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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 7 of 7  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
ED 2019-04-18
13:25
Miyagi RIEC, Tohoku Univ. Characteristic evaluation of ZnO thin film deposit by room temperature ALD
Kazuki Yoshida, Kentaro Saito, Masanori Miura, Kensaku Kanomata, Fumihiko Hirose (Yamagata Univ.) ED2019-2
(To be available after the conference date) [more] ED2019-2
pp.5-8
SDM, EID 2014-12-12
11:00
Kyoto Kyoto University Irradiation Effect of Carbon-Based Polyatomic Ions on Si Substrate
Mitsuaki Takeuchi, Kyohei Hayashi, Hiromichi Ryuto, Gikan H. Takaoka (Kyoto Univ.), Tsutomu Nagayama, Koji Matsuda (Nissin Ion Equipment) EID2014-17 SDM2014-112
Irradiation damage on Si(100) substrates which were irradiated with C$_{n}$H$_{n}^{+}$($n$=3, 7, 14) and C$_{n}$H$_{2n+1... [more] EID2014-17 SDM2014-112
pp.21-24
ED 2013-04-18
14:40
Miyagi   Characteristics of organic solar cells with multilayer anti-reflection coating
Takuto Nagase, Kensaku Kanomata, Takahiko Suzuki, Shigeru Kubota, Fumihiko Hirose (Yamagata Univ.) ED2013-5
(To be available after the conference date) [more] ED2013-5
pp.17-20
OME 2011-12-21
13:55
Tokyo Kikai-Shinko-Kaikan Bldg. Real Time Monitoring of the Surface Reaction During the Growth of Organic Thin-Films by Elecrospray Deposition Method
Taiga Hiate, Tomohisa Ino, Takeshi Fukuda, Keiji Ueno, Hajime Shirai (Saitama Univ.) OME2011-68
Electrospray-deposited (ESD) Poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT:PSS) was investigated using ... [more] OME2011-68
pp.11-16
OME, EID 2009-03-06
15:15
Tokyo Kikai-Shinko-Kaikan Bldg. -
Daisuke Yokoyama (Kyushu Univ.), Akio Sakaguchi, Michio Suzuki (J. A. Woollam Co., Inc), Chihaya Adachi (Kyushu Univ.) EID2008-88 OME2008-99
It has been taken for granted that molecules in organic vacuum-deposited amorphous films are randomly oriented and the f... [more] EID2008-88 OME2008-99
pp.27-32
SDM, OME 2008-04-11
10:35
Okinawa Okinawa Seinen Kaikan Electrical activation of heavily doped Si film by crystallization annealing
Takashi Noguchi, Tomoyuki Miyahira, Kenji Kawai (Univ. Ryukyus), Toshiharu Suzuki, Masateru Sato (SEN) SDM2008-4 OME2008-4
After UV pulsed excimer laser annealing for highly
boron-, or phosphorus dosed Si film, the relationship
between the c... [more]
SDM2008-4 OME2008-4
pp.17-22
ED, SDM 2007-06-25
17:10
Overseas Commodore Hotel Gyeongju Chosun, Gyeongju, Korea Efficient Activation of Dopant in Poly-Si film using Excimer Laser Annealing
Takashi Noguchi (University of the Ryukyus)
Efficient activation of doped Si film using low temperature process is important to realize a high performance Si TFT. D... [more]
 Results 1 - 7 of 7  /   
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