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Date Time
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Abstract
Paper #
OPE
2007-12-14
14:40
Tokyo
Kikai-Shinko-Kaikan Bldg.
silicon photonic crystal device fabricated using high-aspect ratio dry etching technique
Kazuhiko Hosomi
(
Hitachi CRL
),
Hiroji Yamada
(
OITDA
),
Shoji Akamatsu
(
NCRC., Univ. of Tokyo
),
Misuzu Sagawa
(
Hitachi CRL
),
Toshio Katsuyama
,
Yasuhiko Arakawa
(
NCRC., Univ. of Tokyo
)
To realize photonic crystal devices with no polarization dependence, we have been developing 1D- and 3D-silicon photonic...
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OPE2007-139
pp.21-26
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