Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
ED, SDM, CPM |
2012-05-18 14:50 |
Aichi |
VBL, Toyohashi Univ. of Technol. |
Preparation and evaluation of LiMn2O4 films prepared by sputtering method Akio Niwa, Masaaki Isai, Mitsuhiro Nakamura, Takashi Noguchi (Shizuoka Univ.) ED2012-37 CPM2012-21 SDM2012-39 |
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. In this research, w... [more] |
ED2012-37 CPM2012-21 SDM2012-39 pp.99-104 |
ED, SDM, CPM |
2012-05-18 15:15 |
Aichi |
VBL, Toyohashi Univ. of Technol. |
Co-catalyitic effect on improving the photocatalytic properties of TiO2 films Masaaki Isai, Ikuta Nakamura, Yuuki Hieda, Fumiya Fukazawa (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytech.Univ.) ED2012-38 CPM2012-22 SDM2012-40 |
Abstract TiO2 films were prepared with RF magnetron sputtering method. The copper (cu) and iron (Fe) films were deposit... [more] |
ED2012-38 CPM2012-22 SDM2012-40 pp.105-109 |
CPM |
2011-10-26 13:50 |
Fukui |
Fukui Univ. |
Properties of AZO Thin Films Deposited at Room Temperature by the RF-DC Coupled Magnetron Sputtering Method Jun Kashiide, Katsuhito Nagoshi, Yusuke Tomiguchi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) CPM2011-111 |
In order to examine that influence of low voltage sputtering method on properties of AZO thin films, deposition of AZO t... [more] |
CPM2011-111 pp.11-15 |
SDM |
2011-10-20 15:20 |
Miyagi |
Tohoku Univ. (Niche) |
Effect of Si surface roughness on electrical characteristics of HfON gate insulator Dae-Hee Han, Shun-ichiro Ohmi (Tokyo Inst. of Tech.) SDM2011-100 |
In this paper, the effect of Si surface roughness on electrical characteristics of HfON gate insulator formed by the ele... [more] |
SDM2011-100 pp.17-20 |
US |
2011-09-27 10:25 |
Miyagi |
Tohoku Univ. |
Evaluation of Glass Multilayer Films by the Line-Focus-Beam Ultrasonic Material Characterization System Mototaka Arakawa, Jun-ichi Kushibiki (Tohoku Univ.), Kazuhiko Itoh, Kazuyuki Etoh (JAE) US2011-56 |
Multilayer films for optical cavity with ultra-high finesse were evaluated by the line-focus-beam ultrasonic material ch... [more] |
US2011-56 pp.53-57 |
CPM |
2011-08-11 09:25 |
Aomori |
|
Preparation of Transparent Conducting AZO Thin Films by RF Magnetron Sputtering Takeshi Umehara, Satoru Noge (Numazu NCT) CPM2011-67 |
In this study, the results of the study of thin film deposition conditions of AZO thin film by RF magnetron sputtering m... [more] |
CPM2011-67 pp.55-60 |
SDM |
2011-07-04 16:20 |
Aichi |
VBL, Nagoya Univ. |
Resistive Switching Properties of Si-Oxide Thin Films Prepared by RF Sputtering Akio Ohta, Yuta Goto, Shingo Nishigaki, Guobin Wei, Hideki Murakami, Seiichiro Higashi (Hiroshima Univ.), Seiichi Miyazaki (Nagoya Univ.) SDM2011-67 |
Resistance-switching properties of RF sputtered Si-rich oxides sandwiching with Pt electrodes have been studided in comp... [more] |
SDM2011-67 pp.97-102 |
EMD, CPM, OME |
2011-06-30 16:55 |
Tokyo |
|
Properties of AZO Thin Films Deposited at Room temperature by Low Voltage Sputtering Method Jun Kashiide, Katsuhito Nagoshi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) EMD2011-18 CPM2011-54 OME2011-32 |
In order to examine that effect of high energy particles and fabricated conditions of targets, such as sintering tempera... [more] |
EMD2011-18 CPM2011-54 OME2011-32 pp.59-63 |
CPM, SDM, ED |
2011-05-20 13:50 |
Aichi |
Nagoya Univ. (VBL) |
Stabilized Pt deposition on the TiO2 films and their photocatalytic properties Ikuta Nakamura, Takanori Sato, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo polytech.Univ.) ED2011-28 CPM2011-35 SDM2011-41 |
TiO2 films were prepared with RF magnetron sputtering method. The platinum (Pt) films were deposited on the TiO2 films. ... [more] |
ED2011-28 CPM2011-35 SDM2011-41 pp.139-143 |
CPM, SDM, ED |
2011-05-20 14:15 |
Aichi |
Nagoya Univ. (VBL) |
Preparation and evaluation of LiMn2O4 films prepared by sputtering method Mitsuhiro Nakamura, Akio Niwa, Masaaki Isai (Shizuoka Univ.) ED2011-29 CPM2011-36 SDM2011-42 |
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. In this research, w... [more] |
ED2011-29 CPM2011-36 SDM2011-42 pp.145-149 |
OME |
