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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
AP, MW
(Joint)		 2016-09-16
10:50		 Ibaraki AIST [Invited Lecture] Development of an automatic calibration system for artificial mains network
Ryoko Kishikawa (AIST), Hiroki Ozone, Masahumi Mori, Kazunari Suzuki, Masaaki Shida (REPIC), Masahiro Horibe (AIST) AP2016-101 MW2016-87		 In order to utilize electronic devices safely, electromagnetic compatibility (EMC) tests have been performed. An artific... [more] AP2016-101 MW2016-87
pp.69-74(AP), pp.77-82(MW)
EA, US
(Joint)		 2012-01-27
15:30		 Osaka Kansai Univ. Feasibility study on sound pressure measurement under cavitation using fiber-optic hydrophone
Toshiyuki Tatsumi, Kei Kikuchi, Yoshikazu Koike (Shibaura Inst of Tech), Kazunari Suzuki (Kaijo Corp) US2011-102		  [more] US2011-102
pp.97-100
US 2009-09-29
15:45		 Hokkaido Noboribetsu Grand Hotel Sound Pressure Analysis of the Ultrasonic Cleaning Machine Using Waveguide mode
Yoshikazu Koike (Shibaura Inst. of Tech.), Kazunari Suzuki (Shibaura Inst. of Tech./Kaijo corp.), Kenta Suzuki, Ryuta Machida (Shibaura Inst. of Tech.), Ki Han, Shoi-ichi Okano, Junichiro Soejima (Shibaura Inst. of Tech./Kaijo corp.) US2009-44		 Authors proposed ultrasonic cleaning machine using the ultrasonic waveguide mode in order to reduce damage of the LSI pa... [more] US2009-44
pp.37-40
ED 2009-06-11
13:50		 Tokyo   Post CMP Cleaning by Megasonic Using Waveguide Tube Type Equipment
Kazunari Suzuki (Kaijo Corp./Shibaura Inst. of Tech.), Ki Han, Shouichi Okano, Junichiro Soejima (Kaijo Corp.), Yoshikazu Koike (Shibaura Inst. of Tech.) ED2009-37		 At single wafer processing, we proposed novel ultrasonic cleaning equipment using the waveguide tube made of quartz. At ... [more] ED2009-37
pp.7-10
US 2009-04-24
15:45		 Tokyo The University of Electro-Communications A Novel Ultrasonic Cleaning Equipment using Waveguide mode
Kazunari Suzuki (Shibaura Inst. of Tech./Kaijo Corp.), Yoshikazu Koike (Shibaura Inst. of Tech.), Ki Han, Shouichi Okano, Junichiro Soejima (Kaijo Corp.) US2009-5		 At single wafer processing, spin cleaner using spouting ultrasonic cleaning transducer has been developed. In
such a pr... [more]		 US2009-5
pp.23-28
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