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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
OME |
2017-12-01 09:20 |
Saga |
Sun Messe Tosu |
High efficiency processing and its processing mechanism of large area diamond substrate due to plasma fusion CMP Hidetoshi Takeda (Namiki Precision Jewel Co., Ltd.), Toshiro Doi (Kyushu Univ.), Seong Woo Kim (Namiki Precision Jewel Co., Ltd.), Hideo Aida (Nagaoka Univ. Tech.), Masaharu Shiratani (Kyushu Univ.) OME2017-35 |
SiC, GaN and Diamond are known as next generation semiconductor materials, but on the other hand, these are known as ult... [more] |
OME2017-35 pp.1-6 |
OME |
2017-12-01 09:40 |
Saga |
Sun Messe Tosu |
Pad-Conditioning/Slurry-Supply Hybrid Effect of High-Pressure-Micro-Jet (HPMJ) Method During CMP Process Keiichi Tsukamoto, Toshiro Doi (Kyushu Univ.), Chengwu Wang (Zhejiang Normal Univ.), Kiyoshi Seshimo (Kyushu Univ.), Keiji Miyachi, Mikihiro Kato (Asahi Sunac Co.), Tadakazu Miyashita (Fujikoshi Machinery Co.), Masanori Ohtsubo, Yoko Matsunaga (Kyushu Univ.) OME2017-36 |
Clogging of the polishing pad is inevitable during CMP process for semiconductor wafer. Conventional reconditioning meth... [more] |
OME2017-36 pp.7-12 |
OME, SDM |
2017-04-21 10:00 |
Kagoshima |
Tatsugochou Shougaigakushuu Center |
Plasma fusion CMP® technology for GaN substrates
-- Evaluation of processing characteristics for plasma fusion CMP® using Ar plasma and ethanol bubbling -- Naoki Yamazaki (Kyushu Univ./Namiki PrecisionJewel Co.,LTD), Toshiro Doi (Kyushu Univ), Hideo Aida (Kyushu Univ./Namiki PrecisionJewel Co.,LTD), Seongwoo Kim, Koki Oyama (Namiki PrecisionJewel Co.,LTD), Shuhei Kurokawa (Kyushu Univ), Yasuhisa Sano (Osaka Univ.), Masaharu Shiratani, Yoko Yamanishi (Kyushu Univ) SDM2017-5 OME2017-5 |
[more] |
SDM2017-5 OME2017-5 pp.19-23 |
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