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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 20 of 23  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM, OME 2023-04-22
10:05
Okinawa Okinawaken Seinen Kaikan
(Primary: On-site, Secondary: Online)
Crystallization by Rapid Thermal Annealing of Sputtered InSb Films Deposited on Glass Using Ne
Tatsuya Okada, C. J. Koswaththage (Univ. Ryukyus), Takashi Kajiwar, Taizoh Sadoh (Kyushu Univ), Takashi Noguchi (Univ. Ryukyus) SDM2023-8 OME2023-8
For realizing high crystallinity InSb films on low-cost insulating substrate, we investigate the crystallization using R... [more] SDM2023-8 OME2023-8
pp.30-31
SDM, OME 2023-04-22
10:30
Okinawa Okinawaken Seinen Kaikan
(Primary: On-site, Secondary: Online)
Crystallization of InSb Films on Glass by RTA
Takashi Kajiwara (Kyushu Univ.), Tatsuya Okada, Charith Jayanada Koswaththage, Takashi Noguchi (Univ. of the Ryukyus), Taizoh Sadoh (Kyushu Univ.) SDM2023-9 OME2023-9
To achieve low-cost and high-mobility InSb thin films, we studied the crystallization of InSb films sputtered on a glass... [more] SDM2023-9 OME2023-9
pp.32-33
SDM, OME 2020-04-13
14:00
Okinawa Okinawaken Seinen Kaikan
(Cancelled, technical report was not issued)
Metal Source/Drain Structure TFTs using poly-Si Crystallized by Blue Multi-Laser Diode Annealing
Tatsuya Okada, Takashi Noguchi (Univ. Ryukyus)
We have reported that Blue Multi-Laser Diode Annealing (BLDA) is effective to crystallize Si films with smooth surface. ... [more]
SDM, OME 2018-04-07
10:40
Okinawa Okinawaken Seinen Kaikan [Invited Talk] Low Temperature Poly Si TFTs with Metal Source and Drain
Takashi Noguchi, Tatsuya Okada (Univ. of Ryukyus) SDM2018-4 OME2018-4
 [more] SDM2018-4 OME2018-4
pp.15-18
SDM, OME 2016-04-08
16:50
Okinawa Okinawa Prefectural Museum & Art Museum Multi-shots ELA of sputtered Si film and TFT with metal source-drain structure
Taisei Harada, Futa Gakiya, Takuya Ashitomi, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus), Kanji Noda, Akira Suwa (GiGAPHOTON Inc.), Hiroshi Ikenoue (Kyusyu Univ.), Tetsuo Okuyama (TOYOBO Company, Limited) SDM2016-10 OME2016-10
 [more] SDM2016-10 OME2016-10
pp.39-41
SDM, OME 2016-04-08
17:15
Okinawa Okinawa Prefectural Museum & Art Museum High Photoconductive Silicon Thin-film formed by Blue Laser Diode Annealing for System on Panel
Koswaththage Charith Jayanada, Kota Nakao, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus) SDM2016-11 OME2016-11
 [more] SDM2016-11 OME2016-11
pp.43-47
SDM, OME 2016-04-09
11:40
Okinawa Okinawa Prefectural Museum & Art Museum Effect of Low Temperature Annealing of Sputtered SiO2 for Gate Insulator in Poly-Si TFTs
Hikaru Tamashiro, Kimihiko Imura, Tatsuya Okada, Takashi Noguchi (Univ. Ryukyu) SDM2016-16 OME2016-16
 [more] SDM2016-16 OME2016-16
pp.67-69
SDM, OME 2016-04-09
12:05
Okinawa Okinawa Prefectural Museum & Art Museum An Application of Green Laser Annealing in Low-Voltage Power MOSFETs
Yi Chen, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus) SDM2016-17 OME2016-17
 [more] SDM2016-17 OME2016-17
pp.71-75
OME, SDM 2015-04-30
13:25
Okinawa Oh-hama Nobumoto Memorial Hall Temperature Analysis of Si Films during Blue Multi-Laser Diode Annealing
Tatsuya Okada, Seita Kamimura, Takashi Noguchi (Univ. Ryukyus) SDM2015-14 OME2015-14
We have reported that Blue Multi-Laser Diode Annealing (BLDA) is effective to crystallize Si films for next generation S... [more] SDM2015-14 OME2015-14
pp.53-55
OME, SDM 2015-04-30
13:50
Okinawa Oh-hama Nobumoto Memorial Hall Low Resistivity of poly-Si films by LA Laser Annealing
Takashi Noguchi, Tatsuya Okada (Univ. Ryukyus) SDM2015-15 OME2015-15
 [more] SDM2015-15 OME2015-15
pp.57-61
SDM, OME 2014-04-11
10:30
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Electrical Characterization of SiO2 Films Deposited by RF Sputtering Using O2/Ar Mixture
