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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2014-10-25
09:40		 Nagano   Characterization of low-temperature deposited SiNx films applicable to 3D/2.5D-IC
Mayumi B. Takeyama, Masaru Sato (Kitami Inst. of Tech.), Yasushi Kobayashi, Yoshihiro Nakata, Tomoji Nakamura (FUJITSU LAB.LTD.), Atsushi Noya (Kitami Inst. of Tech.) CPM2014-115		 3-dimensional stacked LSI and/or 2.5-D IC is attracted much attention to solve the issues how to develop the integration... [more] CPM2014-115
pp.53-56
CPM 2013-10-24
16:55		 Niigata Niigata Univ. Satellite Campus TOKIMEITO Properties of SiNx films prepared by low process temperature
Mayumi B. Takeyama, Masaru Sato (Kitami Inst. of Tech.), Yoshihiro Nakata, Yasushi Kobayashi, Tomoji Nakamura (FUJITSU LAB.), Atsushi Noya (Kitami Inst. of Tech.) CPM2013-100		 3-dimensional stacked LSI is attracted much attention to solve the issues how to develop the integration density and/or ... [more] CPM2013-100
pp.35-39
CPM 2012-08-09
09:50		 Yamagata   Low temperature deposition of SiNx thin films by radical-assisted reaction
Mayumi B. Takeyama, Masaru Sato (Kitami Inst. Technol.), Yoshihiro Nakata, Yasushi Kobayashi, Tomoji Nakamura (Fujitsu Lab. Ltd.), Atsushi Noya (Kitami Inst. Technol.) CPM2012-45		 3-dimensional stacked LSI is of high interest to overcome the issues how to develop the integration density and/or funct... [more] CPM2012-45
pp.51-54
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