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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 19 of 19  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
ICD 2024-04-11
11:10
Kanagawa
(Primary: On-site, Secondary: Online)
A Proposal for Thermal Problems of IC Using Waveguide -- Technology to Combat Thermal Problems Using Electromagnetic Waveguides --
Kazuyuki Ouchi (WDL) ICD2024-3
As a countermeasure against IC heat, Instead of using metal wiring for signal transfer between devices, it was proposed ... [more] ICD2024-3
pp.8-11
OME 2023-07-07
16:30
Mie Owase City Central Public Hall Electrochemical Performances of Plasma Treated Carbon Electrodes and Their Applications
Osamu Niwa, Saki Ohta, Tasuhiko Yajima, Shunsuke Shiba (Saitama Inst. Tech.) OME2023-20
Carbon electrodes show excellent stability and can be introduced various atoms and their functional groups onto the surf... [more] OME2023-20
pp.5-8
OME 2022-02-18
15:30
Oita Horuto Hall Oita
(Primary: On-site, Secondary: Online)
[Invited Talk] Sensing of heavy metal ions and biomolecules by stripping method
Osamu Niwa (Saitama Inst. Tech.) OME2021-60
In electrochemical analysis, a stripping analysis is known as one of most sensitive methods because analytes were initia... [more] OME2021-60
pp.11-15
OME 2020-02-28
15:20
Kagoshima Naze Public Hall Electrochemical properties of metal nanoparticles embedded carbon film electrodes and their applications
Niwa Osamu (Saitama Inst. Tech.), Shiba Shunsuke (Ehime Uni.), Takahashi Shota, Koike Ayaka, Ohtani Kazuya, Ohta Saki (Saitama Inst. Tech.), Kamata Tomoyuki, Kato Dai (AIST) OME2019-67
We developed novel metal nanoparticles embedded carbon film electrodes by co-sputtering of carbon and metal. The electro... [more] OME2019-67
pp.9-12
SDM 2019-10-23
15:40
Miyagi Niche, Tohoku Univ. Investigation of ferroelectric undoped HfO2 formation on Si(100) utilizing post metallization annealing for nonvolatile memory application
Min Gee Kim, Masakazu Kataoka, Masaki Hayashi, Rengie Mark D. Mailig, Shun-ichiro Ohmi (Tokyo Tech.) SDM2019-56
In this study, post metallization annealing (PMA) for the ferroelectric undoped HfO2 deposited on Si(100) was investigat... [more] SDM2019-56
pp.17-20
ITE-IDY, EID, SID-JC [detail] 2019-08-02
15:05
Tokyo Kikai-Shinko-Kaikan Bldg. [Invited Lecture] Characterization of Metal Thin Film-Wiring Materials for Foldable Displays
Chiharu Kura, Yumi Teramae, Yuki Tauchi (KOBELCO), Hiroshi Goto, Hiroyuki Okuno (Kobelco Research Institute)
Recently, flexible displays are receiving a lot of attention, and the demands of flexible displays are expected to incre... [more]
US 2018-12-10
15:25
Tokyo   One Wave-Length Longitudinal Vibration Mode Diagonal Slit Complex Vibration Converter for Ultrasonic Complex Vibration Welding System -- 27 kHz and 40 kHz Complex Vibration Welding Systems Using Various Exchangeable Welding Tips --
Jiromaru Tsujino (Kanagawa Univ., LINK-US) US2018-74
19.5 kHz complex vibration systems using various complex transverse vibration welding tips vibrating in rotating circula... [more] US2018-74
pp.21-26
SDM, ED, CPM 2017-05-26
10:45
Aichi VBL, Nagoya University N-polar GaN MIS-HEMTs with Flat Interface Grown by Optimized MOVPE
Kiattiwut Prasertsuk, Tomoyuki Tanikawa, Takeshi Kimura, Shigeyuki Kuboya, Tetsuya Suemitsu, Takashi Matsuoka (Tohoku Univ.) ED2017-26 CPM2017-12 SDM2017-20
An N-polar GaN high electron mobility transistor (HEMT) has an advantage over a Ga-polar HEMT from viewpoints of a poten... [more] ED2017-26 CPM2017-12 SDM2017-20
pp.59-64
US 2015-12-21
15:10
Tokyo Surugadai Campus, Nihon University Ultrasonic Welding Using a Long and Thin Complex Transverse Vibration Welding Tip with Vibration Detector and Static Pressure Controller -- Ultrasonic Complex Vibration Welding of Deep and Narrow Positions --
Jiromaru Tsujino (Kanagawa Univ./ Asahi EMS) US2015-78
Ultrasonic welding could not been applied for deep and narrow parts positioned at long distance from the vibration syste... [more] US2015-78
pp.23-28
ED 2015-04-16
14:45
Miyagi Laboratory for Nanoelectronics and Spintronics Effect of ALD Deposited HfO2 Coating on TiO2 Photo Electrodes in Dye Sensitized Solar Cells
