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Committee Date Time Place Paper Title / Authors Abstract Paper #
ICD, SDM 2008-07-18
14:40		 Tokyo Kikai-Shinko-Kaikan Bldg. Fabrication of Ultra Shallow Junction and Improvement of Metal Gate High-k CMOS Performance by FSP-FLA (Flexibly-Shaped-Pulse Flash-Lamp-Annealing) Technology
Takashi Onizawa, Shinichi Kato, Takayuki Aoyama, Yasuo Nara, Yuzuru Ohji (selete) SDM2008-146 ICD2008-56		 We propose the suitable milli-second annealing (MSA) for metal/high-k device performance and ultra-shallow-junction (USJ... [more] SDM2008-146 ICD2008-56
pp.103-108
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