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CPM
2006-08-07
15:25
Iwate
Iwate Univ.
Low temperature deposition of anatase poly TiO2 by chemical vapor deposition
Fumihiko Hirose
,
Masashi Ito
,
Yu Matsushima
(
YU
)
We have successfully deposited antase TiO2 on Si surfaces by MOCVD with a precursor titaneisopropoxide and an oxidant of...
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CPM2006-44
pp.21-23
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