Takahiro Imai, Yuki Kato, Bashir Ahmmad Arima, Shigeru Kubota, Fumihiko Hirose (Yamagata Univ.) ED2015-4
(To be available after the conference date) [more] ED2015-4
pp.15-18
OME 2015-03-17
17:10
Tokyo S421, Tokyo Tech. Application of electrospun nanofibers towards transparent conducting electrodes
Issei Takenaka, KyuHong Kyung, Seimei Shiratori (Keio Univ.) OME2014-89
We fabricated ultrafine nanofiber via electrospinning with controlling its morphology as a metallization template for tr... [more] OME2014-89
pp.37-42
SDM 2013-06-18
11:15
Tokyo Kikai-Shinko-Kaikan Bldg. Impact of metal gate electrodes on electrical properties of InGaAs MOS gate stacks
Chih-Yu Chang, Masafumi Yokoyama, Sang-Hyeon Kim (Univ. of Tokyo), Osamu Ichikawa, Takenori Osada, Masahiko Hata (Sumitomo Chemical), Mitsuru Takenaka, Shinichi Takagi (Univ. of Tokyo) SDM2013-50
Electrical properties of Al2O3 and HfO2/InGaAs metal-oxide-semiconductor (MOS) capacitors with Al, Au and Pd gate electr... [more] SDM2013-50
pp.33-37
EMD 2011-12-16
13:05
Tokyo NIT Kanda Camps A Review of Measured V-I Characteristics of Arcs between Metallic Electrodes -- Comparison with Values Experimentally Measured by C.E.Guye and L.Zebrikoff --
Keiichi Suhara (TNCT) EMD2011-106
Ayrton equation is famous for an expression of arc V-I characteristics. Guye and Zebrikoff studied the Ayrton constants ... [more] EMD2011-106
pp.1-3
SDM 2011-07-04
15:40
Aichi VBL, Nagoya Univ. Hf and La upward diffusion into TiN electrode in TiN/HfLaSiO/SiO2 gate stacks induced by high-temperature annealing and its suppression with MIPS structure
Yuki Odake, Hiroaki Arimura, Masayuki Saeki, Keisuke Chikaraishi, Naomu Kitano, Takuji Hosoi, Takayoshi Shimura, Heiji Watanabe (Osaka Univ.) SDM2011-65
We investigated Hf and La upward diffusion in TiN/HfLaSiO/SiO2 gate stacks by means of electrical characterization and X... [more] SDM2011-65
pp.87-92
US 2010-12-16
15:45
Kanagawa Suzukakedai Campus, Tokyo Institute of Technology Welding of Braided Wire and Various Metal Specimens Using 20 kHz Ultrasonic Complex Vibration Welding Equipments -- Welding of Copper, Bimetal, Braided Wires, Aluminum and Copper Foils --
Jiromaru Tsujino (Kanagawa Univ.), Takashi Yokozuka, Shinichiro Suga (Apollo Engineering), Eiichi Sugimoto (Asahi EMS) US2010-89
Welding characteristics of copper, bimetal strip, flexible braided copper and tin coated copper wires consisted of thin ... [more] US2010-89
pp.23-28
SDM 2010-11-11
14:40
Tokyo Kikai-Shinko-Kaikan Bldg. [Invited Talk] Comprehensive understanding of oxygen vacancy induced effective work function modulation in high-k/metal gate stacks
Takuji Hosoi, Masayuki Saeki, Yuki Kita, Yudai Oku, Hiroaki Arimura, Naomu Kitano (Osaka Univ.), Kenji Shiraishi, Keisaku Yamada (Univ. Tsukuba), Takayoshi Shimura, Heiji Watanabe (Osaka Univ.) SDM2010-175
Effective work function of p-type gate electrodes on Hf-based high-k dielectrics is known to decrease after high tempera... [more] SDM2010-175
pp.23-28
ED 2010-06-18
11:50
Ishikawa JAIST Photo corrosion of Metal Gate Electrodes during Wet
Daisuke Watanabe (Daikin Industries,Ltd.), Chiharu Kimura, Hidemitsu Aoki (Osaka Univ.) ED2010-46
Wet processes for removing high-k film involve the risk of enhanced galvanic corrosion at the gate electrode level. We f... [more] ED2010-46
pp.69-74
SDM 2009-10-29
16:45
Miyagi Tohoku University Current Voltage Characteristics of Si-MESFET on SOI Substrate
Toshiyuki Abe, Yuichiro Tanushi, Shin-Ichiro Kuroki, Koji Kotani, Takashi Ito (Tohoku Univ.) SDM2009-122
We simulate current-voltage characteristics of scaled Si metal semiconductor field effect transistors (MESFETs) and show... [more] SDM2009-122
pp.27-30
MRIS, ITE-MMS 2008-11-21
16:15
Tokyo Waseda University Search for half metallic Heusler alloys and their application to CPP-GMR
Takao Furubayashi, Yukiko Takahashi, Kazuhiro Hono (National Institute for Materials Science) MR2008-34
Spin polarization of Co-based Heusler alloys with various compositions was examined by point contact Andreev reflection ... [more] MR2008-34
pp.25-30
 Results 1 - 19 of 19  /   
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