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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2009-12-04
14:30
Nara NAIST Gettering in Large-Grained Thin Polycrystalline Silicon Films on Glass Substrate
Akito Hara, Tsutomu Sato (Tohoku Gakuin Univ.) SDM2009-163
Gettering of metal impurities in thin poly-Si films is one of the key techniques for realizing high-performance, high-re... [more] SDM2009-163
pp.63-65
CPM 2009-10-29
14:25
Toyama Toyama Prefectural University Fabrication and evaluation of silicon solar cells by using low-purity polycrystalline silicon wafers
Yuki Sano, Satoru Tsuzuki, Takuzi Umeta, Yuzuru Narita, Takahiko Suzuki, Fumihiko Hirose (Yamagata Univ.) CPM2009-90
(To be available after the conference date) [more] CPM2009-90
pp.5-7
SDM 2008-10-10
15:45
Miyagi Tohoku Univ. Influence of B and P dopants on SiO2 film characteristics
Satoshi Nagashima, Hiroshi Akahori (Toshiba) SDM2008-166
In general, the silicon material that has doped impurities such as phosphorus, boron, and arsenic to the diffusion and t... [more] SDM2008-166
pp.63-68
ICD, SDM 2008-07-17
14:00
Tokyo Kikai-Shinko-Kaikan Bldg. [Special Talk] Present Status and Future Trend of Characteristic Variations in Scaled CMOS
Toshiro Hiramoto (Univ. of Tokyo/MIRAI-Selete), Kiyoshi Takeuchi, Takaaki Tsunomura (/MIRAI-Selete), Arifin T.Putra (Univ. of Tokyo), Akio Nishida, Shiro Kamohara (/MIRAI-Selete) SDM2008-135 ICD2008-45
The variability is one of the most critical issues for further miniaturization of MOS transistors. Although the variabi... [more] SDM2008-135 ICD2008-45
pp.41-46
SDM 2008-06-09
16:50
Tokyo An401・402, Inst. Indus. Sci., The Univ. of Tokyo Inversion-Layer Capacitance and Low-Field Mobility Characteristics in Si(110) pMOSFETs
Masumi Saitoh, Shigeki Kobayashi, Ken Uchida (Toshiba) SDM2008-46
Basic transport properties of Si (110) pMOSFETs are systematically investigated. Inversion-layer capacitance of (110) p... [more] SDM2008-46
pp.23-27
ICD 2007-04-13
13:50
Oita   Suppression of lateral charge redistribution using advanced impurity trap memory for improving high temperature retention
Hiroshi Sunamura, Taeko Ikarashi, Ayuka Morioka, Setsu Kotsuji, Makiko Oshida, Nobuyuki Ikarashi, Shinji Fujieda, Hirohito Watanabe (NEC) ICD2007-15
For retention improvement in scaled SONOS-type non-volatile memory, deep traps with controllable density were formed by ... [more] ICD2007-15
pp.83-88
CPM, EE 2007-03-02
15:40
Tokyo Kikai-Shinko-Kaikan Bldg Design of Class DE Amplifier with Nonlinear Shunt Capacitance with Any Output Q
Tooru Ezawa, Hiroo Sekiya, Jianming Lu, Takashi Yahagi (Chiba Univ.) EE2006-69 CPM2006-162
This paper presents design of class DE amplifier with nonlinear shunt capacitance with any output Q. It is assumed that ... [more] EE2006-69 CPM2006-162
pp.41-46
SDM, VLD 2006-09-26
10:25
Tokyo Kikai-Shinko-Kaikan Bldg. To be announced
Yoshio Ashizawa, Hideki Oka (FUJITSU LABORATORIES)
The density gradient approach is presented to device characteristics analysis with random dopant fluctuations. We invest... [more] VLD2006-40 SDM2006-161
pp.7-12
SDM, VLD 2006-09-26
11:15
Tokyo Kikai-Shinko-Kaikan Bldg. Modeling of Discrete Dopant Effects on Threshold Voltage Shift by Random Telegraph Signal
Ken'ichiro Sonoda, Kiyoshi Ishikawa, Takahisa Eimori, Osamu Tsuchiya (Renesas Technology Corp.)
This paper discusses the discrete channel dopant effects on the threshold voltage shift by random telegraph signal (RTS)... [more] VLD2006-42 SDM2006-163
pp.19-24
ICD, SDM 2005-08-19
14:40
Hokkaido HAKODATE KOKUSAI HOTEL Robust Device Design in FinFET SRAM for hp22nm Technology Node
Kimitoshi Okano, Tatsuya Ishida, Takahiko Sasaki, Takashi Izumida, Masaki Kondo, Makoto Fujiwara, Nobutoshi Aoki, Satoshi Inaba, Nobuaki Otsuka, Kazunari Ishimaru, Hidemi Ishiuchi (Toshiba)
Feasibility of FinFET SRAM operation at hp22nm technology node has been studied by device and circuit simulation from th... [more] SDM2005-154 ICD2005-93
pp.67-72
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