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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 4 of 4  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
VLD 2016-03-02
10:30
Okinawa Okinawa Seinen Kaikan Self-Aligned Quadruple Patterning-Aware Three-Color Grid Routing with Different Color Net
Toshiyuki Hongo, Atsushi Takahashi (Tokyo Tech) VLD2015-135
Self-Aligned Quadruple Patterning (SAQP) is an important manufacturing technique for sub 14 nm technology node.
In this... [more]
VLD2015-135
pp.137-142
VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM
(Joint) [detail]
2015-12-02
17:10
Nagasaki Nagasaki Kinro Fukushi Kaikan Effective Routing Pattern Generation with an Optimum Tertiary Routing Algorithm for Self-Aligned Quadruple Patterning
Takeshi Ihara, Atsushi Takahashi (Tokyo Tech) VLD2015-53 DC2015-49
Self-Aligned Quadruple Patterning (SAQP) is an important manufacturing technique for sub 14 nm technology node.
Althou... [more]
VLD2015-53 DC2015-49
pp.93-98
VLD, IPSJ-SLDM 2015-05-14
10:05
Fukuoka Kitakyushu International Conference Center NP-completeness of Routing Problem with Bend Constraint
Toshiyuki Hongo, Atsushi Takahashi (Tokyo Tech) VLD2015-3
Self-Aligned Quadruple Patterning (SAQP) in which side-wall process is repeated twice is an important manufacturing tech... [more] VLD2015-3
pp.13-18
VLD 2014-03-04
14:40
Okinawa Okinawa Seinen Kaikan Self-Aligned Double and Quadruple Patterning-Aware Grid Routing
Chikaaki Kodama (Toshiba), Hirotaka Ichikawa (Toshiba Microelectronics), Fumiharu Nakajima, Koichi Nakayama, Shigeki Nojima, Toshiya Kotani (Toshiba) VLD2013-151
Self-Aligned Double and Quadruple Patterning (SADP, SAQP) are leading candidates for sub-$20~nm$ and sub-$14~nm$ node an... [more] VLD2013-151
pp.99-104
 Results 1 - 4 of 4  /   
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