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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
LQE, ED, CPM |
2023-12-01 15:50 |
Shizuoka |
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Effects of AlN template polarity on BN grown by MOVPE and high temperature annealing Yuto Oishi, Shiyu Xiao, Kenjiro Uesugi, Toru Akiyama, Tomohiro Tamano, Hideto Miyake (Mie University) ED2023-35 CPM2023-77 LQE2023-75 |
[more] |
ED2023-35 CPM2023-77 LQE2023-75 pp.94-97 |
ED, CPM, LQE |
2021-11-25 16:05 |
Online |
Online |
Substrate off-cut angle dependence on fabrication of high-temperature annealed a-plane AlN on r-plane sapphire Kota Shibutani, Kenjiro Uesugi, Shiyu Xiao, Kanako Shojiki, Shigeyuki Kuboya, Toru Akiyama, Hideto Miyake (Mie Univ.) ED2021-25 CPM2021-59 LQE2021-37 |
[more] |
ED2021-25 CPM2021-59 LQE2021-37 pp.51-54 |
LQE, CPM, ED |
2017-12-01 15:10 |
Aichi |
Nagoya Inst. tech. |
Fabrication of Polarity-inverted AlN by Face-to-Face Annealing and Application for QPM-SHG Yusuke Hayashi, Hideto Miyake, Kazumasa Hiramatsu, Toru Akiyama, Tomonori Ito (Mie Univ.), Ryuji Katayama (Osaka Univ.) ED2017-67 CPM2017-110 LQE2017-80 |
[more] |
ED2017-67 CPM2017-110 LQE2017-80 pp.87-90 |
SDM |
2009-06-19 10:20 |
Tokyo |
An401・402 Inst. Indus. Sci., The Univ. of Tokyo |
First-Principles Calculations for Interfacial Reaction during Si Oxidation Toru Akiyama (Mie Univ.), Hiroyuki Kageshima (NTT Corp.), Masashi Uematsu (Keio Univ.), Tomonori Ito (Mie Univ.) SDM2009-28 |
The interfacial reaction processes during Si oxidation are investigated based on first-principles total-energy electroni... [more] |
SDM2009-28 pp.9-13 |
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