2011-02-07 13:50 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Application of Quartz Crystal Microbalance with Organic Thin Films prepared by Spin coat and RF Sputtering for Active Oxygen Monitoring Hiroyuki Matsumoto, Kiyoshi Yoshino, Tatsuyuki Iwasaki, Shinobu Kinoshita (Iwasaki Electric), Kazutoshi Noda (AIST), Wataru Arai, Satoru Iwamori (Tokai Univ.) OME2010-70 |
To investigate potential as an active oxygen monitor, fluorocarbon polymers prepared by a spin coating and RF sputtering... [more] |
OME2010-70 pp.11-14 |
ITE-MMS, MRIS |
2010-12-10 10:15 |
Ehime |
Ehime Univ. |
Crystal Structures and Magnetic Properties of Fe(001) Thin Films on GaAs(001) Deposited by RF Magnetron Sputtering Yuya Wada, Hirokazu Ikeya, Yutaka Takahashi, Nobuyuki Inaba (Yamagata Univ.), Fumiyoshi Kirino (Tokyo National University of Fine Arts and Music), Mitsuru Ohtake, Masaaki Futamoto (Chuo Univ.) MR2010-50 |
Fe thin films, down to 6 nm thick, were prepared on GaAs(001) substrates by RF magnetron sputtering. The x-ray diffracti... [more] |
MR2010-50 pp.59-63 |
US |
2010-09-29 15:40 |
Miyagi |
Tohoku Univ. |
Measurement of Propagation Characteristics of Leaky Surface Acoustic Waves for Lossy Specimen by the LFB Ultrasonic Material Characterization System Takanori Kondo, Yuji Ohashi, Mototaka Arakawa, Jun-ichi Kushibiki (Tohoku Univ.) US2010-54 |
We investigated scattering effect observed in leaky surface acoustic wave (LSAW) propagation characteristics (phase velo... [more] |
US2010-54 pp.33-37 |
US |
2010-09-30 10:50 |
Miyagi |
Tohoku Univ. |
c-axis parallel oriented ZnO film depositions by RF bias sputtering
-- The effect of bias frequency on the orientation -- Shinji Takayanagi (Doshisha Univ.), Takahiko Yanagitani (Nagoya Inst. Tech.), Mami Matsukawa, Yoshiaki Watanabe (Doshisha Univ.) US2010-62 |
ZnO films where the crystallite c-axis is unidirectionally-aligned and parallel to the substrate plane [(11-20) or (10-2... [more] |
US2010-62 pp.75-80 |
US |
2010-09-30 11:40 |
Miyagi |
Tohoku Univ. |
Fabrication of Film Bulk Acoustic Resonator Using Structure of Ta2O5 Thin Film/Si Substrate Akinori Tsuchiya, Shoji Kakio (Yamanashi Univ.), Yasuhiko Nakagawa (Prof. Emeritus, Yamanashi Univ.) US2010-64 |
Highly X-axis-oriented tantalum pentoxide (Ta2O5) piezoelectric thin films were deposited using an RF-magnetron sputteri... [more] |
US2010-64 pp.87-92 |
SDM, CPM, ED |
2010-05-14 10:25 |
Shizuoka |
Shizuoka University (Hamamatsu Campus) |
Investigation of deposition condition of LiMn2O4 films prepared by RF magnetron sputtering Mitsuhiro Nakamura, Masaaki Isai (Shizuoka Univ.) ED2010-26 CPM2010-16 SDM2010-26 |
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. This research was d... [more] |
ED2010-26 CPM2010-16 SDM2010-26 pp.51-55 |
SDM, CPM, ED |
2010-05-14 11:30 |
Shizuoka |
Shizuoka University (Hamamatsu Campus) |
Preparation of Pt-deposited TiO2 films and evaluation of photocatalystic properties Ikuta Nakamura, Tatsuya Ito, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) ED2010-28 CPM2010-18 SDM2010-28 |
This research was designed for planning a progress of photocatalystic properties of TiO2 thin films with depositing Pt p... [more] |
ED2010-28 CPM2010-18 SDM2010-28 pp.61-64 |
ITE-MMS, MRIS |
2010-03-12 14:30 |
Aichi |
Nagoya Univ. |
Structural Variation and Control of Magnetic Properties of MnBi This Films by Kr+ ion irradiation Seisen Jyo, Takeshi Kato, Satoshi Iwata, Shigeru Tsunashima (Nagoya Univ.) MR2009-62 |
MnBi (15 nm) thin films were prepared by the magnetron sputtering of Mn/Bi multilayers followed by vacuum annealing of 3... [more] |
MR2009-62 pp.21-26 |
EMD |
2009-12-18 14:55 |
Chiba |
|
Electrical and Mechanical Characteristics of Metal-Doped Carbon Thin Films Hiroshi Matsumoto, Tomoyuki Kamata, Shigeru Umemura (Chiba Inst. of Tech.), Mitsunori Yabe (NIHON AUTOMOBILE COLLEGE), Shigeru Hirono (MES-AFTY), Osamu Niwa (AIST), Diao Dongfeng (Xi'an Jiaotong University) EMD2009-110 |
To clarify the electrical and mechanical properties of various metal-doped carbon thin films, we deposited Ni- and Ag-do... [more] |
EMD2009-110 pp.21-24 |
OPE, OME |
2009-11-13 14:35 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Surface plasmon resonance based refractive index sensor using Bragg fiber Lin Ma, Takashi Katagiri, Yuji Matsuura (Tohoku Univ.) OME2009-61 OPE2009-156 |
We proposed a surface-plasmon resonance (SPR) sensor for refractive index measurement using a Bragg fiber. In this geome... [more] |
OME2009-61 OPE2009-156 pp.45-48 |