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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
VLD, HWS, ICD 2024-02-28
16:45		 Okinawa
(Primary: On-site, Secondary: Online)		 Research on Routing Method for Spacer-Is-Metal Type Self-Aligned Double Patterning
Koki Tanaka, Takuto Amari, Kunihiro Fujiyoshi (TUAT) VLD2023-105 HWS2023-65 ICD2023-94		 SIM type Self-Aligned Double Patterning is one of the process technologies wiring with a pitch half of the exposure-poss... [more] VLD2023-105 HWS2023-65 ICD2023-94
pp.36-41
HWS, VLD 2019-02-27
13:30		 Okinawa Okinawa Ken Seinen Kaikan Routing Algorithm to Achieve Circular Wire for SIM-Type SADP
Shun Akatsuka, Kunihiro Fujiyoshi (TUAT) VLD2018-98 HWS2018-61		 Wires of Spacer-Is-Metal (SIM) type Self-Aligned Double Patterning (SADP) is peculiar since wires is circular when dummy... [more] VLD2018-98 HWS2018-61
pp.31-36
VLD, DC, CPSY, RECONF, CPM, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC
(Joint) [detail]		 2018-12-05
14:40		 Hiroshima Satellite Campus Hiroshima Improved Routing Method for Two Layer Self-Aligned Double Patterning
Shoya Tamura, Kunihiro Fujiyoshi (TUAT) VLD2018-45 DC2018-31		 Self-Aligned Double Patterning (SADP) enables us to fabricate fine wiring under ArF immersion lithography. However, when... [more] VLD2018-45 DC2018-31
pp.37-42
CAS, SIP, MSS, VLD 2018-06-15
15:25		 Hokkaido Hokkaido Univ. (Frontier Research in Applied Sciences Build.) Routing Algorithm to Achieve Circular Wire for SIM-Type SADP
Shun Akatsuka, Kunihiro Fujiyoshi (TUAT) CAS2018-30 VLD2018-33 SIP2018-50 MSS2018-30		 Wires of Spacer-Is-Metal (SIM) type Self-Aligned Double Patterning (SADP) is peculiar since wires is circular when dummy... [more] CAS2018-30 VLD2018-33 SIP2018-50 MSS2018-30
pp.155-160
VLD 2017-03-02
11:20		 Okinawa Okinawa Seinen Kaikan Efficient Local Pattern Modification Method using FM Algorithm in LELE Double Patterning
Atsushi Ogashira, Shimpei Sato, Atsushi Takahashi (Tokyo TECH) VLD2016-113		 In current semiconductor design, high quality and short time design is required.
In an advanced lithography technology... [more]		 VLD2016-113
pp.67-72
VLD, DC, CPSY, RECONF, CPM, ICD, IE
(Joint) [detail]		 2016-11-29
11:20		 Osaka Ritsumeikan University, Osaka Ibaraki Campus SADP-Cut Aware Two-color Grid Routing
Hatsuhiko Miura, Mitsuru Hasegawa, Kunihiro Fujiyoshi (TUAT) VLD2016-58 DC2016-52		 Self-Aligned Double Patterning (SADP) is one of the promising manufacturing option to overcome the limit of miniaturizat... [more] VLD2016-58 DC2016-52
pp.85-90
VLD, IPSJ-SLDM 2016-05-11
10:25		 Fukuoka Kitakyushu International Conference Center Self-Aligned Double Patterning-Aware Two-color Grid Routing
Hatsuhiko Miura, Mitsuru Hasegawa, Taku Hirukawa, Kunihiro Fujiyoshi (TUAT) VLD2016-2		 Self-Aligned Double Patterning (SADP) is one of the promising manufacturing option to overcome the limit of miniaturizat... [more] VLD2016-2
pp.5-10
VLD 2014-03-04
13:50		 Okinawa Okinawa Seinen Kaikan Local Pattern Modification Method for Lithographical ECO in Double Patterning
Yutaro Miyabe, Atsushi Takahashi, Tomomi Matsui (Tokyo Inst. of Tech.), Yukihide Kohira (Univ. of Aizu), Yoko Yokoyama (Toshiba) VLD2013-149		 In advanced semiconductor manufacturing processes, even though a pattern is generated according to
a design rule, hot s... [more]		 VLD2013-149
pp.87-92
VLD 2014-03-04
14:40		 Okinawa Okinawa Seinen Kaikan Self-Aligned Double and Quadruple Patterning-Aware Grid Routing
Chikaaki Kodama (Toshiba), Hirotaka Ichikawa (Toshiba Microelectronics), Fumiharu Nakajima, Koichi Nakayama, Shigeki Nojima, Toshiya Kotani (Toshiba) VLD2013-151		 Self-Aligned Double and Quadruple Patterning (SADP, SAQP) are leading candidates for sub-$20~nm$ and sub-$14~nm$ node an... [more] VLD2013-151
pp.99-104
VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM
(Joint) [detail]		 2011-11-29
13:00		 Miyazaki NewWelCity Miyazaki Layout Methodology for Self-Alinged Double Patterning
Chikaaki Kodama, Koichi Nakayama, Toshiya Kotani, Shigeki Nojima, Shoji Mimotogi, Shinji Miyamoto (Toshiba) VLD2011-76 DC2011-52		 We propose a new layout method for the damascene process of
self-aligned double patterning (SADP).
In this method, w... [more]		 VLD2011-76 DC2011-52
pp.141-146
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