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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 21 - 40 of 57 [Previous]  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
ED, SDM, CPM 2012-05-18
14:50
Aichi VBL, Toyohashi Univ. of Technol. Preparation and evaluation of LiMn2O4 films prepared by sputtering method
Akio Niwa, Masaaki Isai, Mitsuhiro Nakamura, Takashi Noguchi (Shizuoka Univ.) ED2012-37 CPM2012-21 SDM2012-39
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. In this research, w... [more] ED2012-37 CPM2012-21 SDM2012-39
pp.99-104
ED, SDM, CPM 2012-05-18
15:15
Aichi VBL, Toyohashi Univ. of Technol. Co-catalyitic effect on improving the photocatalytic properties of TiO2 films
Masaaki Isai, Ikuta Nakamura, Yuuki Hieda, Fumiya Fukazawa (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytech.Univ.) ED2012-38 CPM2012-22 SDM2012-40
Abstract TiO2 films were prepared with RF magnetron sputtering method. The copper (cu) and iron (Fe) films were deposit... [more] ED2012-38 CPM2012-22 SDM2012-40
pp.105-109
CPM 2011-10-26
13:50
Fukui Fukui Univ. Properties of AZO Thin Films Deposited at Room Temperature by the RF-DC Coupled Magnetron Sputtering Method
Jun Kashiide, Katsuhito Nagoshi, Yusuke Tomiguchi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) CPM2011-111
In order to examine that influence of low voltage sputtering method on properties of AZO thin films, deposition of AZO t... [more] CPM2011-111
pp.11-15
SDM 2011-10-20
15:20
Miyagi Tohoku Univ. (Niche) Effect of Si surface roughness on electrical characteristics of HfON gate insulator
Dae-Hee Han, Shun-ichiro Ohmi (Tokyo Inst. of Tech.) SDM2011-100
In this paper, the effect of Si surface roughness on electrical characteristics of HfON gate insulator formed by the ele... [more] SDM2011-100
pp.17-20
US 2011-09-27
10:25
Miyagi Tohoku Univ. Evaluation of Glass Multilayer Films by the Line-Focus-Beam Ultrasonic Material Characterization System
Mototaka Arakawa, Jun-ichi Kushibiki (Tohoku Univ.), Kazuhiko Itoh, Kazuyuki Etoh (JAE) US2011-56
Multilayer films for optical cavity with ultra-high finesse were evaluated by the line-focus-beam ultrasonic material ch... [more] US2011-56
pp.53-57
CPM 2011-08-11
09:25
Aomori   Preparation of Transparent Conducting AZO Thin Films by RF Magnetron Sputtering
Takeshi Umehara, Satoru Noge (Numazu NCT) CPM2011-67
In this study, the results of the study of thin film deposition conditions of AZO thin film by RF magnetron sputtering m... [more] CPM2011-67
pp.55-60
SDM 2011-07-04
16:20
Aichi VBL, Nagoya Univ. Resistive Switching Properties of Si-Oxide Thin Films Prepared by RF Sputtering
Akio Ohta, Yuta Goto, Shingo Nishigaki, Guobin Wei, Hideki Murakami, Seiichiro Higashi (Hiroshima Univ.), Seiichi Miyazaki (Nagoya Univ.) SDM2011-67
Resistance-switching properties of RF sputtered Si-rich oxides sandwiching with Pt electrodes have been studided in comp... [more] SDM2011-67
pp.97-102
EMD, CPM, OME 2011-06-30
16:55
Tokyo   Properties of AZO Thin Films Deposited at Room temperature by Low Voltage Sputtering Method
Jun Kashiide, Katsuhito Nagoshi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) EMD2011-18 CPM2011-54 OME2011-32
In order to examine that effect of high energy particles and fabricated conditions of targets, such as sintering tempera... [more] EMD2011-18 CPM2011-54 OME2011-32
pp.59-63
CPM, SDM, ED 2011-05-20
13:50
Aichi Nagoya Univ. (VBL) Stabilized Pt deposition on the TiO2 films and their photocatalytic properties
Ikuta Nakamura, Takanori Sato, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo polytech.Univ.) ED2011-28 CPM2011-35 SDM2011-41
TiO2 films were prepared with RF magnetron sputtering method. The platinum (Pt) films were deposited on the TiO2 films. ... [more] ED2011-28 CPM2011-35 SDM2011-41
pp.139-143
CPM, SDM, ED 2011-05-20
14:15
Aichi Nagoya Univ. (VBL) Preparation and evaluation of LiMn2O4 films prepared by sputtering method
Mitsuhiro Nakamura, Akio Niwa, Masaaki Isai (Shizuoka Univ.) ED2011-29 CPM2011-36 SDM2011-42
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. In this research, w... [more] ED2011-29 CPM2011-36 SDM2011-42
pp.145-149
OME 2011-02-07
13:50
Tokyo Kikai-Shinko-Kaikan Bldg. Application of Quartz Crystal Microbalance with Organic Thin Films prepared by Spin coat and RF Sputtering for Active Oxygen Monitoring