Kimihiko Imura, Tatsuya Okada, Kiyoharu Shimoda, Kouya Sugihara, Takashi Noguchi (Univ. of Ryukyus) SDM2014-13 OME2014-13
For a fabrication of flexible display, high quality gate insulator films on a thermally durable substrate such as plasti... [more] SDM2014-13 OME2014-13
pp.55-57
SDM, OME 2014-04-11
10:50
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Fabrication of poly-Si TFT with low-temperature process using BLDA
Kiyoharu Shimoda, Kouya Sugihara, Kimihiko Imura, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus) SDM2014-14 OME2014-14
Poly-Si TFTs by low cost fabrication process are required on glass as well as on flexible panel. Top-gate-type TFT witho... [more] SDM2014-14 OME2014-14
pp.59-61
SDM, OME 2014-04-11
11:10
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Photoconductivity of Si Films on glass after Blue Multi-Laser Diode Annealing
Charith Jayanada Koswaththage*, Satoshi Chinen, Kouya Sugihara, Tatsuya Okada, Takashi Noguchi (Uni. of the Ryukyus) SDM2014-15 OME2014-15
Photoconductivity of BLDA applied Si film was examined for the aim of multi-functional optical sensor application of the... [more] SDM2014-15 OME2014-15
pp.63-65
SDM 2013-12-13
13:00
Nara NAIST [Invited Talk] Crystallization of Si Films and the Applications using BLDA (Blue Laser-Diode Annealing)
Takashi Noguchi, Tatsuya Okada (Univ. of Ryukyus) SDM2013-125
 [more] SDM2013-125
pp.55-59
SDM, ED
(Workshop)
2012-06-27
17:15
Okinawa Okinawa Seinen-kaikan Crystallization of a-Si Films with Smooth Surface Using Blue-Multi-Laser-Diode-Annealing
Tatsuya Okada, Jean de Dieu Mugiraneza, Katsuya Shirai, Takuma Nishinohara, Tomoyuki Mukae, Keisuke Yagi, Takashi Noguchi (Univ. Ryukyus)
Crystallization of 50-nm-thick a-Si was achieved with smooth surface using Blue Multi-Laser Diode Annealing (BLDA). The ... [more]
SDM, ED
(Workshop)
2012-06-27
17:30
Okinawa Okinawa Seinen-kaikan Characterization of Optimized Sputtered Poly-Si Films by Blue-Multi-Laser-Diode Annealing for High Performance Displays
Takuma Nishinohara, J. D. Mugiraneza, Katsuya Shirai, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus)
As a result of Blue-Multi-Laser-Diode Annealing (BLDA) for phosphorus-doped Si films deposited by R.F. sputtering using ... [more]
SDM, ED
(Workshop)
2012-06-27
17:45
Okinawa Okinawa Seinen-kaikan Effective Annealing of Si Films as an advanced LTPS
Takashi Noguchi, Takuma Nishinohara, Jean de Dieu Mugiraneza, Katsuya Shirai, Tatsuya Okada (Univ. Ryukyus)
 [more]
SDM, OME 2012-04-27
16:10
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Control of Crystallization Behavior of Silicon Thin Films by Semiconductor Blue-Multi-Diode-Laser Annealing
Katsuya Shirai, Jean de Dieu Mugiraneza, Toshiharu Suzuki, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) SDM2012-7 OME2012-7
 [more] SDM2012-7 OME2012-7
pp.33-36
SDM, OME 2012-04-27
16:30
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Crystallization of Si Thin Film on Poly-Imide Substrate by Semiconductor Blue Multi-Laser Diode Annealing
Tatsuya Okada, Jean de Dieu Mugiraneza, Katsuya Shirai, Toshiharu Suzuki, Takashi Noguchi (Univ. Ryukyus), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) SDM2012-8 OME2012-8
Crystallization of a-Si films on polyimide substrate was achieved using Blue Multi-Laser Diode Annealing. Surface roughn... [more] SDM2012-8 OME2012-8
pp.37-39
SDM, OME 2012-04-28
11:30
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Electrical Characterization of SiO2 and SiN Films Deposited by RF Sputtering
Keisuke Yagi, Tatsuya Okada, Takashi Noguchi (Univ.Ryukyus) SDM2012-17 OME2012-17
SiO2 and SiN films of 100 nm thickness were deposited on the Si substrate by RF sputtering. After thermal annealing, at ... [more] SDM2012-17 OME2012-17
pp.75-77
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