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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| MRIS, CPM, ITE-MMS, OME [detail] | 2023-10-27 10:30 |
Niigata | Niigata Univ. Ekiminami Campus (Primary: On-site, Secondary: Online) |
Mechanical properties and heat resistance of Si- and N-doped diamond-like carbon films Yuya Yamazaki, Yuya Sasaki, Hideki Nakazawa (Hirosaki Univ.)  MRIS2023-17 CPM2023-51 OME2023-38 |
Silicon- and nitrogen-doped diamond-like carbon (Si–N–DLC) films have been deposited by plasma-enhanced chemical vapor d... [more] | MRIS2023-17 CPM2023-51 OME2023-38 pp.33-36 |
| CPM | 2023-08-01 10:05 |
Hokkaido | (Primary: On-site, Secondary: Online) |
Evaluation of the Physical Properties of Reactive sputtered Ti or V-based MAX alloy thin film Kazuki Ueda, Kazunobu Wkamatsu, Takeyasu Saito, Naoki Okamoto (Osaka Metropolitan Univ.) CPM2023-20 |
Currently, Cu is the main wiring material in leading-edge semiconductor devices. However, since Cu easily diffuses into ... [more] | CPM2023-20 pp.33-35 |
| MRIS, ITE-MMS | 2022-12-08 13:55 |
Ehime | Ehime Univ. + Online (Primary: On-site, Secondary: Online) |
Current Induced Magnetization Switching of CPP-GMR with Perpendicular Magnetized SAF Pinned Layer Da Pan, Zhe Cao, Daiki Oshima, Takeshi Kato (Nagoya Univ.) MRIS2022-19 |
For the development of three-dimensional magnetic memory devices, we investigated current-induced magnetization reversal... [more] | MRIS2022-19 pp.7-10 |
| SDM | 2022-10-19 11:10 |
Online | Online | Resistance Masurement Technology for Statistical Analysis of Thin Films Materials for Emerging Memory with High Accuracy and Wide Range Hidemi Mitsuda, Ryousuke Tenman, Takezou Mawaki, Rihito Kuroda (Tohoku Univ) SDM2022-55 |
We report on a resistance measurement circuit that enables accurate, wide-range, and statistical evaluation of various t... [more] | SDM2022-55 pp.5-8 |
| EID, SDM, ITE-IDY [detail] | 2020-12-02 12:10 |
Online | Online | Brain type system using IGZO thin film synapses Yuki Onishi, Yuki Shibayama, Daiki Yamakawa (Ryukoku Univ.), Hiroya Ikeda, Yasuhiko Nakajima (NAIST), Mutumi Kimura (Ryukoku Univ./NAIST) EID2020-7 SDM2020-41 |
Neural networks have been actively studied as a future electronics technology. However, since the von Neumann-type arith... [more] | EID2020-7 SDM2020-41 pp.25-28 |
| MRIS, ITE-MMS, IEE-MAG | 2019-10-17 13:15 |
Fukuoka | Kyushu University (Nishijin Plaza) | Magnetic and thermal conduction properties in Pt on YIG Reiya Kawabe, Daiki Ito, Keishi Miyazaki, Minoru Yafuso, Takashi Kimura (Kyushu Univ.), W. -C. Lin, F. -Y. Lo (National Taiwan Normal University) MRIS2019-16 |
While interesting physical properties such as spin hole magnetoresistance effect are observed in ferromagnetic/paramagne... [more] | MRIS2019-16 pp.7-8 |
| ITE-IDY, EID, SID-JC [detail] | 2019-08-02 15:05 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | [Invited Lecture]
Characterization of Metal Thin Film-Wiring Materials for Foldable Displays Chiharu Kura, Yumi Teramae, Yuki Tauchi (KOBELCO), Hiroshi Goto, Hiroyuki Okuno (Kobelco Research Institute) |
Recently, flexible displays are receiving a lot of attention, and the demands of flexible displays are expected to incre... [more] | |
| ED | 2017-04-20 14:45 |
Miyagi | Fabrication of copper(I)-oxide-based resistors by ink-jet printing Satoshi Matsumura, Konami Izumi, Yasunori Yoshida, Hiroyuki Matsui, Daisuke Kumaki, Shizuo Tokito (Yamagata Univ.) ED2017-4 |
In this research, we focused copper (I) oxide in order to fabricate high resistance resistors which could not be realize... [more] | ED2017-4 pp.13-16 |
|
| EMD, R | 2017-02-17 14:00 |
Shiga | Omuron Kusatsu Factory | Effect of Hardness on Wear and Abrasion Resistance of Silver Plating on Copper Alloy Shigeru Sawada (SEI), Song-zhu Kure-chu, Rie Nakagawa, Toru Ogasawara, Hitoshi Yashiro (Iwate Uni.), Yasushi Saitoh (AN-Tech) R2016-63 EMD2016-90 |
This study is aimed at clarifying the mechanism of wear process for Ag plating with different hardness. The samples of A... [more] | R2016-63 EMD2016-90 pp.19-24 |
| OME | 2017-01-07 15:30 |
Tokyo | TUAT | Electrochemical behavior of Co-Cr alloy in NaCl solution Ryouji Suzuki (Shibaura Inst. Tech.), Yuta Yagi (Nakabohtec Corros. Protect./Shibaura Inst. Tech.), Kazuhiko Noda (Shibaura Inst. Tech.) OME2016-64 |
In this study, effect of alloy elements on corrosion behavior of Co-Cr alloy was investigated by electrochemical measure... [more] | OME2016-64 pp.23-25 |