Hiroyuki Matsumoto, Kiyoshi Yoshino, Tatsuyuki Iwasaki, Shinobu Kinoshita (Iwasaki Electric), Kazutoshi Noda (AIST), Wataru Arai, Satoru Iwamori (Tokai Univ.) OME2010-70
To investigate potential as an active oxygen monitor, fluorocarbon polymers prepared by a spin coating and RF sputtering... [more] OME2010-70
pp.11-14
ITE-MMS, MRIS 2010-12-10
10:15
Ehime Ehime Univ. Crystal Structures and Magnetic Properties of Fe(001) Thin Films on GaAs(001) Deposited by RF Magnetron Sputtering
Yuya Wada, Hirokazu Ikeya, Yutaka Takahashi, Nobuyuki Inaba (Yamagata Univ.), Fumiyoshi Kirino (Tokyo National University of Fine Arts and Music), Mitsuru Ohtake, Masaaki Futamoto (Chuo Univ.) MR2010-50
Fe thin films, down to 6 nm thick, were prepared on GaAs(001) substrates by RF magnetron sputtering. The x-ray diffracti... [more] MR2010-50
pp.59-63
US 2010-09-29
15:40
Miyagi Tohoku Univ. Measurement of Propagation Characteristics of Leaky Surface Acoustic Waves for Lossy Specimen by the LFB Ultrasonic Material Characterization System
Takanori Kondo, Yuji Ohashi, Mototaka Arakawa, Jun-ichi Kushibiki (Tohoku Univ.) US2010-54
We investigated scattering effect observed in leaky surface acoustic wave (LSAW) propagation characteristics (phase velo... [more] US2010-54
pp.33-37
US 2010-09-30
10:50
Miyagi Tohoku Univ. c-axis parallel oriented ZnO film depositions by RF bias sputtering -- The effect of bias frequency on the orientation --
Shinji Takayanagi (Doshisha Univ.), Takahiko Yanagitani (Nagoya Inst. Tech.), Mami Matsukawa, Yoshiaki Watanabe (Doshisha Univ.) US2010-62
ZnO films where the crystallite c-axis is unidirectionally-aligned and parallel to the substrate plane [(11-20) or (10-2... [more] US2010-62
pp.75-80
US 2010-09-30
11:40
Miyagi Tohoku Univ. Fabrication of Film Bulk Acoustic Resonator Using Structure of Ta2O5 Thin Film/Si Substrate
Akinori Tsuchiya, Shoji Kakio (Yamanashi Univ.), Yasuhiko Nakagawa (Prof. Emeritus, Yamanashi Univ.) US2010-64
Highly X-axis-oriented tantalum pentoxide (Ta2O5) piezoelectric thin films were deposited using an RF-magnetron sputteri... [more] US2010-64
pp.87-92
SDM, CPM, ED 2010-05-14
10:25
Shizuoka Shizuoka University (Hamamatsu Campus) Investigation of deposition condition of LiMn2O4 films prepared by RF magnetron sputtering
Mitsuhiro Nakamura, Masaaki Isai (Shizuoka Univ.) ED2010-26 CPM2010-16 SDM2010-26
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. This research was d... [more] ED2010-26 CPM2010-16 SDM2010-26
pp.51-55
SDM, CPM, ED 2010-05-14
11:30
Shizuoka Shizuoka University (Hamamatsu Campus) Preparation of Pt-deposited TiO2 films and evaluation of photocatalystic properties
Ikuta Nakamura, Tatsuya Ito, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) ED2010-28 CPM2010-18 SDM2010-28
This research was designed for planning a progress of photocatalystic properties of TiO2 thin films with depositing Pt p... [more] ED2010-28 CPM2010-18 SDM2010-28
pp.61-64
ITE-MMS, MRIS 2010-03-12
14:30
Aichi Nagoya Univ. Structural Variation and Control of Magnetic Properties of MnBi This Films by Kr+ ion irradiation
Seisen Jyo, Takeshi Kato, Satoshi Iwata, Shigeru Tsunashima (Nagoya Univ.) MR2009-62
MnBi (15 nm) thin films were prepared by the magnetron sputtering of Mn/Bi multilayers followed by vacuum annealing of 3... [more] MR2009-62
pp.21-26
EMD 2009-12-18
14:55
Chiba   Electrical and Mechanical Characteristics of Metal-Doped Carbon Thin Films
Hiroshi Matsumoto, Tomoyuki Kamata, Shigeru Umemura (Chiba Inst. of Tech.), Mitsunori Yabe (NIHON AUTOMOBILE COLLEGE), Shigeru Hirono (MES-AFTY), Osamu Niwa (AIST), Diao Dongfeng (Xi'an Jiaotong University) EMD2009-110
To clarify the electrical and mechanical properties of various metal-doped carbon thin films, we deposited Ni- and Ag-do... [more] EMD2009-110
pp.21-24
OPE, OME 2009-11-13
14:35
Tokyo Kikai-Shinko-Kaikan Bldg. Surface plasmon resonance based refractive index sensor using Bragg fiber
Lin Ma, Takashi Katagiri, Yuji Matsuura (Tohoku Univ.) OME2009-61 OPE2009-156
We proposed a surface-plasmon resonance (SPR) sensor for refractive index measurement using a Bragg fiber. In this geome... [more] OME2009-61 OPE2009-156
pp.45-48
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