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Committee Date Time Place Paper Title / Authors Abstract Paper #
MW, ED 2007-01-19
13:50
Tokyo Kikai-Shinko-Kaikan Bldg. High-quality InAlN/GaN HEMT epi-wafer grown on Si (111) substrate by metalorganic chemical vapor deposition
Noriyuki Watanabe, Haruki Yokoyama, Masanobu Hiroki, Yasuhiro Oda (NTT), Takuma Yagi (NTT-AT), Takashi Kobayashi (NTT)
We successfully fabricated high-quality InAlN/GaN high electron mobility transistors (HEMTs) structure on Si(111) substr... [more] ED2006-233 MW2006-186
pp.183-187
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