| EMD | 2016-11-03 16:15 |
Hyogo | Awaji Yumebutai International Conference Center | Effect of hardness on wear and abrasion resistance of Silver plating on copper alloy Shigeru Sawada (AN-Tech), Song-zhu Kure-chu, Rie Nakagawa, Toru Ogasawara, Hitoshi Yashiro (Iwate Uni.), Yasushi Saitoh (AN-Tech) EMD2016-57 |
This study is aimed at clarifying the mechanism of wear process for Ag plating. The samples of different hardness Ag pla... [more] | EMD2016-57 pp.41-46 |
| EMD | 2016-10-21 15:15 |
Kanagawa | Phenomena on Contact Film Formation and the Surface Analysis Methods for Relay Contacts Takeshi Aoki (former TANAKA HD) EMD2016-48 |
Electrical contacts have been applied for speech path switches and control system relays in telephone exchange systems f... [more] | EMD2016-48 pp.13-17 |
|
| MW | 2015-05-29 15:10 |
Tokyo | The Univ. of Electro-Commun. | Design,test production and evaluation of Microwave Absorber with 377Ω; resisitance film for ITS field Toshihisa Kamei, Yutaro Oshima (NDA), Naoki Ohmura, Satoshi Ogino (MAI) MW2015-34 |
We report design , test production and evaluation of microwave absorber which consists of 377 Ω resistance film and foam... [more] | MW2015-34 pp.75-79 |
| EMD | 2015-05-15 14:25 |
Akita | Akita University Tegata Campus | Fretting Characteristics about Contact Load of Tin-plated Contacts Atsushi Shimizu, Yasushi Saitoh (AutoNetwork Tech.) EMD2015-3 |
The contact resistance between tin-plated contacts increases with rubbing under low contact load due to accumulated oxid... [more] | EMD2015-3 pp.13-18 |
| SDM | 2014-06-19 15:40 |
Aichi | VBL, Nagoya Univ. | [Invited Lecture]
Temperature Dependence of Resistance of Conductive Nano-filament in Resistance Change Memory Shintaro Otsuka, Yoshifumi Hamada, Tomohiro Shimizu, Shoso Shingubara (Kansai Univ.) SDM2014-57 |
Resistance change memory is expected to become one of next generation non-volatile memories. However, there is a questio... [more] | SDM2014-57 pp.75-78 |
| SCE | 2014-01-23 10:35 |
Tokyo | Kikaishinkou-kaikan Bldg. | Design of HTS-SQUID gradiometer with an external HTS-multiturn thin film pick-up coil Masayuki Teraoka (Tokyo Denki Univ.), Akira Tsukamoto, Seiji Adachi (ISTEC-SRL), Hiroshi Takai (Tokyo Denki Univ.), Keiichi Tanabe (ISTEC-SRL) SCE2013-38 |
Highly-sensitive HTS-SQUIDs are applied to various systems such as eddy-current non-destructive evaluation (NDE) and com... [more] | SCE2013-38 pp.19-23 |
| NC, MBE (Joint) |
2013-12-21 13:30 |
Gifu | Gifu University | Study on the disinfectant treatment tolerance and biofilm formation of heterotrophic bacteria Masaya Okayama, Toshitsugu Sugawara, Satoshi Kuroda, Noritaka Mamorita, Junji Arisawa, Kazuyuki Kimura (HIT) MBE2013-83 |
The cleanliness of the pure water for dilution of the dialysis fluid has closely related to the pollution of the heterot... [more] | MBE2013-83 pp.41-46 |
| MRIS, ITE-MMS | 2013-10-25 10:50 |
Fukuoka | Fukuoka-Kotsu-Center Bldg., Hakata Bus Terminal | [Invited Talk]
Giant tunnel magnetoresistance in perfectly lattice-matched magnetic tunnel junctions
-- Current status of spinel MgAl2O4-based tunnel barriers -- Hiroaki Sukegawa, Koichiro Inomata, Seiji Mitani (NIMS) MR2013-18 |
Tunnel magnetoresistance (TMR) devices with a monocrystalline MgAl2O4 barrier were successfully developed. The lattice m... [more] | MR2013-18 pp.35-40 |
| MW | 2013-03-07 10:10 |
Hiroshima | Hiroshima Univ. | A Power Divider with Insensitivity to Resistance Values Using a Parallely-loaded Resistor Pair Akimichi Hirota, Yukihiro Tahara, Hidenori Yukawa, Tetsu Owada, Yoshitsugi Yamaguchi, Moriyasu Miyazaki (Mitsubishi Electric) MW2012-170 |
In realizing an isolation resistor of the Wilkinson power divider by a resistance film, characteristics of the Wilkinson... [more] | MW2012-170 pp.59-62 |
| EMD, R | 2013-02-15 13:35 |
Mie | Sumitomo Wiring System, Ltd | Visualization of electric current in contact and effect of thin film on contact resistance Shigeru Sawada, Shigeki Tsukiji (Mie Univ.), Shigeki Shimada (Sumitomo Electric Industries), Terutaka Tamai (Elcontech), Yasuhiro Hattori (ANTech) R2012-72 EMD2012-103 |
The mathematical solutions and electrical field analysis results of current density distribution in electric contact hav... [more] | R2012-72 EMD2012-103 pp.1-6 |
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