf... [more] EMD2022-33
pp.70-75
EMD 2022-03-04
14:40
Online Online Improvement and measurement of automatic contact resistance measurement system for electrical contacts
Ryo Oyamada, Syun Kanaya, Kiyoshi Yoshida (NIT) EMD2021-19
In our laboratory, we made an automatic contact resistance measurement system for electrical contacts using LabVIEW. Ho... [more] EMD2021-19
pp.25-30
EMD 2021-03-08
14:20
Online Online Continuous open and close test of contact resistance of electromagnetic contactor
Yoshihiro Sudo, Kohei Chiba, Koichiro Sawa, Kiyoshi Yoshida (NIT) EMD2020-32
In this study, the contact resistance when a small current was applied at DC5V, was automatically measured. In the expe... [more] EMD2020-32
pp.18-22
EMD 2020-07-17
15:00
Hokkaido Chitose-Arcadia-Plaza Production of automatic measurement system for contact resistance and its measurement results -- Contact resistance when switching 1 million times under small load condition --
Kiyoshi Yoshida, Koichiro Sawa (NIT), Kenji Suzuki (Fuji FA Comp. & Sys.) EMD2020-6
In this study, we constructed an automatic measurement system for the contact resistance of electrical contacts. This sy... [more] EMD2020-6
pp.17-22
EMD 2020-03-06
16:05
Chiba CHIBA Institute of Technology Tsudanuma Campus
(Cancelled but technical report was issued)
Production of Automatic Contact Resistance Measurement System for Electrical Contacts
Tatsuya Onodera, Sho Kashiwabara, Koichiro Sawa, Kiyoshi Yoshida (NIT) EMD2019-69
In this study, we constructed an automatic measurement system for the contact resistance of electrical contacts. This sy... [more] EMD2019-69
pp.51-56
OME 2019-12-20
13:00
Saga avancée (Saga city) Carbon-bridged Oligo(phenylenevinylene)s (COPV6) Single-Electron Transistor based on Electroless Au-plated (ELGP) Nanogap Electrodes
Rikiya Irie, Chun Ouyang, Yuma Ito, Phan Trong Tue (Tokyo Tech), Hayato Tsuji (Kanagawa Unib), Eiichi Nakamura (Univ. Tokyo), Yutaka Majima (Tokyo Tech) OME2019-37
Molecular transistors have been studied for 50 years, however electrical contacts to a single-molecule have been the iss... [more] OME2019-37
pp.9-12
EMD 2019-03-01
14:00
Tokyo   Contact reliability of electrical contacts by continuous make/break test of electromagnetic contactor
Ikarashi Masanari, Ogaki Asuka, Koichiro Sawa, Kiyoshi Yoshida (NIT) EMD2018-67
In this research, we conducted 5 million times of opening and closing experiments with contacts under minute load condit... [more] EMD2018-67
pp.41-46
MRIS, ITE-MMS 2017-06-09
09:15
Miyagi Tohoku Univ. FEM analysis of PMR write head for high data rate
Yoshihisa Nakamura (Tohoku Univ.), Ryo Itagaki, Yasushi Kanai (Niigata Inst. Tech.) MR2017-6
A write head with a fast response and high efficiency is necessary to realize higher data rates and larger storage capac... [more] MR2017-6
pp.41-46
CPM 2014-09-04
16:20
Yamagata The 100th Anniversary Hall, Yamagata University Control of CexY(3-x)Fe5O12 Thin Film Orientation by Crystal Contact Epitaxy
Satoru Noge (NumazuNIT) CPM2014-81
his paper was described the contact epitaxial method that is the crystal thin-film formation technology in which the inf... [more] CPM2014-81
pp.33-36
ED, SDM 2014-02-28
12:05
Hokkaido Hokkaido Univ. Centennial Hall Formation Scheme of Nano-Scale Devices Based on Ni Nanogaps Using Field-Emission-Induced Electromigration
Ryutaro Suda, Mitsuki Ito, Kohei Morihara, Takahiro Toyonaka, Kazuki Takikawa, Jun-ichi Shirakashi (Tokyo Univ. of Agr. & Tech.) ED2013-149 SDM2013-164
We propose a simple and easy fabrication scheme of ferromagnetic single-electron transistors (FMSETs), nanogap based res... [more] ED2013-149 SDM2013-164
pp.95-100
OFT 2012-01-20
09:25
Kagawa   Single-mode Optical Fiber Cleaving Condition for Physical Contact Connection with Cleaved and Unpolished Endface
Ryo Koyama, Kazuhide Nakajima, Hisashi Izumita, Toshio Kurashima (NTT) OFT2011-66
Physical contact (PC) connection is a butt jointing technique for optical fibers, in which fiber cores are brought into ... [more] OFT2011-66
pp.51-54
CPM 2007-11-16
12:55
Niigata Nagaoka University of Technology Fabrication and characterization of Bi-based high-Tc superconductor devices
Takashi Yoshida, Hiroaki Nawa, Hayataka Tominaga, Atsushi Miwa, Takahiro Kato, Katsuyoshi Hamasaki (NUT), Hisashi Shimakage (NICT) CPM2007-106
FIB (Focused Ion Beam) and double-side fabrication techniques were widely used to fabricate intrinsic Josephson junction... [more] CPM2007-106
pp.7-11
WIT 2007-03-24
09:00
Aichi Chukyo Univ A versatile single switch using a photo-reflective sensor array for computer operation by patients with motor disabilities
Dongli Wu, Takuro Nakamura, Toyohiko Hayashi, Yasuo Nakamura (Niigata Univ.), Yuko Wakabayashi (JAPAN ALS), Satoshi Watanabe (Ftech)
For communications of persons with motor disabilities, single switches for computer operation have been developed by usi... [more] WIT2006-124
pp.109-114
EMCJ 2006-04-18
15:30
Tokyo Aoyama Gakuin Univ. (Aoyama Campus) FDTD Simulation of Contact Discharge to Single Sided PCB by an ESD-gun
Hiroya Ueyama, Takafumi Kondo, Akimasa Hirata, Osamu Fujiwara (Nagoya Inst. of Tech.), Tsuyoshi Maeno (DENSO) EMCJ2006-6
The electromagnetic (EM) noise caused by electrostatic discharge (ESD) events due to charged metals is a major source of... [more] EMCJ2006-6
pp.31-35
 Results 1 - 15 of 15  /   
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