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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 6 of 6  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM, EID 2014-12-12
13:30		 Kyoto Kyoto University Low-Temperature CLC Poly-Si TFTs with Sputtered HfO2 Gate Dielectric Layer
Tatsuya Meguro, Akito Hara (Tohoku Gakuin Univ.) EID2014-23 SDM2014-118		 To achieve high performance low-temperature (LT) polycrystalline-silicon (poly-Si) thin-film transistors (TFTs), high-k ... [more] EID2014-23 SDM2014-118
pp.51-54
SDM 2013-12-13
11:40		 Nara NAIST Low-Temprature CLC Poly-Si TFTs with Sputtered Al2O3 Gate Dielectric Layer
Tatsuya Meguro, Akito Hara (Tohoku Gakuin Univ.) SDM2013-124		 A high-k gate dielectric is a technology booster for enhancing the performance of low-temperature (LT) polycrystalline-s... [more] SDM2013-124
pp.49-53
SDM, OME 2012-04-27
15:10		 Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. [Invited Talk] Growth of Silicon and Silicon-Germanium Thin Films on Glass Substrates by Continuous-Wave Laser Lateral Crystallization
Kuninori Kitahara (Shimane Univ.), Akito Hara (Tohoku Gakuin Univ.) SDM2012-5 OME2012-5		 Flow-shaped growth of Si and SiGe thin films on glass substrate was achieved by continuous wave laser lateral crystalliz... [more] SDM2012-5 OME2012-5
pp.21-26
SDM, OME 2012-04-27
15:40		 Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. [Invited Talk] Formation of Biaxially-Oriented Poly-Si Thin Films by Double-Line Beam Continuous-Wave Laser Lateral Crystallization for High-Performance TFT
Shin-Ichiro Kuroki (Tohoku Univ.) SDM2012-6 OME2012-6		 Poly-Si thin films with large crystal grains of 20×2μm2 were fabricated by continuous-wave laser lateral crystallization... [more] SDM2012-6 OME2012-6
pp.27-32
SDM 2010-10-22
11:40		 Miyagi Tohoku University Fabrication of Highly Crystalline-Oriented Poly-Si Thin Films by using Double -Line-Beam CLC for High Performance LPTS-TFT
Shin-Ichiro Kuroki, Yuya Kawasaki, Shuntaro Fujii, Koji Kotani (Tohoku Univ.), Takashi Ito (Tokyo Inst. of Tech.) SDM2010-163		 Highly bi-axially oriented poly-Si thin films with very long grains were successfully fabricated on quartz substrates by... [more] SDM2010-163
pp.45-48
SDM 2008-10-09
14:30		 Miyagi Tohoku Univ. Planarization of CW laser crystallized Si thin films by chemical mechanical polishing using slurry with ethyl alcohol
Masayuki Numata, Shin-Ichiro Kuroki, Shuntaro Fujii, Koji Kotani, Takashi Ito (Tohoku Univ.) SDM2008-151		 CW laser crystallization of amorphous silicon films is a promising method to realize thin film transistor with high per... [more] SDM2008-151
pp.13-16
 Results 1 - 6 of 6  /   
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