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 Results 21 - 27 of 27 [Previous]  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2016-10-26
14:00		 Miyagi Niche, Tohoku Univ. [Invited Talk] Controlling Metallic Contamination in Advanced ULSI Processing
Koichiro Saga (Sony) SDM2016-69		 Metal impurities dissolved in silicon can cause “recombination centers”, which degrade retention characteristics of DRAM... [more] SDM2016-69
pp.1-8
RCS, SAT
(Joint)		 2015-08-18
15:30		 Fukuoka Fukuoka Univ. Uplink Interference Suppression by MMSE-CMA Adaptive Array on Multicell Massive MIMO Systems
Kazuki Maruta, Atsushi Ohta, Yushi Shirato, Satoshi Kurosaki, Takuto Arai, Tatsuhiko Iwakuni, Masataka Iizuka (NTT) RCS2015-154		 This paper proposes uplink interference suppression scheme for multicell massive MIMO systems. Single frequency reuse is... [more] RCS2015-154
pp.129-134
IBISML 2014-11-18
15:00		 Aichi Nagoya Univ. [Poster Presentation] Robust Estimation under Heavy Contamination using Unnormalized Models
Takafumi Kanamori (Nagoya Univ.), Hironori Fujisawa (ISM) IBISML2014-68		 In data analysis, contamination caused by outliers is inevitable, and robust statistical methods are strongly demanded. ... [more] IBISML2014-68
pp.251-258
SDM 2014-10-16
16:30		 Miyagi Niche, Tohoku Univ. [Invited Talk] Ion Implantation Technologies for Image Sensing Devices
Yoji Kawasaki, Genshu Fuse, Makoto Sano, Emi Ooga, Masazumi Koike, Kazuhiro Watanabe, Michiro Sugitani (SEN Corp.) SDM2014-88		 Some trends of the implantation processing in device fabrication of CMOS image sensors are discussed. Firstly, the varia... [more] SDM2014-88
pp.23-30
EMD 2011-11-17
17:10		 Akita Akita Univ. Tegata Campus Contact Resistance Characteristics of Relays Operated in Vapors Evaporated from Cured Polymeric Products
Nanae Kobayashi, Makoto Hasegawa (Chitose Inst. of Science & Tech.), Yoshiyuki Kohno, Hiroshi Ando (Kaneka) EMD2011-85		 The authors have already reported that when relays were operated to break load currents in vapors evaporated from an acr... [more] EMD2011-85
pp.97-102
EMD 2010-11-12
14:30		 Overseas Xi'an Jiaotong University Characteristics of electric charges carried by dust particles and their effects on electrical contact failures
Jinchun Gao (Beijing Univ. of Posts and Telecom.) EMD2010-116		 Dust contamination is one of the major causes of electrical contact failure. The deposition of dust and adhesion of part... [more] EMD2010-116
pp.205-210
SDM, ED 2008-07-09
13:45		 Hokkaido Kaderu２・７ [Invited Talk] Precise Ion Implantation for Advanced MOS LSIs
Toshiharu Suzuki (SEN) ED2008-44 SDM2008-63		 Issues in the ion implantation technology employed in advanced MOSLSIs are addressed, where the placement of implanted i... [more] ED2008-44 SDM2008-63
pp.25-30
 Results 21 - 27 of 27 [Previous]  /   
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