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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2019-11-08
10:50		 Fukui Fukui univ. [Invited Talk] Mapping of metal/semiconductor and semiconductor/semiconductor interfaces using scanning internal photoemission microscopy
Kenji Shiojima (Univ. of Fukui) CPM2019-51		 Scanning internal photoemission spectroscopy has been developed to map the electrical characteristics of metal/semicondu... [more] CPM2019-51
pp.35-38
ED, LQE, CPM 2018-11-29
14:40		 Aichi Nagoya Inst. tech. Scanning internal photoemission microscopy measurements of n-GaN Schottky contacts under applying voltage
Kenji Shiojima, Masataka Maeda (Univ. of Fukui), Tomoyoshi Mishima (Hosei Univ.) ED2018-36 CPM2018-70 LQE2018-90		 We applied scanning internal photoemission microscopy (SIPM) method to characterize the initial stage of the degradation... [more] ED2018-36 CPM2018-70 LQE2018-90
pp.17-20
MW, ED 2017-01-26
16:15		 Tokyo Kikai-Shinko-Kaikan Bldg. [Invited Lecture] Characterization of Metal/GaN Schottky Contacts -- Review from the Early Days --
Kenji Shiojima (Univ. of Fukui) ED2016-101 MW2016-177		 We report our experimental results on GaN Schottky contacts in conjunction with a review of the development of GaN elect... [more] ED2016-101 MW2016-177
pp.23-28
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